Position metrology apparatus and associated optical elements
Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.
1. A variable attenuator comprising:
a first mirror element comprising a first region of high reflectivity and a second region of semi-transparency;
a second semi-transparent mirror element arranged a distance apart from the first mirror element; and
an actuator configured to vary the distance between the first mirror element and the second mirror element.
2. The variable attenuator of claim 1 , wherein the actuator is a piezoelectric actuator.
3. The variable attenuator of claim 1 , further comprising an absorber material configured to absorb any radiation not reflected by the first mirror element and the second mirror element.