Semiconductor manufacturing apparatus having an insulating plate

1. A semiconductor manufacturing apparatus, comprising:

a process chamber;

an insulating plate dividing an interior space of the process chamber into a first interior space and a second interior space and thermally isolating the first interior space from the second interior space;

a gas supply configured to supply a process gas to the first interior space;

a plasma generator configured to generate plasma, in the first interior space, from the process gas;

a ring-shaped radiator configured to heat the first interior space;

a stage disposed within the second interior space and configured to support a substrate therein; and

a plurality of gas injectors installed on the ring-shaped radiator and radially spaced apart from each other,

wherein each of the plurality of gas injectors is directly contacted by a corresponding heating element of the ring-shaped radiator on opposite sides thereof such that the process gas is heated as it moves through a flow path of each of the plurality of gas injectors,

wherein the ring-shaped radiator is configured to heat the first interior space to a first temperature while the plasma is generated in the first interior space, and

wherein the insulating plate is configured to thermally insulate the second interior space from the first interior space such that a temperature of the second interior space is maintained lower than the first temperature of the first interior space while the plasma is generated in the first interior space.

2. The semiconductor manufacturing apparatus of claim 1 , further comprising:

a reflective plate disposed on the insulating plate and configured to block radiation heat transfer between the first interior space and the second interior space.

3. The semiconductor manufacturing apparatus of claim 1 , wherein the plurality of gas injectors is configured to inject the process gas supplied from the gas supply into the first interior space and towards the center of the process chamber.

4. The semiconductor manufacturing apparatus of claim 1 , wherein the insulating plate comprises an enclosed air pocket disposed therein, the air pocket filled with air.

5. The semiconductor manufacturing apparatus of claim 1 , wherein the stage comprises a stage heater configured to heat the substrate while it is supported on the stage.

6. The semiconductor manufacturing apparatus of claim 5 , wherein the stage heater is configured to heat the substrate to a second interior temperature that is less than the first temperature.

7. The semiconductor manufacturing apparatus of claim 6 , wherein the first temperature is between about 700° C. to about 1200° C., inclusive and the second temperature is between about 100° C. and about 600° C., inclusive.

8. The semiconductor manufacturing apparatus of claim 1 ,

wherein the plasma generator is configured to generate an inductively coupled plasma, a capacitively coupled plasma, or a microwave plasma.

9. The semiconductor manufacturing apparatus of claim 1 , wherein the insulating plate includes a low thermal conductivity material that thermally isolates the first interior space of the process chamber that includes the heating element from the second interior space of the process chamber that includes the stage.

10. The semiconductor manufacturing apparatus of claim 9 , wherein the low thermal conductivity material includes ceramic or quartz.

11. The semiconductor manufacturing apparatus of claim 1 , wherein each of the heating elements of the ring-shaped radiator comprises a lamp, an ultraviolet (UV) light source, a light-emitting diode (LED) light source, a laser light source, or a hot wire.

12. A semiconductor manufacturing apparatus, comprising:

a process chamber;

an insulating plate dividing an interior space of the process chamber into a first interior space, in which plasma is generated, and a second interior space, in which the plasma generated in the first interior space is diffused;

a gas supply configured to supply a process gas to the first interior space;

a plasma generator configured to generate plasma from the process gas supplied to the first interior space;

a ring-shaped radiator configured to heat the first interior space to a first temperature while the plasma is generated in the first interior space;

a stage configured to support a substrate within the second space and including a stage heater that is configured to heat the substrate to a second interior temperature that is less than the first temperature; and

a plurality of gas injectors installed on the ring-shaped radiator and radially spaced apart from each other,

wherein each of the plurality of gas injectors is directly contacted by a corresponding heating element of the ring-shaped radiator on opposite sides thereof such that the process gas is heated as it moves through a flow path of each of the plurality of gas injectors, and

wherein the insulating plate is configured to thermally insulate the second interior space from the first interior space such that a temperature of the second interior space is maintained lower than the first temperature of the first interior space while the plasma is generated in the first interior space.

13. The semiconductor manufacturing apparatus of claim 12 , further comprising:

a reflective plate disposed on the insulating plate,

wherein the reflective plate comprises a second through hole communicating with a first through hole in the insulating plate.

14. The semiconductor manufacturing apparatus of claim 12 , wherein the plurality of gas injectors is configured to inject the process gas supplied from the gas supply through the ring-shaped radiator into the first interior space.

15. The semiconductor manufacturing apparatus of claim 12 ,

wherein the stage heater is configured to heat the substrate while the plasma is generated in the first interior space.

16. A semiconductor manufacturing apparatus, comprising:

a process chamber including a first interior space in which plasma is generated and a second interior space in which a substrate is processed;

an insulating plate thermally isolating the first interior space from the second interior space and including a first through hole through which plasma is transmitted from the first interior space to the second interior space;

a gas supply configured to supply a process gas including carbon into the first interior space;

a plasma generator configured to generate plasma, in the first interior space, from the process gas;

a ring-shaped radiator configured to heat the first interior space to a first temperature while the plasma is generated in the first interior space;

a stage configured to support the substrate within the second interior space and including a stage heater that is configured to heat the substrate to a second temperature that is less than the first temperature; and

a plurality of gas injectors installed on the ring-shaped radiator and radially spaced apart from each other,

wherein each of the plurality of gas injectors is directly contacted by a corresponding heating element of the ring-shaped radiator on opposite sides thereof such that the process gas is heated as it moves through a flow path of each of the plurality of gas injectors, and

wherein the insulating plate is configured to thermally insulate the second interior space from the first interior space such that a temperature of the second interior space is maintained lower than the first temperature of the first interior space while the plasma is generated in the first interior space.

17. The semiconductor manufacturing apparatus of claim 16 , further comprising:

a reflective plate provided on the insulating plate and configured to block radiation heat transfer between the first interior space and the second interior space,

wherein the reflective plate comprises at least one second through hole through which plasma is transmitted from the first interior space to the second interior space.

18. The semiconductor manufacturing apparatus of claim 16 , wherein the plurality of gas injectors is configured to inject the process gas supplied from the gas supply into the first interior space, and

wherein the plurality of gas injectors is configured to inject the process gas, heated by the ring-shaped radiator, into the first interior space.