Strain gauge with improved distortion of measured object
A strain gauge includes a flexible substrate, resistors each formed of a film that includes Cr, CrN, and Cr 2 N, and a functional layer formed of a metal, an alloy, or a metal compound, the functional layer being in a lower surface of the resistors. The resistors include a first resistor formed on or above a predetermined surface of the substrate; a second resistor of which a grid direction faces a different direction from the first resistor, the second resistor formed on or above the predetermined surface of the substrate or a surface parallel to the predetermined surface; and a third resistor formed on or above a surface adjacent to the predetermined surface of the substrate.
1. A strain gauge comprising:
a flexible resin substrate;
resistors each formed of a film that includes Cr, CrN, and Cr 2 N; and
a functional layer formed of a metal, an alloy, or a metal compound, the functional layer being in a lower surface of the resistors,
wherein an element included in the functional layer is diffused into the film,
wherein the resistors include:
a first resistor formed on or above a predetermined surface of the substrate;
a second resistor of which a grid direction faces a different direction from the first resistor, the second resistor formed on or above the predetermined surface of the substrate or a surface parallel to the predetermined surface; and
a third resistor formed on or above a surface adjacent to the predetermined surface of the substrate, and
wherein a gauge factor of the strain gauge is 10 or more.
2. The strain gauge according to claim 1 , wherein an angle between the surface adjacent to the predetermined surface and the predetermined surface is an obtuse angle.
3. The strain gauge according to claim 1 , wherein the first resistor, the second resistor, and the third resistor are arranged such that grid directions of the first resistor, the second resistor, and the third resistor are mutually perpendicular.
4. The strain gauge according to claim 1 , wherein a main component of each resistor is alpha-chromium.
5. The strain gauge according to claim 4 , wherein each resistor includes alpha-chromium at 80% by weight or more.
6. The strain gauge according to claim 1 , wherein the functional layer includes a function of promoting crystal growth of the resistor.
7. The strain gauge according to claim 1 , further comprising an insulating resin layer with which the resistors are coated.
8. A strain gauge comprising:
a flexible resin substrate;
resistors each formed of a film that includes Cr, CrN, and Cr 2 N; and
a functional layer formed of a metal, an alloy, or a metal compound, the functional layer being in a lower surface of the resistors,
wherein an element included in the functional layer is diffused into the film,
wherein the resistors include:
a first resistor formed on or above a predetermined surface of the substrate;
a second resistor of which a grid direction faces a different direction from the first resistor, the second resistor formed on or above the predetermined surface of the substrate or a surface parallel to the predetermined surface; and
a third resistor formed on or above a surface adjacent to the predetermined surface of the substrate, and
wherein a temperature coefficient of resistance of the strain gauge is in a range of from −1000 ppm/° C. to +1000 ppm/° C.
9. A strain gauge comprising:
a flexible resin substrate;
resistors each formed of a film that includes Cr, CrN, and Cr 2 N; and
a functional layer formed of a metal, an alloy, or a metal compound, the functional layer being in a lower surface of the resistors,
wherein the resistors include:
a first resistor formed on or above a predetermined surface of the substrate;
a second resistor of which a grid direction faces a different direction from the first resistor, the second resistor formed on or above the predetermined surface of the substrate or a surface parallel to the predetermined surface; and
a third resistor formed on or above a surface adjacent to the predetermined surface of the substrate.