Semiconductor device including air gaps and method for fabricating the same
Disclosed are a semiconductor device capable of reducing parasitic capacitance between adjacent conductive structures and a method for fabricating the same. The semiconductor device includes a plurality of bit line structures each comprising a first contact plug formed over a substrate and a bit line formed over the first contact plug. A spacer structure having air gaps is formed on sidewalls of the first contact plug and on sidewalls of the bit line. An plug isolation layer is formed between the plurality of bit line structures. The isolation layer includes an opening. A second contact plug is formed in the opening and a memory element is formed over the second contact plug.
1. A semiconductor device, comprising:
a substrate including a first recessed surface and a second recessed surface;
an interlayer dielectric layer having a first opening exposing the first recessed surface;
a first plug formed in the first opening and isolated by a pair of gaps from sidewalls of the first opening;
a bit line configured to cover the first plug and extended in any one direction over the interlayer dielectric layer;
a second opening through the interlayer dielectric layer to expose the second recessed surface;
a second plug formed in the second opening and configured to comprise a lower part adjacent to the first plug and an upper part adjacent to the bit line;
a first spacer formed between the bit line and the second plug and extending to be placed on both sidewalls of the first plug;
a second spacer formed between the second plug and the first spacer and extending to be placed on both sidewalls of the first plug;
a plug type air gap formed in the first opening and formed between the first spacer and the second spacer;
a line type air gap formed between the first spacer and the second spacer and formed between the bit line and the upper part of the second plug;
a capping spacer filled in an upper part of the line type air gap and is formed between the first spacer and the second spacer;
a third plug formed over the second plug and vertically overlap with the capping spacer; and
a plug isolation layer that includes a first portion adjacent to a side surface of the second plug and a side surface of the third plug and a second portion overlapping the capping spacer in the vertical direction,
wherein a lower part of the plug type air gap has a bended shape to cover a bottom surface of the second spacer, and
wherein a lower part of the first spacer has a bended shape to cover the lower part of the plug type air gap.
2. The semiconductor device of claim 1 , wherein the line type air gap has a line type extended in parallel to the bit line, and the plug type air gap is separated by the first plug and placed within the first opening,
wherein the line type air gap and the plug type air gap are coupled to each other.
3. The semiconductor device of claim 1 , wherein the lower part of the plug type air gap is sealed by the first spacer and the second spacer.
4. The semiconductor device of claim 1 , wherein the first spacer, the second spacer, and the capping spacer comprise silicon nitride.
5. The semiconductor device of claim 1 , further comprising:
an ohmic contact layer between the second plug and the third plug.
6. The semiconductor device of claim 1 , wherein the third plug further comprises an extension part overlapped with an upper part of the bit line.
7. The semiconductor device of claim 1 , further comprising a memory element formed over the third plug.
8. The semiconductor device of claim 1 , further comprising a buried word line buried in the substrate and extended in a direction that intersects the bit line.
9. The semiconductor device of claim 1 ,
wherein the bit line and the first plug have the same line width.
10. The semiconductor device of claim 1 ,
wherein the second recessed surface has a V-shaped profile.
11. The semiconductor device of claim 10 ,
wherein the first recessed surface is located at a lower level than the second recessed surface.
12. The semiconductor device of claim 11 ,
wherein a bottom surface of the plug type air gap is located at a lower level than the second recessed surface and is located at higher level than the first recessed surface.
13. The semiconductor device of claim 1 ,
wherein the plug type air gap is formed only in the pair of gaps.
14. The semiconductor device of claim 1 , wherein the second spacer comprising:
an upper portion disposed between the bit line and the upper part of the second plug; and
a lower portion disposed between the first plug and the lower part of the second plug,
wherein the lower portion of the second spacer is thicker than the upper portion of the second spacer.
15. The semiconductor device of claim 1 , wherein the lower part of the plug type air gap is located at a higher level than a bottom surface of the first plug.