IP Library › Granted Patent US 11,361,934
Granted Patent B2
US 11,361,934 · App. 16/820,016 · Granted Jun 14, 2022

Ion source device

Inventors: Toshikazu Hiasa (Tokyo, JP); Manami Taniguchi (Ehime, JP)
Assignee: SUMITOMO HEAVY INDUSTRIES, LTD.
H01J37/08H01J37/023H01J37/063H01J37/32449H01J37/32669H01J37/32788H01J2237/002
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Quick Facts
Patent No.
US 11,361,934
App. No.
16/820,016
Granted
Jun 14, 2022
Kind
B2
Abstract

There is provided an ion source device including a pair of first electrodes for emitting an electron, a second electrode that defines a region in which the electron is enclosed and to which raw material source gas is supplied, between the pair of first electrodes, and that has a hole portion through which an ion generated by collision between the electron and the material gas is extruded, an extraction electrode disposed apart from the second electrode along an extraction direction of the ion extracted from the second electrode so that a potential difference is formed between the second electrode and the extraction electrode, and an intermediate electrode disposed between the second electrode and the extraction electrode. A first potential difference between the second electrode and the intermediate electrode is greater than a second potential difference between the second electrode and the extraction electrode.

Claims (41)

1. An ion source device comprising:

a vacuum box;

a pair of first electrodes configured to emit an electron, the first electrodes being supported by a first support with respect to the vacuum box;

a second electrode that defines a region, in which the electron is configured to be enclosed and to which raw material gas is configured to be supplied, between the pair of first electrodes, the second electrode comprises a hole portion through which an ion generated by collision between the electron and the material gas is configured to be extracted;

an extraction electrode disposed apart from the second electrode along an extraction direction of the ion extracted from the second electrode so that a potential difference is formed between the second electrode and the extraction electrode, the extraction electrode being supported by a second support with respect to the vacuum box; and

an intermediate electrode disposed between the second electrode and the extraction electrode, the intermediate electrode being supported by a third support with respect to the vacuum box,

wherein a first potential difference between the second electrode and the intermediate electrode is greater than a second potential difference between the second electrode and the extraction electrode.

2. The ion source device according to claim 1 ,

wherein a potential of the second electrode is a positive potential,

wherein a potential of the intermediate electrode is a negative potential, and

wherein a potential of the extraction electrode is a ground potential.

3. The ion source device according to claim 1 , further comprising:

a potential adjustment unit configured to adjust a potential of the intermediate electrode.

4. The ion source device according to claim 1 , further comprising:

a position adjustment unit configured to adjust a position of the intermediate electrode to control a distance between the second electrode and the intermediate electrode.

5. The ion source device according to claim 1 , further comprising:

electromagnets that form a magnetic field inside the vacuum box,

wherein the electromagnets are disposed in pair so that the vacuum box is interposed therebetween.

6. The ion source device according to claim 1 ,

wherein the second electrode forms a cylindrical shape having a first center axis, and is disposed in the vicinity of a center inside the vacuum box.

7. The ion source device according to claim 6 ,

wherein the pair of first electrodes is disposed inside the vacuum box so as to interpose the second electrode therebetween in a direction along the first center axis.

8. The ion source device according to claim 7 ,

wherein both end surfaces along the first center axis of the second electrode face the pair of first electrodes, and a receiving hole portion configured to receive the electron emitted from the pair of first electrodes is disposed in each approximate center of both end surfaces.

9. The ion source device according to claim 8 ,

wherein a cylindrical surface of the second electrode has the hole portion through which the ion is extracted.

10. The ion source device according to claim 9 ,

wherein the ion source device has a cylindrical shape having a second center axis, and

wherein the hole portion of the second electrode is disposed on the second center axis.

11. The ion source device according to claim 1 ,

wherein the second electrode is supported by a fourth support with respect to the vacuum box, is disposed inside the vacuum box, and a gas molecule serving as the raw material gas is introduced into the second electrode via a gas molecule flow path disposed in the support.

12. The ion source device according to claim 1 ,

wherein the pair of first electrodes is supported by a cooling pipe with respect to the vacuum box, is disposed inside the vacuum box, and is cooled by a refrigerant cooling through the cooling pipe.

13. The ion source device according to claim 12 ,

wherein a predetermined potential is applied to the pair of first electrodes via an electric wire disposed in the cooling pipe.

14. The ion source device according to claim 1 ,

wherein the extraction electrode and the intermediate electrode are respectively disposed inside the vacuum box, and one end of the second support and the third support are respectively guided to an outside of the vacuum box via a vacuum seal.

15. The ion source device according to claim 14 ,

wherein the third support is supported by the second support via a member.

16. The ion source device according to claim 15 ,

wherein the member is an insulator.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 16, 2020
From: HIASA, TOSHIKAZU; TANIGUCHI, MANAMI
To: SUMITOMO HEAVY INDUSTRIES, LTD.
Reel/Frame 052128/0435 →
Continuity (2)
Continuation PCTJP2017034323 · Sep 22, 2017
Related Publication 20200219695A1 · Jul 9, 2020