Semiconductor devices including spin-orbit torque line and contact plug

1. A semiconductor device comprising:

a first contact plug and a second contact plug in an insulating layer that is on a substrate, the first and second contact plugs spaced apart from each other;

at least a portion of a magnetic tunnel junction (MTJ) overlapping at least a portion of a spin-orbit torque (SOT) line and overlapping at least a portion of the first and second contact plugs, wherein the MTJ is on the SOT line; and

an upper electrode on the MTJ, wherein the MTJ is between the SOT line and the upper electrode.

2. The semiconductor device of claim 1 , wherein the SOT line comprises:

a lower SOT line; and

an upper SOT line on the lower SOT line, the upper SOT line being in direct contact with the MTJ.

3. The semiconductor device of claim 2 , wherein the upper SOT line has a smaller thickness in a first direction perpendicular to the substrate than the lower SOT line.

4. The semiconductor device of claim 2 , wherein the upper SOT line comprises a material having a lower electrical resistivity than the lower SOT line.

5. The semiconductor device of claim 2 , wherein the upper SOT line comprises a material having a higher spin-orbit coupling, a larger spin hall angle, a higher spin/electrical current conductivity than the lower SOT line, or a combination thereof.

6. The semiconductor device of claim 1 , wherein each of the first and second contact plugs comprises an upper surface with a recess region therein that is adjacent the SOT line.

7. The semiconductor device of claim 6 , wherein a sidewall of the recess region is substantially coplanar with a side surface of the SOT line and a side surface of the MTJ.

8. The semiconductor device of claim 6 , wherein the MTJ comprises:

a reference layer;

a storage layer; and

a tunnel layer between the reference layer and the storage layer,

wherein the storage layer is in direct contact with the SOT line.

9. The semiconductor device of claim 8 , wherein a side surface of the reference layer and a side surface of the storage layer are substantially coplanar with a side surface of the upper electrode, a side surface of the SOT line, and a sidewall of the recess region.

10. The semiconductor device of claim 8 , wherein the storage layer and the reference layer overlap the first and second contact plugs.

11. The semiconductor device of claim 1 , further comprising a first transistor and a second transistor on the substrate,

wherein the first contact plug is electrically connected to the first transistor, and

wherein the second contact plug is electrically connected to the second transistor.

12. The semiconductor device of claim 1 , wherein an area, when viewed in a plan view, of the SOT line is substantially equal to an area, when viewed in the plan view, of the MTJ.

13. The semiconductor device of claim 1 , wherein the upper electrode overlaps the first and second contact plugs.

14. The semiconductor device of claim 1 , wherein the SOT line comprises tungsten (W), platinum (Pt), tantalum (Ta), tantalum oxide (TaO), platinum oxide (PtO), tungsten oxide (WO), bismuth antimonide (BiSb), bismuth selenide (BiSe), hafnium (Hf), hafnium oxide (HfO), gold (Au), copper gold (CuAu), copper lead (CuPb), copper platinum (CuPt), copper bismuth (CuBi), copper iridium (CuIr), or a combination thereof.

15. The semiconductor device of claim 1 , wherein the MTJ directly contacts the SOT line.

16. A semiconductor device comprising:

a first contact plug and a second contact plug in an insulating layer that is on a substrate, the first and second contact plugs spaced apart from each other;

at least a portion of a magnetic tunnel junction (MTJ) overlapping at least a portion of a spin-orbit torque (SOT) line and overlapping at least a portion of the first and second contact plugs; and

an upper electrode on the MTJ,

wherein each of the first and second contact plugs comprises an upper surface with a recess region therein that is adjacent the SOT line,

wherein a sidewall of the recess region is substantially coplanar with a side surface of the SOT line and a side surface of the MTJ, and

wherein a side surface of the upper electrode is substantially coplanar with the side surface of the SOT line, the side surface of the MTJ, and the sidewall of the recess region.

17. A semiconductor device comprising:

a first switching element and a second switching element on a substrate;

an insulating layer on the first and second switching elements;

a first contact plug in the insulating layer;

a second contact plug in the insulating layer, the second contact plug spaced apart from the first contact plug;

at least a portion of a magnetic tunnel junction (MTJ) overlapping at least a portion of a spin-orbit torque (SOT) line and overlapping at least a portion of the first and second contact plugs, wherein the MTJ is on the SOT line; and

an upper electrode on the MTJ, wherein the MTJ is between the SOT line and the upper electrode.

18. The semiconductor device of claim 17 , wherein each of the first and second contact plugs comprises an upper surface with a recess region therein that is adjacent the SOT line.

19. The semiconductor device of claim 18 , wherein a sidewall of the recess region is substantially coplanar with a side surface of the SOT line and a side surface of the MTJ.

20. The semiconductor device of claim 17 , wherein the first switching element is a first transistor electrically connected to the first contact plug, and

wherein the second switching element is a second transistor electrically connected to the second contact plug.