IP Library › Granted Patent US 11,335,467
Granted Patent B2
US 11,335,467 · App. 16/399,521 · Granted May 17, 2022

Systems and methods for improved sustainment of a high performance FRC and high harmonic fast wave electron heating in a high performance FRC

Inventor: Xiaokang Yang (Irvine, CA)
Assignee: TAE TECHNOLOGIES, INC.
G21B1/052H05H1/02
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Quick Facts
Patent No.
US 11,335,467
App. No.
16/399,521
Granted
May 17, 2022
Kind
B2
Abstract

Systems and methods that facilitate forming and maintaining FRCs with superior stability as well as particle, energy and flux confinement and, more particularly, systems and methods that facilitate forming and maintaining FRCs with elevated system energies and improved sustainment utilizing neutral beam injection and high harmonic fast wave electron heating.

Claims (24)

1. A method for generating and maintaining a magnetic field with a field reversed configuration (FRC) comprising the steps of:

forming an FRC about a plasma in a confinement chamber,

injecting a plurality of neutral beams into the FRC plasma at an angle toward the mid-plane of the confinement chamber, and

heating electrons of the FRC plasma with high harmonic fast waves propagating into the FRC plasma by launching a plurality of high harmonic fast waves from one or more antennas into the FRC plasma in the confinement chamber at a launch angle in a range of about 15° to about 25° from the mid-plane of the confinement chamber, wherein the high harmonic fast waves are fast waves in radio frequency ranges.

2. The method of claim 1 , wherein the one or more antennas is a phased array antenna with a plurality of straps.

3. The method of claim 1 , wherein the step of heating the electrons including heating the electrons from about 150 eV to above 1 keV.

4. The method of claim 1 , further includes maintaining the FRC at or about a constant value without decay while injecting beams of fast neutral atoms into the FRC plasma in the confinement chamber and elevating the plasma electron temperatures to above 1.0 keV.

5. The method of claim 1 , further comprising the step of generating a magnetic field within the confinement chamber with quasi dc coils extending about the confinement chamber and a mirror magnetic field within opposing ends of the confinement chamber with quasi dc mirror coils extending about the opposing ends of the confinement chamber.

6. The method of claim 1 , wherein the step of the forming the FRC includes forming a formation FRC in opposing first and second formation sections coupled to the confinement chamber and accelerating the formation FRC from the first and second formation sections towards the mid through plane of the confinement chamber where the two formation FRCs merge to form the FRC.

7. A system for generating and maintaining a magnetic field with a field reversed configuration (FRC) comprising

a confinement chamber,

first and second diametrically opposed FRC formation sections coupled to the confinement chamber,

first and second divertors coupled to the first and second formation sections,

one or more of a plurality of plasma guns, one or more biasing electrodes and first and second mirror plugs, wherein the plurality of plasma guns includes first and second axial plasma guns operably coupled to the first and second divertors, the first and second formation sections and the confinement chamber, wherein the one or more biasing electrodes being positioned within one or more of the confinement chamber, the first and second formation sections, and the first and second outer divertors, and wherein the first and second mirror plugs being position between the first and second formation sections and the first and second divertors,

a gettering system coupled to the confinement chamber and the first and second divertors,

a plurality of neutral atom beam injectors coupled to the confinement chamber and angled toward a mid-plane of the confinement chamber,

a magnetic system comprising a plurality of quasi-dc coils positioned around the confinement chamber, the first and second formation sections, and the first and second divertors, and first and second set of quasi-dc mirror coils positioned between the first and second formation sections and the first and second divertors, and

an antenna system including one or more antennas positioned around the confinement chamber adjacent the mid-plane of the confinement chamber, wherein the antenna system is configured to launch high harmonic fast waves into the FRC plasma at a launch angle in a range of about 15° to about 25° from the mid-plane of the confinement chamber, wherein the high harmonic fast waves are fast waves in radio frequency ranges.

8. The system of claim 7 , wherein the antenna system includes phased array antennas with a plurality of straps.

9. The system of claim 7 , wherein the high harmonic fast waves are fast waves in radio frequency ranges.

10. The system of claim 7 , wherein the system is configured to heat FRC plasma electrons from about 150 eV to above 1 keV.

11. The system of claim 7 , wherein the system is configured to generate an FRC and maintain the FRC without decay while the neutral beams are injected into the plasma.

12. The system of claim 11 , wherein the system is configured to elevate FRC plasma electron temperature above 1 keV.

13. The system of claim 7 , wherein the first and second divertors comprise first and second inner divertors interposing the first and second formation sections and the confinement chamber, and further comprising first and second outer divertors coupled to the first and second formation sections, wherein the first and second formation sections interposing the first and second inner divertors and the first and second outer divertors, and further comprising one or more of first and second axial plasma guns operably coupled to the first and second inner and outer divertors, the first and second formation sections and the confinement chamber, and two or more saddle coils coupled to the confinement chamber.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 12, 2019
From: YANG, XIAOKANG
To: TAE TECHNOLOGIES, INC.
Reel/Frame 049736/0234 →
Continuity (3)
Continuation PCTUS2017061860 · Nov 15, 2017
Provisional Application 62422525 · Nov 25, 2016
Related Publication 20190326023A1 · Oct 24, 2019
Cited By (4)
US 12,432,840 US 12,598,690 US 12,720,663 US 12,738,385