Memory device and semiconductor device
It is an object to provide a memory device whose power consumption can be suppressed and a semiconductor device including the memory device. As a switching element for holding electric charge accumulated in a transistor which functions as a memory element, a transistor including an oxide semiconductor film as an active layer is provided for each memory cell in the memory device. The transistor which is used as a memory element has a first gate electrode, a second gate electrode, a semiconductor film located between the first gate electrode and the second gate electrode, a first insulating film located between the first gate electrode and the semiconductor film, a second insulating film located between the second gate electrode and the semiconductor film, and a source electrode and a drain electrode in contact with the semiconductor film.
1. A manufacturing method of a semiconductor device, comprising:
forming a gate electrode;
forming a gate insulating film over the gate electrode;
forming an oxide semiconductor film over the gate insulating film, the oxide semiconductor film comprising indium, gallium, and zinc;
performing a first heat treatment after the oxide semiconductor film is formed at a temperature higher than or equal to 350° C. and lower than or equal to 850° C.;
forming a source electrode and a drain electrode over the oxide semiconductor film;
forming a first insulating film which comprises oxygen over the oxide semiconductor film, the source electrode, and the drain electrode; and
performing a second heat treatment after the first insulating film is formed at a temperature higher than or equal to 200° C. and lower than or equal to 400° C.,
wherein the oxide semiconductor film comprises a crystal whose c-axis is aligned perpendicular to an upper surface of the oxide semiconductor film.
2. The manufacturing method of the semiconductor device according to claim 1 , wherein moisture or hydrogen in the oxide semiconductor film is reduced by the first heat treatment.
3. The manufacturing method of the semiconductor device according to claim 1 , wherein oxygen is supplied to the oxide semiconductor film by the second heat treatment.
4. The manufacturing method of the semiconductor device according to claim 1 , wherein the oxide semiconductor film is an intrinsic type (i-type) oxide semiconductor film or substantially i-type oxide semiconductor film after the second heat treatment is performed.