IP Library Granted Patent US 11,454,882
Granted Patent B2
US 11,454,882 · App. 16/922,328 · Granted Sep 27, 2022

Pellicle for reflective mask

Inventors: Jinhwan Lee (Osan-si, KR); Jeonggil Kim (Hwaseong-si, KR); Sunghyup Kim (Hwaseong-si, KR)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
G03F1/64G03F1/62
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Quick Facts
Patent No.
US 11,454,882
App. No.
16/922,328
Granted
Sep 27, 2022
Kind
B2
Abstract

A pellicle for a reflective mask includes a pellicle body, a pellicle frame below the pellicle body to support the pellicle body, and a pattern structure in at least a part of a surface of the pellicle body, wherein the pattern structure includes a plurality of patterns.

Claims (32)

1. A pellicle for a reflective mask, the pellicle comprising:

a pellicle body;

a pellicle frame to support the pellicle body; and

a pattern structure in at least a part of a surface of the pellicle body, the pattern structure being integral to and of a same body as the pellicle body,

wherein the pattern structure comprises a plurality of patterns.

2. The pellicle of claim 1 , wherein the plurality of patterns are over the entire surface of the pellicle body.

3. The pellicle of claim 1 , wherein the plurality of patterns comprise penetration patterns spaced apart from each other and penetrate the pellicle body.

4. The pellicle of claim 1 , wherein the plurality of patterns comprise non-penetration patterns spaced apart from each other and do not penetrate the pellicle body.

5. The pellicle of claim 1 , wherein the plurality of patterns comprise concavo-convex patterns having a plurality of concave patterns and a plurality of convex patterns.

6. The pellicle of claim 5 , wherein the pattern structure further comprises at least one ventilation penetration pattern that penetrates the pellicle body inside the plurality of patterns.

7. The pellicle of claim 5 , wherein the pattern structure further comprises a planarization layer on the concave patterns and the convex patterns while burying the concave patterns.

8. The pellicle of claim 5 , wherein the pattern structure further comprises a curved layer on the concave patterns and the convex patterns and is curved along the concave patterns and the convex patterns.

9. The pellicle of claim 1 , wherein the plurality of patterns comprise at least one type of patterns from among circular patterns, elliptical patterns, and polygonal patterns in a plan view.

10. The pellicle of claim 1 , wherein the plurality of patterns include at least a first pattern and a second pattern, different from one another.

11. A pellicle for a reflective mask, the pellicle comprising:

a pellicle body;

a pellicle frame to support the pellicle body; and

a first pattern structure and a second pattern structure spaced apart from each other on a surface of the pellicle body the first and second pattern structures being integral to and of a same body as the pellicle body,

wherein the first pattern structure comprises a plurality of first patterns spaced apart from each other, and the second pattern structure comprises a plurality of second patterns spaced apart from each other.

12. The pellicle of claim 11 , wherein the plurality of first patterns have different shapes from the plurality of second patterns in a plan view.

13. The pellicle of claim 11 , wherein the plurality of first patterns and the plurality of second patterns comprise at least one type of penetration patterns which penetrate the pellicle body and non-penetration patterns which do not penetrate the pellicle body.

14. The pellicle of claim 13 , wherein the at least one type of penetration patterns are arranged along an edge of the pellicle body, and the non-penetration patterns are placed at a central portion of the pellicle body.

15. The pellicle of claim 11 , wherein the plurality of first and second patterns comprise at least one type of patterns from among circular patterns, elliptical patterns, and polygonal patterns.

16. A pellicle for a reflective mask, the pellicle comprising:

a pellicle body;

a pellicle frame at a periphery of the pellicle body to support the pellicle body and including an upper portion which supports the pellicle body, wherein a width of the upper portion of the pellicle frame is greater than a width of a lower portion of the pellicle frame; and

a pattern structure including a plurality of patterns on the entire surface of the pellicle body,

wherein the plurality of patterns comprise concavo-convex patterns which are configured in the same body as the pellicle body and include a plurality of concave patterns and a plurality of convex patterns.

17. The pellicle of claim 16 , wherein the pattern structure further comprises at least one ventilation penetration pattern penetrating the pellicle body inside the plurality of patterns.

18. The pellicle of claim 16 , wherein the pattern structure further comprises a planarization layer on the concave patterns and the convex patterns.

19. The pellicle of claim 16 , wherein the pattern structure further comprises a curved layer on the concave pattern and the convex patterns.

20. The pellicle of claim 16 , wherein the concavo-convex patterns are configured as sawtooth patterns, ladder patterns, or peak patterns.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 13, 2020
From: LEE, JINHWAN; KIM, JEONGGIL; KIM, SUNGHYUP
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 053186/0218 →
Priority Claims (1)
KR 10-2019-0131392 · Oct 22, 2019 · national
Continuity (1)
Related Publication 20210116802A1 · Apr 22, 2021