Top plane connections for electro-optic devices including a through-hole in rear substrate
Methods of making a top-plane connection in an electro-optic device and devices including such connections. A through hole is created through a rear substrate to provide a connection between a conductor coupled to the rear substrate and a light-transmissive conductive layer coupled to a top transparent substrate. The hole is subsequently filled with a top-plane connection material that provides an electrical connection between the conductor and the light-transmissive conductive layer, but does not provide an electrical connection between a separate rear conductive layer and the light-transmissive conductor.
1. An electro-optic device comprising:
a front transparent substrate;
a rear substrate having a through-hole and a plurality of conductors;
a light-transmissive conductive layer coupled to the front transparent substrate;
a rear conductive layer coupled to the rear substrate;
an insulating layer adjacent the rear substrate; and
a top-plane connection material disposed in the through-hole traversing the rear substrate such that at least one of the plurality of conductors is electrically connected via the top-plane connection material to the light-transmissive conductive layer,
wherein the at least one of the plurality of conductors is not electrically connected to the rear conductive layer, and
wherein the at least one of the plurality of conductors covers the entire interior of the through-hole traversing the rear substrate, thereby providing more connection surface area between the at least one of the plurality of conductors and the top-plane connection material than the connection surface area when the at least one of the plurality of conductors does not cover the entirety of the through-hole in the rear substrate.
2. The electro-optic device of claim 1 , wherein the the insulating layer also includes a through-hole coupled to the through-hole in the rear substrate.
3. The electro-optic device of claim 2 , wherein the insulating layer surrounds the top-plane connection material and forms a boundary from the rear conductive layer.
4. The electro-optic device of claim 1 , wherein the electro-optic device comprises an electrophoretic medium.
5. The electro-optic device of claim 1 , wherein the electro-optic device is an electro-wetting device.
6. The electro-optic device of claim 1 , wherein the insulating layer comprises a dielectric material.
7. The electro-optic device of claim 6 , wherein the dielectric material comprises silicon nitride, an insulating polymer, a cross-linkable monomer, or a cross-linkable oligomer.
8. The electro-optic device of claim 1 , wherein the through-hole is formed with a laser, a drill, or a diamond saw.
9. The electro-optic device of claim 1 , wherein the through-hole is a slot cut at an edge of the rear substrate.
10. The electro-optic device of claim 1 , wherein the top-plane connection material comprises silver or carbon filled epoxy.