Imprint apparatus, imprint method, and article manufacturing method
Provided is an imprint apparatus that applies a resin (drops) dispersed at a plurality of locations on a substrate, brings the resin and a mold into contact, and transfers the contoured pattern that is formed in the mold to the resin comprising: a controller that sets a principal axis direction according to the contoured pattern and an array direction in which a plurality of resin drops are aligned, and determines application positions for the resin such that the array direction is angled with respect to the principal axis direction; and a dispenser that applies the resin based on the application positions that have been determined.
1. An imprint method comprising:
applying a plurality of drops on a substrate using a plurality of ejection ports of a dispenser;
bringing the plurality of drops and a contoured pattern of a mold into contact in a state that an array direction of the plurality of drops actually aligned on the substrate by the plurality of ejection ports is angled with respect to a principal axis direction of the contoured pattern; and
transferring the contoured pattern of the mold onto the substrate,
wherein the array direction is a direction of a line connecting adjacent drops at the shortest distance in a plan view of the substrate viewed from directly above; and
wherein the contoured pattern has recessed portions extending along a length direction, the recessed portions having a length in the length direction longer than a length in a width direction perpendicular to the length direction, and the principal axis direction is parallel to the length direction of recessed portions of the contoured pattern,
wherein the contoured pattern of the mold includes a first contoured pattern and a second contoured pattern having a different pattern density from the first contoured pattern, and
wherein, in the bringing:
the first contoured pattern of the mold contacts a first plurality of drops on the substrate by a first angle between the array direction of the first plurality of drops and the principal axis direction of the first contoured pattern,
the second contoured pattern of the mold having the different pattern density from the first contoured pattern contacts a second plurality of drops on the substrate by a second angle between the array direction of the second plurality of drops and the principal axis direction of the second contoured pattern, and
the first angle and the second angle differ from each other according to pattern densities of the first contoured pattern and the second contoured pattern.
2. The imprint method according to claim 1 , wherein the array direction is angled with respect to the principal axis direction by rotating the plurality of ejection ports of the dispenser.
3. The imprint method according to claim 1 , wherein the plurality of resin drops are disposed in a polygonal lattice form on the substrate.
4. The imprint method according to claim 1 , further comprising acquiring pattern data for the contoured pattern of the mold and determining the principal axis direction based on the pattern data,
wherein, in the bringing, the plurality of drops and the contoured pattern of the mold are brought into contact with each other based on the determined principal axis direction.
5. The imprint method according to claim 1 , wherein the principal axis direction and the array direction form an acute angle.
6. The imprint method according to claim 1 , wherein the array direction is tilted and that there is a band having a width of a radius of an arbitrary resin drop along the principal axis, and when any arbitrary number of resin drops are in arbitrary n rows (where n is an integer) of the array direction at which arbitrary resin drops are present and in n+1 rows adjacent to these n rows and that overlap the band are determined respectively to be first resin drops and second resin drops, and when the radius of the resin drop is r, the application distances between resin drop is D, the gap in the principal axis direction between the arbitrary resin drop and a second resin drop is L, the angle between the principal axis direction and the array direction is α, and the angle between the principal axis direction and a straight line connecting the arbitrary resin drop and the second resin drop is β, then the angle α is determined so as to satisfy the following conditions:
D (sin α)≤2 r,α> 0°, and
L (tan β)≤2 r.
7. The imprint method according to claim 1 , wherein
the principal axis direction with respect to each of the plurality of partial areas in an area to which the contoured pattern is to be transferred is set, and the array direction are determined based on the principal axis direction for each partial area.
8. An article manufacturing method comprising:
forming a pattern on a substrate using an imprint apparatus; and
processing the substrate on which the pattern has been formed in the forming to obtain the article from the processed substrate,
the forming comprising:
applying a plurality of drops on a substrate using a plurality of ejection ports of a dispenser;
bringing the plurality of drops and a contoured pattern of a mold into contact in a state that an array direction of the plurality of drops actually aligned on the substrate by the plurality of ejection ports is angled with respect to a principal axis direction of the contoured pattern; and
transferring the contoured pattern of the mold onto the substrate,
wherein the array direction is a direction of a line connecting adjacent drops at the shortest distance in a plan view of the substrate viewed from directly above; and
wherein the contoured pattern has recessed portions extending along a length direction, the recessed portions having a length in the length direction longer than a length in a width direction perpendicular to the length direction, and the principal axis direction is parallel to the length direction of recessed portions of the contoured pattern,
wherein the contoured pattern of the mold includes a first contoured pattern and a second contoured pattern having a different pattern density from the first contoured pattern, and
wherein, in the bringing:
the first contoured pattern of the mold contacts a first plurality of drops on the substrate by a first angle between the array direction of the first plurality of drops and the principal axis direction of the first contoured pattern,
the second contoured pattern of the mold having the different pattern density from the first contoured pattern contacts a second plurality of drops on the substrate by a second angle between the array direction of the second plurality of drops and the principal axis direction of the second contoured pattern, and
the first angle and the second angle differ from each other according to pattern densities of the first contoured pattern and the second contoured pattern.