Out-of-plane computer-generated multicolor waveguide holography

1. A multicolor waveguide holography system, comprising:

an electron beam resist layer on a substrate, wherein the electron beam resist is selected with a thickness and optical properties to function as a planar waveguide on the substrate to convey optical radiation along a length of the electron beam resist layer;

a grating coupler etched into the planar waveguide of electron beam resist, the grating coupler to couple out-of-plane optical radiation of multiple colors into the planar waveguide of electron beam resist, wherein the grating coupler is patterned to receive each color of multiple colors of optical radiation incident on the grating coupler at a different angle; and

a metasurface hologram comprising a two-dimensional array of tunable subwavelength elements tunable between at least two states with different optical properties to decouple each color of the optical radiation conveyed by the planar waveguide for off-plane propagation to form a dynamic multicolor holographic image in free space.

2. The system of claim 1 , wherein the layer of electron beam resist forming the planar waveguide is deposited on a dielectric cladding layer on the substrate.

3. The system of claim 1 , wherein the electron beam resist comprises ZEP520A.

4. The system of claim 2 , wherein the dielectric cladding layer comprises a silicon dioxide layer.

5. The system of claim 1 , wherein the substrate comprises a silicon (Si) substrate.

6. The system of claim 1 , wherein the grating coupler is configured to:

couple a first color of optical radiation into the planar waveguide that is incident on the grating coupler at a first angle,

couple a second color of optical radiation into the planar waveguide that is incident on the grating coupler at a second angle, and

couple a third color of optical radiation into the planar waveguide that is incident on the grating coupler at a third angle.

7. The system of claim 1 , wherein the electron beam resist has a thickness of approximately 300 nanometers.

8. A multicolor waveguide holography system, comprising:

a substrate;

an optically transmissive material on the substrate, wherein the optically transmissive material is selected with a thickness and optical properties to function as a planar waveguide on the substrate to convey optical radiation along a length of the optically transmissive material;

a grating coupler etched into the planar waveguide of optically transmissive material, the grating coupler to couple out-of-plane optical radiation of multiple colors into the planar waveguide of optically transmissive material, wherein the grating coupler is patterned to receive each color of multiple colors of optical radiation incident on the grating coupler at a different angle; and

a metasurface hologram comprising a two-dimensional array of tunable subwavelength elements tunable between at least two states with different optical properties to decouple each color of the optical radiation conveyed by the planar waveguide of optically transmissive material for off-plane propagation to form a multicolor holographic image in free space.

9. The system of claim 8 , wherein the layer of optically transmissive material forming the planar waveguide is deposited on a dielectric cladding layer on the substrate.

10. The system of claim 9 , wherein the dielectric cladding layer comprises a silicon dioxide layer.

11. The system of claim 8 , wherein the optically transmissive material comprises an electron beam resist.

12. The system of claim 11 , wherein the electron beam resist comprises ZEP520A.

13. The system of claim 8 , wherein the optically transmissive material comprises titanium dioxide (TiO 2 ).

14. The system of claim 8 , wherein the substrate comprises a silicon (Si) substrate.

15. The system of claim 8 , wherein the grating coupler is configured to:

couple a first color of optical radiation into the planar waveguide that is incident on the grating coupler at a first angle,

couple a second color of optical radiation into the planar waveguide that is incident on the grating coupler at a second angle, and

couple a third color of optical radiation into the planar waveguide that is incident on the grating coupler at a third angle.

16. The system of claim 8 , wherein the optically transmissive material has a thickness of approximately 300 nanometers.

17. A multicolor waveguide holography system, comprising:

an optically transmissive planar waveguide to convey optical radiation along a length thereof;

a grating coupler etched into the planar waveguide to couple out-of-plane optical radiation of multiple colors into the planar waveguide; and

a metasurface hologram comprising a two-dimensional array of tunable subwavelength elements to decouple each color of the optical radiation conveyed by the planar waveguide to form a multicolor holographic image.

18. The system of claim 17 , wherein the two-dimensional array of tunable subwavelength elements of the metasurface hologram are tunable between at least two states with different optical properties.

19. The system of claim 17 , wherein the metasurface hologram decouples each color of the optical radiation for off-plane propagation to form the multicolor holographic image in free space.

20. The system of claim 17 , wherein the planar waveguide comprises a layer of electron beam resist formed on a substrate.

21. The system of claim 17 , wherein the planar waveguide comprises a layer of electron beam resist, and wherein the electron beam resist is deposited on dielectric cladding on a substrate.

22. The system of claim 21 , wherein the substrate comprises a silicon (Si) substrate.

23. The system of claim 21 , wherein the dielectric cladding layer comprises a silicon dioxide layer.