IP Library › Granted Patent US 11,317,519
Granted Patent B2
US 11,317,519 · App. 16/160,347 · Granted Apr 26, 2022

Fabrication of superconducting devices that control direct currents and microwave signals

Inventors: Baleegh Abdo (Fishkill, NY); Markus Brink (White Plains, NY)
Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
H05K3/4644H01P5/12H01P11/001H03H3/00H05K3/06H01P1/2039H01P1/365H03H7/0123H03H7/46
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Quick Facts
Patent No.
US 11,317,519
App. No.
16/160,347
Granted
Apr 26, 2022
Kind
B2
Abstract

Fabrication of superconducting devices that combine or separate direct currents and microwave signals is provided. A method can comprise forming a direct current circuit that supports a direct current, a microwave circuit that supports a microwave signal, and a common circuit that supports the direct current and the microwave signal. The method can also comprise operatively coupling a first end of the direct current circuit and a first end of the microwave circuit to a first end of the common circuit. The direct current circuit can comprise a bandstop circuit and the microwave circuit can comprise a capacitor. Alternatively, the direct current circuit can comprise a bandstop circuit and the microwave circuit can comprise a bandpass circuit. Alternatively, the microwave circuit can comprise a capacitor and the direct current circuit can comprise one or more quarter-wavelength transmission lines.

Claims (20)

1. A method comprising:

forming a direct current circuit that supports a direct current, a microwave circuit that supports a microwave signal, and a common circuit that supports the direct current and the microwave signal, wherein the direct current circuit comprises a bandstop circuit, and wherein the microwave circuit comprises a capacitor;

operatively coupling a first end of the direct current circuit and a first end of the microwave circuit to a first end of the common circuit;

patterning a first superconducting film, deposited on a wafer, with a first portion of the direct current circuit and a first portion of the microwave circuit;

patterning a dielectric film deposited on the first superconducting film; and

patterning a second superconducting film, deposited on the dielectric film, with a second portion of the direct current circuit, a second portion of the microwave circuit, and the common circuit.

2. The method of claim 1 , further comprising forming the bandstop circuit with a bandstop filter that supports the direct current and blocks microwave signals that are within a bandwidth range of a superconducting device.

3. The method of claim 1 , wherein the operatively coupling the first end of the common circuit comprises:

forming a common node at the first end of the common circuit; and

operatively coupling the first end of the direct current circuit and the first end of the microwave circuit to the common node.

4. The method of claim 3 , further comprising:

operatively coupling a second end of the direct current circuit to a direct current port, a second end of the microwave circuit to a microwave port, and a second end of the common circuit to a common port, wherein the direct current port supports the direct current, the microwave port supports the microwave signal, and the common port supports the direct current and the microwave signal.

5. The method of claim 1 , wherein the patterning of the first superconducting film comprises patterning of the first superconducting film with a direct current port that supports the direct current, a microwave port that supports the microwave signal; and a common port that supports the microwave signal and the direct current.

6. The method of claim 1 , wherein the patterning the first superconducting film comprises patterning the first superconducting film with a direct current port that supports the direct current and a common port that supports the microwave signal and the direct current, and wherein the patterning the second superconducting film comprises patterning a microwave port that supports the microwave signal.

7. The method of claim 1 , further comprising:

depositing the first superconducting film at a first thickness, the dielectric film at a second thickness, and the second superconducting film at a third thickness, wherein the third thickness is greater than the first thickness and the second thickness.

8. The method of claim 1 , wherein the patterning further comprises:

patterning the first superconducting film, deposited on the wafer, with the common circuit.

9. The method of claim 8 , wherein the patterning of the first superconducting film comprises patterning the first superconducting film with a direct current port that supports the direct current, a microwave port that supports the microwave signal; and a common port that supports the microwave signal and the direct current.

10. The method of claim 8 , wherein the patterning of the first superconducting film comprises patterning the first superconducting film with a direct current port that supports the direct current and a common port that supports the microwave signal and the direct current, and wherein the patterning the second superconducting film comprises patterning a microwave port that supports the microwave signal.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 15, 2018
From: ABDO, BALEEGH; BRINK, MARKUS
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 047167/0504 →
Continuity (1)
Related Publication 20200120812A1 · Apr 16, 2020