Charged particle beam apparatus and cleaning method
To provide a charged particle beam apparatus. The charged particle beam apparatus includes: a stage on which a sample is placed; a cleaner configured to remove a contaminant on the sample; and a stage control unit configured to adjust a relative positional relationship between the cleaner and the sample by moving the stage during use of the cleaner.
1. A charged particle beam apparatus comprising:
a stage on which a sample is placed;
a lens barrel in which the sample is scanned with a charged particle beam;
a cleaner configured to remove a contaminant on the sample by changing a hydrocarbon-based molecule adsorbed or adhered to a surface of the sample to carbon monoxide or carbon dioxide from a direction different from a direction in which the lens barrel is disposed;
a stage control unit configured to adjust a relative positional relationship between the cleaner and the sample by moving the stage during use of the cleaner;
wherein the stage control unit is configured to move the stage such that a distance between the sample and the cleaner is smaller than a predetermined value which serves as a reference for increasing a cleaning effect.
2. The charged particle beam apparatus according to claim 1 , wherein
the stage control unit is configured to move the stage based on a shape of the sample.
3. The charged particle beam apparatus according to claim 1 , wherein
the stage control unit is configured to move the stage based on a position of the lens barrel.
4. The charged particle beam apparatus according to claim 1 , wherein
the stage control unit is configured to continuously move the stage during operation of the cleaner.
5. The charged particle beam apparatus according to claim 1 , wherein
the stage control unit is configured to rotate the stage during operation of the cleaner.
6. The charged particle beam apparatus according to claim 1 , wherein
the stage control unit is configured to tilt the stage such that the cleaner is positioned in a normal direction of the stage.
7. The charged particle beam apparatus according to claim 1 , further comprising:
a cleaner control unit configured to control the cleaner; and
a processor configured to transmit an instruction signal to the stage control unit and the cleaner control unit.
8. The charged particle beam apparatus according to claim 7 , wherein
the processor is configured to allow the stage control unit and the cleaner control unit to be in conjunction with each other at a time set in advance by a user.
9. A charged particle beam apparatus comprising:
a stage on which a sample is placed;
a lens barrel in which the sample is scanned with a charged particle beam;
a cleaner configured to remove a contaminant on the sample by changing a hydrocarbon-based molecule adsorbed or adhered to a surface of the sample to carbon monoxide or carbon dioxide from a direction different from a direction in which the lens barrel is disposed;
a stage control unit configured to adjust a relative positional relationship between the cleaner and the sample by moving the stage during use of the cleaner;
wherein the stage control unit is configured to move the stage such that a distance between the sample and the cleaner is larger than a predetermined value which serves as a reference for reducing a cleaning effect.
10. A cleaning method performed by a charged particle beam apparatus, wherein the charged particle beam apparatus includes:
a stage on which a sample is placed;
a lens barrel in which the sample is scanned with a charged particle beam;
a cleaner configured to remove a contaminant on the sample by changing a hydrocarbon-based molecule adsorbed or adhered to a surface of the sample to carbon monoxide or carbon dioxide from a direction different from a direction where the lens barrel is disposed;
a stage control unit configured to move the stage, the cleaning method comprising:
an adjusting step of adjusting, by the stage control unit, a relative positional relationship between the cleaner and the sample by moving the stage during use of the cleaner;
wherein the stage control unit is configured to move the stage such that a distance between the sample and the cleaner is smaller than a predetermined value which serves as a reference for increasing a cleaning effect.
11. The cleaning method according to claim 10 , wherein
in the adjusting step, the stage is tilted such that the cleaner is positioned in a normal direction of the stage.
12. The cleaning method according to claim 10 , wherein
in the adjusting step, the stage is rotated during operation of the cleaner.