Floating gate memristor device and neuromorphic device having the same
View Patent ↗Disclosed is a floating gate memristor device comprising: a substrate; a floating gate disposed on the substrate; an insulating layer covering the floating gate; a first electrode including a plurality of control terminals disposed on the insulating layer and spaced apart from each other, wherein the plurality of control terminals vertically overlap the floating gate; a second electrode spaced away from the first electrode, wherein a ground voltage is applied to the second electrode; and a third electrode disposed on the substrate and electrically connected to the floating gate.
1. A floating gate memristor device comprising:
a substrate;
a floating gate disposed on the substrate;
an insulating layer covering the floating gate;
a first electrode including a plurality of control terminals disposed on the insulating layer and spaced apart from each other, wherein the plurality of control terminals vertically overlap the floating gate;
a second electrode spaced away from the first electrode, wherein a ground voltage is applied to the second electrode; and
a third electrode disposed on the substrate and electrically connected to the floating gate.
2. The floating gate memristor device of claim 1 , wherein when a control voltage is applied to a first control terminal of the control terminals, charges tunnel between the first control terminal and the floating gate.
3. The floating gate memristor device of claim 2 , wherein a control voltage selected from a group consisting of a ground voltage, a first control voltage greater than the ground voltage, and a second control voltage lower than the ground voltage is sequentially applied to the control terminals at a predetermined interval.
4. The floating gate memristor device of claim 3 , wherein a potential of the floating gate is controlled based on control voltages applied to the control terminals.
5. The floating gate memristor device of claim 1 , wherein the second electrode is disposed on the insulating layer.
6. The floating gate memristor device of claim 1 , wherein the second electrode is disposed between the substrate and the floating gate and vertically overlaps all of the control terminals.
7. The floating gate memristor device of claim 6 , wherein the insulating layer includes a first portion disposed between the control terminals and the floating gate, and a second portion disposed between the second electrode and the floating gate,
wherein in order to suppress tunneling of the charges between the floating gate and the second electrode, a thickness of the second portion is greater than a thickness of the first portion.
8. A neuromorphic device comprising:
a floating gate memristor device including:
a substrate;
a floating gate disposed on the substrate;
an insulating layer covering the floating gate;
a first electrode including a plurality of control terminals disposed on the insulating layer and spaced apart from each other, wherein the plurality of control terminals vertically overlap the floating gate;
a second electrode spaced away from the first electrode, wherein a ground voltage is applied to the second electrode;
a reset electrode disposed on the insulating layer and vertically overlapping the floating gate; and
a third electrode disposed on the substrate and electrically connected to the floating gate; and
a reset voltage generator including an input terminal electrically connected to the third electrode and an output terminal electrically connected to the reset electrode,
wherein when a voltage of the floating gate is greater than a first threshold voltage, the reset voltage generator is configured to generate a reset voltage and apply the reset voltage to the reset electrode.
9. The neuromorphic device of claim 8 , wherein when the reset voltage is applied to the reset electrode, charges tunnel between the reset electrode and the floating gate, such that charges charged in the floating gate are discharged and thus a voltage of the floating gate returns to an initial state.
10. The neuromorphic device of claim 8 , wherein the second electrode is disposed on the insulating layer.
11. The neuromorphic device of claim 8 , wherein the second electrode is disposed between the substrate and the floating gate and vertically overlaps all of the control terminals.