Atomic layer deposition systems, methods, and devices
A system includes a chamber, a support structure disposed in the chamber, and one or more heads. The support structure is configured to support and position a substrate. The one or more heads includes an energy source coupled to a near-field transducer for providing localized energy towards the support structure at select locations within the chamber.
1. A system comprising:
a chamber;
a support structure disposed in the chamber and configured to support and position a substrate by rotation around a rotation axis; and
heads each including a respective energy source coupled to a respective near-field transducer for providing localized energy towards the support structure at select locations within the chamber, wherein each head includes multiple gas inlet openings.
2. The system of claim 1 , wherein the energy source comprises a laser.
3. The system of claim 1 , further comprising: waveguides each optically coupled between one of the energy sources and one of the near-field transducers.
4. The system of claim 1 , wherein the heads comprises an array of near-field transducers.
5. The system of claim 1 , wherein the chamber further includes an actuation assembly for positioning the support structure towards or away from the one or more heads.
6. The system of claim 1 , wherein the heads includes a first group of heads and a second group of heads, wherein the first group of heads is configured to deliver a first gas, wherein the second group of heads is configured to deliver a second gas.
7. The system of claim 6 , wherein the heads includes a third group of heads configured to deliver a third gas.
8. The system of claim 1 , further comprising a heating unit configured to heat the support structure.
9. The system of claim 1 , wherein the heads are positionable within the chamber.
10. The system of claim 1 , further comprising baffles positioned within the chamber to direct gas delivered by the heads to a target region.
11. The system of claim 1 , wherein the support structure is controlled along the rotation axis to be lowered after deposition of a first precursor to maintain a predetermined working distance between a top surface of the substrate and the heads for deposition of a second precursor.
12. The system of claim 1 , wherein each near-field transducer includes a peg and a disk.
13. The system of claim 12 , wherein the disk comprises metal.
14. The system of claim 1 , wherein each energy source and each near-field transducer is individually addressable.
15. The system of claim 1 , wherein gas inlet openings are arranged along a row on each head.
16. The system of claim 1 , wherein the heads are secured to a top of the chamber.
17. The system of claim 1 , wherein the near-field transducers comprise gold.
18. A device comprising:
a head comprising a body with gas inlet openings therethrough;
lasers coupled to the body;
near-field transducers coupled to the body, each near-field transducer is optically coupled one of the lasers; and
waveguides coupled to the body, each waveguide is optically coupled between one of the lasers and one of the near-field transducers and not positioned within the gas inlet openings.
19. The device of claim 18 , wherein the body forms an injection channel on outer surface.
20. The device of claim 19 , wherein the injection channel is fluidically coupled to the gas inlet openings.