E-beam apparatus
An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
1. An e-beam apparatus comprising:
an electron optics system configured to project an e-beam onto an object; an object table to hold the object;
a positioning device configured to move the object table relative to the electron optics system; and
a gravity compensator to at least partly compensate a gravity force on at least one of the object table and a part of the positioning device., wherein the gravity compensator comprises a non-magnetic gravity compensator.
2. The e-beam apparatus according to claim 1 , wherein the non-magnetic gravity compensator comprises a mechanical gravity compensator.
3. The e-beam apparatus according to claim 2 , wherein the mechanical gravity compensator comprises a spring.
4. The e-beam apparatus according to claim 3 , wherein the spring comprises at least one coil spring.
5. The e-beam apparatus according to claim 4 , wherein the spring comprises a plurality of coil springs having an equal number of windings in opposite directions.
6. The e-beam apparatus according to claim 1 , wherein the non-magnetic gravity compensator comprises a pneumatic gravity compensator.
7. An e-beam apparatus comprising:
an electron optics system configured to project an e-beam onto an object;
an object table to hold the object;
a positioning device configured to move the object table relative to the electron optics system, wherein the positioning device comprises a short stroke stage to position the object table and a long stroke stage to position the short stroke stage and the object table; and
a gravity compensator to at least partly compensate a gravity force on at least one of the object table and a part of the positioning device, wherein the gravity compensator comprises a magnetic gravity compensator shielded by a magnetic shield, and wherein the gravity compensator is comprised in the short stroke stage.
8. The e-beam apparatus according to claim 1 , wherein the positioning device comprises a short stroke stage to position the object table and a long stroke stage to position the short stroke stage and the object table, and wherein the gravity compensator is comprised in the short stroke stage.
9. An e-beam apparatus comprising:
an electron optics system configured to project an e-beam onto an object;
an object table to hold the object;
a positioning device configured to move the object table relative to the electron optics system; and
a gravity compensator to at least partly compensate a gravity force on at least one of the object table and a part of the positioning device, wherein the positioning device comprises:
a short stroke stage to position the object table,
a long stroke stage to position the short stroke stage and the object table, and
a position sensor to measure a relative distance between the short stroke stage and the long stroke stage, or between the short stroke stage and the object table.
10. The e-beam apparatus according to claim 9 , wherein the position sensor comprises a non-magnetic position sensor.
11. The e-beam apparatus according to claim 10 , wherein the non-magnetic position sensor comprises an optical position sensor or a strain gauge position sensor.
12. The e-beam apparatus according to claim 9 , wherein the position sensor comprises a magnetic position sensor shielded by a magnetic shield.
13. The e-beam apparatus according to claim 1 , wherein the e-beam apparatus is a scanning electron microscope, an electron beam direct writer, an electron beam projection lithography apparatus, an electron beam inspection apparatus, an electron beam defect verification apparatus, or an electron beam metrology apparatus.
14. The e-beam apparatus according to claim 1 , wherein the positioning device comprises a short stroke stage to position the object table and a long stroke stage to position the short stroke stage and the object table, and wherein the gravity compensator is comprised in the short stroke stage.
15. The e-beam apparatus according to claim 9 , wherein the e-beam apparatus is a scanning electron microscope, an electron beam direct writer, an electron beam projection lithography apparatus, an electron beam inspection apparatus, an electron beam defect verification apparatus, or an electron beam metrology apparatus.