IP Library Granted Patent US 11,517,757
Granted Patent B2
US 11,517,757 · App. 16/348,397 · Granted Dec 6, 2022

Non-therma plasma device with electromagnetic compatibility control

Inventors: Johannes Pieter de Penning (Eindhoven, NL); Paulien Smits (Eindhoven, NL); Wouter Bastiaan Zeper (Eindhoven, NL)
Assignee: PlasmaCure B.V.
A61N1/44A61N1/0492H05H1/2406A61N1/0468A61N1/0484
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Quick Facts
Patent No.
US 11,517,757
App. No.
16/348,397
Granted
Dec 6, 2022
Kind
B2
Abstract

An electrode arrangement is described that is configured to be coupled to a high voltage source for a dielectric barrier discharge plasma treatment of an irregularly three-dimensionally shaped surface of an electrically conducting body. The three-dimensionally shaped surface is used as a counter electrode. A first planar electrode is coupled to the high voltage source via a first lead, fitted to the object to be treated and brought in contact with a dielectric. A second electrode is contacted with the surface to be treated as reference electrode. The second electrode is provided in an edge portion that is circumferential to the first planar electrode and configured to be coupled to a reference voltage source via a second lead. An isolating cover layer covers the electrode and a third electrode covers the isolating cover layer as a ground electrode.

Claims (19)

1. An electrode arrangement to be coupled to a high voltage source for a dielectric barrier discharge plasma treatment of an irregularly three-dimensionally shaped surface to be treated, of an electrically conducting body, that is used as a counter electrode, the electrode arrangement comprising:

a first planar electrode to be coupled to the high voltage source via a first lead;

a dielectric formed by a flexible material in such a way that the dielectric shields the first planar electrode from the surface to be treated; and

a spacer defining a structured surface on a side of the electrode arrangement facing the surface to be treated,

wherein, during the dielectric barrier discharge plasma treatment, said first planar electrode is constructed to be fitted to an object to be treated and contacts the dielectric, and

wherein the electrode arrangement further comprises:

a second electrode that, during the dielectric barrier discharge plasma treatment, is configured to be contacted with the surface to be treated and functions as a reference electrode wherein the second electrode is provided in an edge portion that is circumferential to the first planar electrode and is coupled to a reference voltage source via a second lead;

an isolating cover layer covering the first planar electrode; and

a third electrode covering said isolating cover layer as a ground electrode.

2. The electrode arrangement, according to claim 1 , wherein the first lead connects to a high voltage clamp, and the second lead connects to a reference voltage clamp.

3. The electrode arrangement, according to claim 1 , wherein the second lead has a pairing portion that extends from the edge portion to pair the first lead.

4. The electrode arrangement, according to claim 3 , wherein the pairing portion extends to a high voltage clamp with a cut-out portion extending between the high voltage clamp and a reference electrode clamp.

5. The electrode arrangement, according to claim 1 , wherein the second electrode comprises a conductive sticker edge.

6. The electrode arrangement, according to claim 1 , wherein the first planar electrode is a stretchable mesh.

7. The electrode arrangement, according to claim 1 , wherein the first planar electrode is formed from a continuous conductive wire.

8. The electrode arrangement, according to claim 1 , wherein the first planar electrode is formed from a conductive wire that is coated with a dielectric.

9. The electrode arrangement, according to claim 1 , wherein the first planar electrode is connected to a contact with slide contacts of a printed circuit board (PCB) connector.

10. The electrode arrangement, according to claim 1 , further comprising a driver circuit for driving the first planar electrode that is coupled to the high voltage source, wherein the driver circuit drives the first planar electrode in a pulsed voltage in a range of 3-8 kV, repetition rate in a range of 0.5-100 kHz, and a pulse duration in a range of one nanosecond to 150 microseconds.

11. The electrode arrangement according to claim 10 wherein the driver circuit comprises a planar electrode identification circuit.

Assignments (2)
CHANGE OF ADDRESS Recorded Apr 21, 2021
From: PLASMACURE B.V.
To: PLASMACURE B.V.
Reel/Frame 055997/0379 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 19, 2019
From: DE PENNING, JOHANNES PIETER; SMITS, PAULIEN; ZEPER, WOUTER BASTIAAN
To: PLASMACURE B.V.
Reel/Frame 050087/0485 →
Priority Claims (1)
NL 2017822 · Nov 18, 2016 · national
Continuity (1)
Related Publication 20200069956A1 · Mar 5, 2020