Nanostructures for optical devices
Embodiments of metasurfaces having nanostructures with desired geometric profiles and configurations are provided in the present disclosure. In one embodiment, a metasurface includes a nanostructure formed on a substrate, wherein the nanostructure is cuboidal or cylindrical in shape. In another embodiment, a metasurface includes a plurality of nanostructures on a substrate, wherein each of the nanostructures has a gap greater than 35 nm spaced apart from each other. In yet another embodiment, a metasurface includes a plurality of nanostructures on a substrate, wherein the nanostructures are fabricated from at least one of TiO 2 , silicon nitride, or amorphous silicon, or GaN or aluminum zinc oxide or any material with refractive index greater than 1.8, and absorption coefficient smaller than 0.001, the substrate is transparent with absorption coefficient smaller than 0.001.
1. A metasurface, comprising:
An array of nanostructures formed on a substrate, the array of nanostructures having one or more nanostructures that are cuboidal or cylindrical in shape, wherein each nanostructure of the array of nanostructures is positioned away from each other with a gap therebetween, wherein the gap is greater than 35 nm, wherein the gap defined in a first group of nanostructures is greater than the gap defined in a second group of the nanostructures, and wherein the gap is larger in the first group of the nanostructures when the nanostructures in the first group have higher refractive index.
2. The metasurface of claim 1 , wherein the nanostructures of the array of nanostructures are cuboidal in shape with rounded corners.
3. The metasurface of claim 1 , wherein the nanostructures of the array of nanostructures have different lateral dimensions.
4. The metasurface of claim 1 , wherein the nanostructure having a cuboidal or cylindrical shape has a uniform lateral dimension.
5. The metasurface of claim 1 , wherein the nanostructure having a cuboidal or cylindrical shape comprises a dielectric material.
6. The metasurface of claim 5 , wherein the dielectric material is at least one of titanium dioxide, silicon nitride, amorphous silicon, crystalline silicon, gallium nitride, and aluminum zinc oxide.
7. The metasurface of claim 1 , wherein the gap defined between nanostructures of the array of nanostructures is greater when the nanostructure has a higher height.
8. The metasurface of claim 1 , further comprising:
an encapsulating layer encapsulating the nanostructure having a cuboidal or cylindrical shape.
9. The metasurface of claim 1 , wherein the nanostructure having a cuboidal or cylindrical shape has a refractive index greater than 1.8 and an absorption coefficient smaller than 0.001.
10. The metasurface of claim 1 , wherein the nanostructures of the array of nanostructures provide all possible values of transmission phase between 0 and 2π.
11. The metasurface of claim 1 , wherein the nanostructures of the array of nanostructures provide a value of transmission amplitude close to 1.
12. A metasurface, comprising:
a plurality of nanostructures on a substrate, wherein each of the nanostructures are spaced apart from each other by a gap greater than 35 nm, wherein the gap defined in a first group of nanostructures of the plurality of nanostructures is greater than the gap defined in a second group of nanostructures of the plurality of nanostructures, and wherein the gap is larger in the first group of nanostructures when nanostructures of the first group of nanostructures have higher refractive index.
13. The metasurface of claim 12 , wherein the nanostructures are cuboidal or cylindrical in shape.
14. The metasurface of claim 12 , wherein the nanostructures have refractive index greater than 1.8.
15. The metasurface of claim 12 , wherein the nanostructures are fabricated from at least one of titanium dioxide, silicon nitride, amorphous silicon, crystalline silicon, gallium nitride and aluminum zinc oxide.
16. A metasurface, comprising:
a plurality of nanostructures on a substrate, wherein the plurality of nanostructures are fabricated from at least one of TiO 2 , silicon nitride, amorphous silicon, GaN, aluminum zinc oxide or any material with refractive index greater than 1.8 and absorption coefficient smaller than 0.001, wherein the substrate is transparent with absorption coefficient smaller than 0.001, wherein a gap defined in a first group of nanostructures of the plurality of nanostructures is greater than a gap defined in a second group of nanostructures of the plurality of nanostructures, and wherein the gap defined in the first group of nanostructures is larger in the first group of nanostructures when the nanostructures in the first group of nanostructures have a higher refractive index.