Die stack structure and manufacturing method thereof
A die stack structure including a first die, an encapsulant, a redistribution layer and a second die is provided. The encapsulant laterally encapsulates the first die. The redistribution layer is disposed below the encapsulant, and electrically connected with the first die. The second die is disposed between the redistribution layer and the first die, wherein the first and second dies are electrically connected with each other, the second die comprises a body portion having a first side surface, a second side surface and a curved side surface therebetween, and the curved side surface connects the first side surface and the second side surface.
1. A die stack structure, comprising:
a first die;
an encapsulant laterally encapsulating the first die;
a redistribution layer, disposed below the encapsulant and electrically connected with the first die;
a second die, disposed between the redistribution layer and the first die, wherein the first and second dies are electrically connected with each other,
wherein the second die comprises a body portion having a first side surface, a second side surface and a curved side surface therebetween, and the curved side surface connects the first side surface and the second side surface, and the second die comprises a flange portion surrounding the body portion, wherein the flange portion has an outer profile vertically aligned with an outer profile of the encapsulant.
2. The die stack structure according to claim 1 , wherein the encapsulant further covers the second die and contacts the curved side surface of the second die.
3. The die stack structure according to claim 1 , wherein the body portion comprises a semiconductor substrate and an interconnect structure disposed on the semiconductor substrate, and a material of the flange portion is the same as a material of the semiconductor substrate of the body portion.
4. The die stack structure according to claim 3 , wherein a top surface of the flange portion is lower than a top surface of the semiconductor substrate of the body portion.
5. The die stack structure according to claim 3 , wherein a top surface of the flange portion is substantially coplanar with a top surface of the semiconductor substrate of the body portion.
6. The die stack structure according to claim 1 , wherein the encapsulant is in physical contact with the redistribution layer.
7. The die stack structure according to claim 1 , wherein an outer profile of the encapsulant is vertically aligned with an outer profile of the body portion, and an outer profile of the redistribution layer is vertically aligned with an outer profile of the body portion.
8. A die stack structure, comprising:
a first die;
an encapsulant laterally encapsulating the first die;
a redistribution layer, disposed below the encapsulant and electrically connected with the first die;
a second die, disposed between the redistribution layer and the first die, wherein the first and second dies are electrically connected with each other,
wherein the second die comprises a body portion having a first side surface, a second side surface and a third side surface, the second side surface located between the first and third side surfaces connects the first side surface and the third side surface, a first obtuse angle is included between the first side surface and the second side surface, and a second obtuse angle is included between the second side surface and the third side surface, and the second die comprises a flange portion surrounding the body portion, wherein the flange portion has an outer profile vertically aligned with an outer profile of the encapsulant.
9. The die stack structure according to claim 8 , wherein the encapsulant further covers the second die and contacts the second side surface of the second die.
10. The die stack structure according to claim 8 , wherein the body portion comprises a semiconductor substrate and an interconnect structure disposed on the semiconductor substrate, and a material of the flange portion is the same as a material of the semiconductor substrate of the body portion.
11. The die stack structure according to claim 10 , wherein a top surface of the flange portion is substantially coplanar with a top surface of the semiconductor substrate of the body portion.
12. The die stack structure according to claim 10 , wherein a top surface of the flange portion is lower than a top surface of the semiconductor substrate of the body portion.
13. The die stack structure according to claim 8 , wherein the encapsulant is in physical contact with the redistribution layer.
14. The die stack structure according to claim 8 , wherein an outer profile of the encapsulant is vertically aligned with an outer profile of the body portion, and an outer profile of the redistribution layer is vertically aligned with an outer profile of the body portion.
15. A method of manufacturing a die stack structure, comprising:
providing a semiconductor wafer having first dies;
performing a trench forming process on the first dies of the semiconductor wafer, the trench forming process comprising:
providing a mask with openings; and
performing an anisotropic etching with the mask to form ring-shaped trenches in the first dies of the semiconductor wafer corresponding to the openings, wherein each of the first dies of the semiconductor wafer comprises a flange portion located right under the corresponding ring-shaped trench and a body portion laterally surrounded by the corresponding ring-shaped trench and the flange portion;
bonding seconds dies onto the first dies of the semiconductor wafer;
encapsulating the second dies by an encapsulant to form a molded wafer;
forming a redistribution layer on the molded wafer; and
performing a singulation process to the molded wafer, wherein the flange portion has an outer profile vertically aligned with an outer profile of the encapsulant.
16. The method according to claim 15 , wherein at least one of the ring-shaped trenches has a first sidewall, a second sidewall and a curved sidewall located therebetween, and the curved sidewall connects the first sidewall and the second sidewall.
17. The method according to claim 15 , wherein at least one of the ring-shaped trenches has a first sidewall, a second sidewall and a third sidewall, the second sidewall located between the first sidewall and the third sidewall connects the first sidewall and the third sidewall, a first obtuse angle is included between the first sidewall and the second sidewall, and a second obtuse angle is included between the second sidewall and the third sidewall.
18. The method according to claim 15 , wherein at least one of the first dies comprises a semiconductor substrate and an interconnect structure disposed on the semiconductor substrate, and the trench forming process etches through the interconnect structures of the first dies to form the ring-shaped trenches.
19. The method according to claim 18 , wherein the trench forming process etches through the interconnect structures of the first dies and etches into the semiconductor substrates of the first dies to form the ring-shaped trenches.
20. The method according to claim 15 , wherein the encapsulant fills into the ring-shaped trench.