Display component, display device, and method for manufacturing same

1. A method for manufacturing a display device, the method comprising:

forming a display unit comprising a bending area and a non-bending area on a first surface of a mother substrate;

aligning a mask in which a mask opening is defined on a second surface of the mother substrate;

plasma treating the second surface of the mother substrate;

removing the mask and attaching a protective film to the second surface of the mother substrate; and

removing a portion of the protective film to define a film opening therethrough corresponding to the bending area,

wherein the mask opening defines the film opening and corresponds to the bending area,

wherein the second surface of the mother substrate comprises polymer resin, and by the plasma treating, a first proportion of a polymer in the bending area is greater than in a second proportion of the polymer the non-bending area.

2. The method of claim 1 ,

wherein the protective film comprises an adhesive layer and a protective film base, and

the protective film base is attached to the second surface of the mother substrate through the adhesive layer therebetween.

3. The method of claim 2 , wherein the protective film base comprises polyimide.

4. The method of claim 1 , wherein the removing of the portion of the protective film comprises irradiating the second surface of the mother substrate corresponding to the bending area with ultraviolet light.

5. The method of claim 1 ,

wherein the plasma treating comprises:

injecting the mother substrate into a reactor; and

performing a plasma treatment of the mother substrate during a predetermined processing time in the reactor.

6. The method of claim 5 ,

wherein the display unit further comprises a non-bending area adjacent to the bending area, and

the processing time is set such that a proportion of a silicon polymeric material on a portion of the second surface of the mother substrate corresponding to the bending area becomes greater than a proportion of a silicon polymeric material on another portion of the second surface of the mother substrate corresponding to the non-bending area.

7. The method of claim 6 , wherein a rate at which the mother substrate passes through the reactor is 100 millimeters per second (mm/s) or more.

8. The method of claim 1 ,

wherein the forming of the display unit comprises forming a plurality of display units disposed apart from each other on the first surface of the mother substrate, and

each of the plurality of display units comprises the bending area.