IP Library › Granted Patent US 11,377,743
Granted Patent B2
US 11,377,743 · App. 16/619,584 · Granted Jul 5, 2022

Multilayer structure and method for producing multilayer structure

Inventors: Mikito Suto (Tokyo, JP); Takeshi Suzuki (Tokyo, JP); Yusuke Nakagawa (Tokyo, JP); Katsumi Kojima (Tokyo, JP); Hiroki Habazaki (Sapporo, JP); Yuki Satoh (Sapporo, JP)
Assignees: JFE Steel Corporation; National University Corporation Hokkaido University
C23C28/02B01J21/063B01J35/004B32B18/00C23C28/32C23C28/345C25D9/08B01J35/02
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Quick Facts
Patent No.
US 11,377,743
App. No.
16/619,584
Granted
Jul 5, 2022
Kind
B2
Abstract

Provided are: a multilayer structure in which a titanium oxide layer exhibits excellent photocatalytic activity; and a method for producing this multilayer structure. The above-described multilayer structure comprises: a conductive part which contains a metal element A other than Ti, while having electrical conductivity; and a titanium oxide layer which is arranged on the conductive part and contains 1.0% by atom or more of the metal element A.

Claims (15)

1. A multilayer structure comprising:

a conductive portion containing an element A which is not Ti and having electrical conductivity; and

a titanium oxide layer disposed on the conductive portion and containing the element A in an amount of not less than 1.0 at %,

wherein the element A is at least one selected from the group consisting of Al, Ga, In, Sn, Pb, Bi, V, Cr, Mn, Fe, Co, Zn, Nb, Mo, Ru, Rh, Pd, Ag, W, Si and Sb, and

wherein a proportion of anatase-type titanium dioxide in the titanium oxide layer is not less than 12.2%.

2. The multilayer structure according to claim 1 ,

wherein a proportion of anatase-type titanium dioxide in the titanium oxide layer is not less than 40.0%.

3. The multilayer structure according to claim 1 , further including at least one type of base selected from the group consisting of a metallic base, a ceramic base and a resin base,

wherein the conductive portion is disposed on the base.

4. A multilayer structure comprising:

a conductive portion containing a metal element A which is not Ti and having electrical conductivity; and

a titanium oxide layer disposed on the conductive portion and containing the metal element A in an amount of not less than 1.0 at %,

wherein the metal element A is Ni.

5. The multilayer structure according to claim 4 , further including at least one type of base selected from the group consisting of a metallic base, a ceramic base, and a resin base,

wherein the conductive portion is disposed on the base.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 10, 2020
From: SUTO, MIKITO; SUZUKI, TAKESHI; NAKAGAWA, YUSUKE; KOJIMA, KATSUMI; HABAZAKI, HIROKI; SATOH, YUKI
To: JFE STEEL CORPORATION; NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY
Reel/Frame 051478/0031 →
Priority Claims (1)
JP JP2017-114097 · Jun 9, 2017 · national
Continuity (1)
Related Publication 20200131645A1 · Apr 30, 2020