IP Library Granted Patent US 11,315,764
Granted Patent B2
US 11,315,764 · App. 17/015,520 · Granted Apr 26, 2022

Structure variable type of a plasma source coil and a method for controlling the same

Inventors: Woo Hyung Choi (Seongnam-si, KR); Sang Woo Lee (Suwon-si, KR)
Assignee: ADAPTIVE PLASMA TECHNOLOGY CORP.
H01J37/32568H01J37/3211H01J37/3299H01J2237/3344H01L21/67069
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Quick Facts
Patent No.
US 11,315,764
App. No.
17/015,520
Granted
Apr 26, 2022
Kind
B2
Abstract

Provided is a structure variable type of a plasma source coil and a method for controlling the same. The plasma source coil comprises a plurality of coil branches extending in a spiral shape based on a central part, wherein at least one coil branch has a structure in which the extending direction or a tilting level can be adjusted.

Claims (4)

1. A structure variable type of a plasma source coil comprising:

a plurality of coil branches extending in a spiral shape from a central part of the plasma source coil; and

an adjusting guide corresponding to each of the coil branch, the adjusting guide extending in a spiral shape and having a contact point at which an end part of a corresponding coil branch contacts,

wherein the contact point is configured to move along the adjusting guide, thereby an extending direction or a tilting level of the corresponding coil branch being able to be adjusted according to a position of the contact point.

Assignments (2)
CHANGE OF NAME Recorded Jul 25, 2025
From: ADAPTIVE PLASMA TECHNOLOGY CORP.
To: VM INC.
Reel/Frame 071836/0567 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 9, 2020
From: CHOI, WOO HYUNG; LEE, SANG WOO
To: ADAPTIVE PLASMA TECHNOLOGY CORP.
Reel/Frame 053735/0489 →
Priority Claims (1)
KR 10-2020-0051158 · Apr 28, 2020 · national
Continuity (1)
Related Publication 20210335583A1 · Oct 28, 2021