Array substrate, manufacturing method thereof and display panel

1. An array substrate, comprising:

a substrate, the substrate comprising a package area;

a metal layer located on the substrate;

a protective layer, which is etched to only retain the protective layer on the metal layer in the package area; and

a frit coated on the package area and located on the protective layer,

wherein the substrate comprises a display area and a non-display area, the metal layer comprises a plurality of layers formed in the non-display area, dielectric layers are disposed between the plurality of layers, the plurality of layers comprise a bottom metal layer, a middle metal layer and a top metal layer which are separated from each other by the dielectric layers, and the top metal layer in the package area is directly coated with the frit.

2. The array substrate according to claim 1 , wherein at least a portion of a surface of the protective layer in the package area opposite to the metal layer is a concave surface, a convex surface or a concave-convex surface.

3. The array substrate according to claim 2 , wherein the concave surface or the convex surface is one of or a combination of two or more of a cylinder, a cone, a circular truncated cone and a hemisphere, and the concave-convex surface is formed by the concave surface and the convex surface which are connected in an interlaced manner or are distributed at an interval in an interlaced manner.

4. The array substrate according to claim 1 , wherein lines of the plurality of layers are fan-out lines, configured for transmitting electrical signals provided by a driving chip located in the display area.

5. The array substrate according to claim 4 , wherein the non-display area and the display area are located on different surfaces of the substrate.

6. The array substrate according to claim 1 , wherein a material of the protective layer is one or a combination of silicon nitride, silicon oxide and silicon oxynitride.

7. The array substrate according to claim 1 , wherein the protective layer has a thickness of from 2000 Å to 4000 Å.

8. The array substrate according to claim 1 , wherein the protective layer is formed on the top metal layer of the plurality of metal layers in the non-display area, and wherein the protective layer is a single-layer structure or a stack structure.

9. A method for manufacturing an array substrate, comprising:

providing a substrate, and forming at least one metal layer on the substrate;

forming a protective layer, the protective layer covering the metal layer, wherein the substrate comprises a package area and the protective layer is further etched to only retain the protective layer on the metal layer in the package area; and

coating a frit onto the package area, the frit located on the protective layer,

wherein the substrate comprises a display area and a non-display area, the metal layer comprises a plurality of layers formed in the non-display area, the plurality of layers comprise a bottom metal layer, a middle metal layer and a top metal layer which are separated from each other by dielectric layers, and the top metal layer in the package area is directly coated with the frit.

10. The method for manufacturing an array substrate according to claim 9 , wherein the package area is located in the non-display area;

the metal layer is formed simultaneously in the non-display area and the display area; and

the protective layer is formed simultaneously in the non-display area and the display area, and the method further comprises removing a portion of the protective layer corresponding to a position of a contact hole in the display area to expose the contact hole.

11. The method for manufacturing an array substrate according to claim 10 , wherein the non-display area and the display area are located on different surfaces of the substrate.

12. The method for manufacturing an array substrate according to claim 9 , wherein the protective layer has a thickness of from 2000 Å to 4000 Å.

13. The method for manufacturing an array substrate according to claim 9 , wherein the protective layer is etched by plasma etching with an etching gas including mixture of C 2 HF 5 , H 2 and Ar, and the etching selection ratio of the protective layer to other film layers is greater than 5:1.

14. A display panel, comprising an array substrate and a glass cover plate, the array substrate comprising:

a substrate, the substrate comprising a package area;

a metal layer located on the substrate; and

a protective layer formed only in the package area and covering the metal layer in the package area,

wherein the package area of the array substrate is coated with a frit to package the array substrate and the glass cover plate, and the frit is located on the protective layer,

wherein the substrate comprises a display area and a non-display area, the metal layer comprises a plurality of layers formed in the non-display area, dielectric layers are disposed between the plurality of layers, the plurality of layers comprise a bottom metal layer, a middle metal layer and a top metal layer which are separated from each other by the dielectric layers, and the top metal layer in the package area is directly coated with the frit.

15. The display panel according to claim 14 , wherein lines of the plurality of layers are fan-out lines, configured for transmitting electrical signals provided by a driving chip located in the display area.

16. The display panel according to claim 15 , wherein the non-display area and the display area are located on different surfaces of the substrate.

17. The display panel according to claim 14 , wherein the protective layer has a thickness of from 2000 Å to 4000 Å.

18. The display panel according to claim 17 , wherein at least part of a surface of the protective layer in the package area opposite to the metal layer is a concave surface, a convex surface or a concave-convex surface, the concave surface or the convex surface is one of or a combination of two or more of a cylinder, a cone, a circular truncated cone and a hemisphere, and the concave-convex surface is formed by the concave surface and the convex surface which are connected in an interlaced manner or are distributed at an interval in an interlaced manner.

19. The display panel according to claim 14 , wherein a material of the protective layer is one or a combination of silicon nitride, silicon oxide and silicon oxynitride.

20. The display panel according to claim 14 , wherein the protective layer is formed on the top metal layer of the plurality of metal layers in the non-display area, and wherein the protective layer is a single-layer structure or a stack structure.