IP Library › Granted Patent US 11,473,849
Granted Patent B2
US 11,473,849 · App. 16/874,782 · Granted Oct 18, 2022

Vapor chamber

Inventor: Akihito Naito (Nagaokakyo, JP)
Assignee: MURATA MANUFACTURING CO., LTD.
F28D15/046
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Quick Facts
Patent No.
US 11,473,849
App. No.
16/874,782
Granted
Oct 18, 2022
Kind
B2
Abstract

The vapor chamber includes a casing, a working fluid, a microchannel, and a wick. The casing includes an upper casing sheet and a lower casing sheet that face each other and are joined together at an outer edge so as to define an internal space therebetween. The working fluid is sealed in the internal space. The microchannel is in the lower casing sheet and in communication with the internal space so as to form a flow path for the working fluid. The wick is in the internal space of the casing and is in contact with the microchannel. A contact area between the wick and the microchannel is 5% to 40% with respect to an area of the internal space taken as a plane.

Claims (28)

1. A vapor chamber comprising:

a casing including an upper casing sheet and a lower casing sheet that face each other and are joined together at an outer edge so as to define an internal space therebetween;

a working fluid in the internal space;

a microchannel in the lower casing sheet and in communication with the internal space so as to form a flow path for the working fluid; and

a wick in the internal space of the casing and in contact with the microchannel, wherein

the wick includes a plurality of holes uniformly aligned with both a first direction and a second direction,

the microchannel includes a plurality of convexes uniformly aligned with both a third direction and a fourth direction,

a first angle (θ 1 ) between the first direction and the second direction is different from a second angle (θ 2 ) between the third direction and the fourth direction, and

a contact area between the wick and the plurality of convexes of the microchannel is 5% to 40% with respect to an area of the internal space taken as a plane.

2. The vapor chamber according to claim 1 , wherein the contact area is 10% to 20% with respect to the area of the internal space taken as the plane.

3. The vapor chamber according to claim 1 , further comprising a joining material that joins the upper casing sheet to the lower casing sheet at the outer edge.

4. The vapor chamber according to claim 3 , wherein the area of the internal space taken as the plane is an area of an inner region of the vapor chamber defined by the joining material.

5. The vapor chamber according to claim 3 , wherein a difference between a thickness of the joining material and a thickness of the wick is 20 μm or less.

6. The vapor chamber according to claim 1 , wherein the plurality of convexes are prism-shaped.

7. The vapor chamber according to claim 6 , wherein an area ratio of a total area of all of the plurality of prism-shaped convexes of the microchannel to an entirety of an area of the microchannel is 5% to 40% in a plan view of the vapor chamber.

8. The vapor chamber according to claim 7 , wherein a height of the plurality of prism-shaped convexes of the microchannel is 5 to 50 μm.

9. The vapor chamber according to claim 6 , wherein a first pitch of the plurality of prism-shaped convexes of the microchannel and a second pitch of holes in the wick are not integral multiples.

10. The vapor chamber according to claim 1 , further comprising a support in the upper casing sheet, the wick being between the support and the lower casing sheet.

11. The vapor chamber according to claim 1 , wherein the wick is bonded to the microchannel.

12. The vapor chamber according to claim 1 , wherein the wick includes a plurality of circular holes.

13. The vapor chamber according to claim 1 , wherein an area of the wick is larger than an area of a region corresponding to the microchannel in a plan view of the vapor chamber.

14. The vapor chamber according to claim 1 , wherein the wick is wider in a plan view of the vapor chamber than a width of the microchannel.

15. The vapor chamber according to claim 1 , wherein the wick is flat.

16. The vapor chamber according to claim 1 , wherein an opening width W 1 of the microchannel is 50 to 200 μm, a thickness D 2 of the wick is 5 to 35 μm, and D 2 : W 1 =5:200 to 30:50.

17. The vapor chamber according to claim 16 , wherein the thickness D 2 of the wick is 15 to 20 μm, and the opening width W 1 of the microchannel is 200 μm.

18. The vapor chamber according to claim 1 , wherein an opening ratio of an area of holes in the wick with respect to an entire area of the wick is 5 to 50%.

19. The vapor chamber according to claim 1 , wherein a ratio of a first opening width on a first surface side of a hole in the wick to a second opening width on a second surface side of the hole in the wick is 1:3 to 1:1.

20. The vapor chamber according to claim 1 , wherein the wick has a region where holes are not formed therein in a plan view of the vapor chamber, a width of a narrowest portion of the region is 0.1 to 10 mm, and an area of the region is 90% or less of an entire area of the wick in the plan view.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 15, 2020
From: NAITO, AKIHITO
To: MURATA MANUFACTURING CO., LTD.
Reel/Frame 052670/0052 →
Continuity (1)
Related Publication 20210356212A1 · Nov 18, 2021
Cited By (1)
US 12,546,542