Semiconductor device and manufacturing method thereof
A semiconductor device according to the present embodiment includes a first chip and a second chip. A first pad is disposed so as to be exposed from a first region on a first surface. A first mark is provided by a first pattern and is disposed so as to be exposed from a second region. The second chip includes a second substrate, a second wire, a second pad, and a second mark. The second wire is disposed on the second substrate. The second pad is disposed so as to be exposed from a third region on a second surface, and is electrically connected to the second wire and the first pad. The second mark is provided by a second pattern corresponding to the first pattern, is disposed so as to be exposed from a fourth region, and has a thinner thickness than the second pad.
1. A semiconductor device comprising:
a first chip; and
a second chip having a second surface on which the second chip is bonded to the first chip, the second surface being opposed to a first surface of the first chip, wherein
the first chip includes
a first substrate,
a first wire that is disposed on the first substrate,
a first pad that is disposed so as to be exposed from a first region on the first surface and that is electrically connected to the first wire, and
a first mark that is provided by a first pattern and that is disposed so as to be exposed from a second region which is different from the first region, and
the second chip includes
a second substrate,
a second wire that is disposed on the second substrate,
a second pad that is disposed so as to be exposed from a third region on the second surface and that is electrically connected to the second wire and the first pad, and
a second mark that is provided by a second pattern corresponding to the first pattern, that is disposed so as to be exposed from a fourth region which is different from the third region, and that has a thinner thickness from the second surface than the second pad.
2. The semiconductor device according to claim 1 , wherein
a width of the second mark is narrower than a width of the second pad.
3. The semiconductor device according to claim 1 , wherein
the second pad includes
a first pad portion that is disposed so as to be exposed from the third region, and that has a thickness from the second surface equal to a thickness, of the second mark, from the second surface, and
a second pad portion that is disposed below the first pad portion, and that is different in a width from the first pad portion.
4. A manufacturing method of a semiconductor device, the method comprising:
forming a first hole and a first trench of a first pattern, in a first region and a second region different from the first region on a first surface of a first wafer;
forming, in the first hole, a first pad that is electrically connected to a first wire in the first wafer, and further, forming a first mark in the first trench;
forming, in a third region and a fourth region different from the third region on a second surface of a second wafer, a second hole and a second trench of a second pattern corresponding to the first pattern, the second trench being shallower from the second surface than the second hole;
forming, in the second hole, a second pad that is electrically connected to a second wire in the second wafer, and further, forming a second mark in the second trench;
bonding the first wafer and the second wafer together such that the first surface is opposed to the second surface; and
detecting a positional deviation between the first pad and the second pad in accordance with the first mark and the second mark.
5. The manufacturing method of a semiconductor device according to claim 4 , further comprising:
detecting a positional deviation between the first pad and the second pad by detecting a position of the first mark and a position of the second mark from the second wafer side.
6. The manufacturing method of a semiconductor device according to claim 5 , further comprising:
forming, on the first surface, a mask having a thickness that is thinner in the third region than in the fourth region, prior to forming the second hole and the second trench; and
forming the second hole, and further, forming the second trench.
7. The manufacturing method of a semiconductor device according to claim 6 , comprising
forming the mask by lithography using a photomask in which a transmittance corresponding to the third region is higher than a transmittance corresponding to the fourth region, prior to forming the second hole and the second trench.
8. The manufacturing method of a semiconductor device according to claim 6 , comprising
forming the mask by lithography using a template that has a plurality of projections such that a projection corresponding to the third region is higher than a projection corresponding to the fourth region, prior to forming the second hole and the second trench.
9. The manufacturing method of a semiconductor device according to claim 5 , comprising
forming the second hole, and further, forming the second trench that is shallower than the second hole by forming the second trench having a narrower width than the second hole.
10. The manufacturing method of a semiconductor device according to claim 5 , comprising:
forming, in the third region, a third hole having a first width; and
forming the second hole by forming, in the third region, a fourth hole having a second width different from the first width, and further, forming the second trench.
11. The manufacturing method of a semiconductor device according to claim 4 , further comprising:
forming, on the first surface, a mask having a thickness that is thinner in the third region than in the fourth region, prior to forming the second hole and the second trench; and
forming the second hole, and further, forming the second trench.
12. The manufacturing method of a semiconductor device according to claim 11 , comprising
forming the mask by lithography using a photomask in which a transmittance corresponding to the third region is higher than a transmittance corresponding to the fourth region, prior to forming the second hole and the second trench.
13. The manufacturing method of a semiconductor device according to claim 11 , comprising
forming the mask by lithography using a template that has a plurality of projections such that a projection corresponding to the third region is higher than a projection corresponding to the fourth region, prior to forming the second hole and the second trench.
14. The manufacturing method of a semiconductor device according to claim 4 , comprising
forming the second hole, and further, forming the second trench that is shallower than the second hole by forming the second trench having a narrower width than the second hole.
15. The manufacturing method of a semiconductor device according to claim 4 , comprising:
forming, in the third region, a third hole having a first width; and
forming the second hole by forming, in the third region, a fourth hole having a second width different from the first width, and nuttier, forming the second trench.