Method for fabricating chamber parts
One example of the disclosure provides a method of fabricating a chamber component with a coating comprising a yttrium containing material with desired film properties. In one example, the method of fabricating a coating material includes providing a base structure comprising an aluminum containing material. The method further includes forming a coating layer that includes a yttrium containing material on the base structure. The method also includes thermal treating the coating layer to form a treated coating layer.
1. A method of fabricating a coating material, comprising:
providing a base structure comprising an aluminum containing material;
forming a coating layer comprising a yttrium containing material on the base structure; and
thermal treating the coating layer with a thermal source to form a treated coating layer, wherein the thermal source has an energy density between about 1 μJ/cm 2 and about 2 μJ/cm 2 , and a frequency between about 1 kHz and about 20 MHz.
2. The method of claim 1 , wherein the yttrium containing material is at least one of yttrium oxide or fluorine yttrium oxide, or fluorine yttrium oxide with metal dopants.
3. The method of claim 1 , wherein thermal treating the coating layer comprises:
performing a laser treatment process on the coating layer.
4. The method of claim 3 , wherein performing the laser treatment process comprises:
directing a light radiation from a laser module to a surface of the coating layer.
5. The method of claim 4 , wherein the laser module provides the light radiation having a wavelength between about 187 nm and about 10000 nm.
6. The method of claim 4 , wherein the laser module provides the light radiation having a wavelength between 248 nm and about 2100 nm.
7. The method of claim 1 , wherein thermal treating the coating layer further comprises:
maintaining a base structure temperature at between about 15 degrees Celsius and about 75 degrees Celsius.
8. The method of claim 1 , wherein the yttrium containing material is yttrium oxide.
9. The method of claim 1 , wherein the treated coating layer has a film density greater than 4 g/cm 3 .
10. The method of claim 1 , wherein the treated coating layer has a thickness between about 0.5 μm and about 50 μm.
11. The method of claim 1 , wherein the base structure is a gas distribution plate or a substrate support assembly in a processing chamber.
12. The method of claim 1 , wherein the base structure is a chamber component utilized in a plasma processing chamber.
13. The method of claim 1 , wherein the treated coating layer has a surface roughness greater than Ra 5 micrometer.
14. The method of claim 1 , wherein the aluminum containing material of the base structure is Al 2 O 3 , AlN or a ceramic material.
15. The method of claim 1 , wherein thermal treating the coating layer further comprises:
removing surface particles from the base structure.
16. A method of fabricating a coating material, comprising:
providing a base structure comprising an aluminum containing material;
forming a coating layer comprising a yttrium containing material on the base structure; and
laser treating the coating layer to form a treated coating layer, wherein the laser has an energy density between about 1 μJ/cm 2 and about 2 μJ/cm 2 , and a frequency between about 1 kHz and about 20 MHz.
17. The method of claim 16 , wherein the yttrium containing material is at least one of yttrium oxide, fluorine yttrium oxide, or fluorine yttrium oxide with metal dopants.
18. The method of claim 16 , wherein the base structure is a gas distribution plate disposed in a plasma processing chamber.
19. A method of fabricating a coating material, comprising:
forming a coating layer comprising a yttrium containing material on a base structure, the base structure comprising an aluminum containing material; and
laser treating the coating layer to form a treated coating layer, the laser treating comprising:
applying a series of laser pulses to the coating layer, wherein each laser pulse of the series of laser pulses has an energy density within a range of about 1 μJ/cm 2 to about 2 μJ/cm 2 , a frequency within a range of about 1 kHz to about 20 MHz, a wavelength within a range of about 248 nm to about 2100 nm, and a duration within a range of about 10 femto-seconds to about 10 micro-seconds, and
reacting a gas with the coating layer, the gas containing one or more of oxygen or nitrogen.
20. The method of claim 19 , wherein the gas reacts with the coating layer while the series of laser pulses are applied to alter a bonding energy of the coating layer, and the treated coating layer has:
a density within a range of about 4.0 g/cm 3 to about 5.2 g/cm 3 ;
a yttrium to oxide (Y:O) ratio within a range of about 1:1 to about 2:1;
a thickness within a range of about 0.5 μm to about 50 μm; and
a pore density less than 2%.