MRAM structure and method of fabricating the same
A magnetoresistive random access memory (MRAM) structure includes a magnetic tunnel junction (MTJ), and a top electrode which contacts an end of the MTJ. The top electrode includes a top electrode upper portion and a top electrode lower portion. The width of the top electrode upper portion is larger than the width of the top electrode lower portion. A bottom electrode contacts another end of the MTJ. The top electrode, the MTJ and the bottom electrode form an MRAM.
1. A magnetoresistive random access memory (MRAM) structure comprising:
a magnetic tunnel junction (MTJ);
a top electrode contacting a first end of the MTJ, wherein the top electrode comprises a top electrode upper portion and a top electrode lower portion, and a width of the top electrode upper portion is larger than a width of the top electrode lower portion, and the width of the top electrode upper portion is larger than a width of the MTJ;
a bottom electrode contacting a second end of the MTJ, wherein the top electrode, the MTJ and the bottom electrode form an MRAM, wherein a width of the bottom electrode is the same as the width of the MTJ;
a spacer surrounding and contacting a sidewall of the top electrode lower portion, a sidewall of the MTJ, and a sidewall of the bottom electrode, wherein the spacer is monolithic, and the sidewall of the top electrode lower portion, the sidewall of the MTJ and the sidewall of the bottom electrode are aligned with each other;
a bottom electrode contact plug disposed under the bottom electrode and contacting the bottom electrode; and
a first conductive line disposed at one side of the MRAM, wherein a top surface of the first conductive line is aligned with a top surface of the top electrode upper portion, a bottom of the first conductive line is aligned with a bottom of the bottom electrode contact plug, and the first conductive line is a dual damascene structure.
2. The MRAM structure of claim 1 , wherein the top electrode lower portion contacts the MTJ.
3. The MRAM structure of claim 1 , wherein the top electrode upper portion connects to the top electrode lower portion.
4. The MRAM structure of claim 1 , wherein the width of the top electrode lower portion is the same as the width of the MTJ.
5. The MRAM structure of claim 1 , further comprising:
a second conductive line disposed on the top electrode and contacting the top electrode upper portion, wherein the second conductive line has a bottom surface contacting the top electrode upper portion, and a width of the bottom surface is smaller than the width of the top electrode upper portion.
6. The MRAM structure of claim 1 , wherein the top electrode upper portion comprises titanium nitride or tantalum and the top electrode lower portion comprises titanium nitride or tantalum.
7. A magnetoresistive random access memory (MRAM) structure comprising:
a first dielectric layer;
a second dielectric layer disposed on and contacting the first dielectric layer;
a magnetic tunnel junction (MTJ);
a top electrode contacting a first end of the MTJ, wherein the top electrode comprises a top electrode upper portion and a top electrode lower portion, and a width of the top electrode upper portion is larger than a width of the top electrode lower portion, and the width of the top electrode upper portion is larger than a width of the MTJ;
a bottom electrode contacting a second end of the MTJ, wherein the top electrode, the MTJ and the bottom electrode form an MRAM, a width of the bottom electrode is the same as the width of the MTJ, the top electrode upper portion is embedded within the second dielectric layer, and the top electrode lower portion, the MTJ and the bottom electrode are embedded within the first dielectric layer;
a bottom electrode contact plug disposed under the bottom electrode and contacting the bottom electrode; and
a first conductive line disposed at one side of the MRAM, wherein a top surface of the first conductive line is aligned with a top surface of the top electrode upper portion, a bottom of the first conductive line is aligned with a bottom of the bottom electrode contact plug, and the first conductive line is a dual damascene structure.