Nonvolatile memory device and operating method of the same
A nonvolatile memory device and an operating method thereof are provided. The nonvolatile memory device includes a memory cell array including first to third memory cells sequentially arranged in a vertical stack structure and a control logic configured to apply a first non-selection voltage to the first memory cell, apply a second non-selection voltage different from the first non-selection voltage to the third memory cell, apply a selection voltage to the second memory cell, and select the second memory cell as a selection memory cell.
1. A nonvolatile memory device comprising:
a memory cell array including a first memory cell, a second memory cell, and a third memory cell sequentially arranged in a vertical stack structure;
a control logic configured to select the second memory cell as a selection memory cell by applying a first non-selection voltage to the first memory cell, applying a second non-selection voltage different from the first non-selection voltage to the third memory cell, and applying a selection voltage to the second memory cell; and
a bit line connected to the memory cell array, the bit line configured to apply an operation voltage to the memory cell array,
wherein the first non-selection voltage and the second non-selection voltage have different signs.
2. The nonvolatile memory device of claim 1 , wherein
the control logic is further configured to apply the first non-selection voltage and the second non-selection voltage to the first memory cell and the third memory cell, respectively, such that a Fermi level of a semiconducting layer included in the first memory cell differs from a Fermi level of a semiconducting layer included in the third memory cell in response to the first non-selection voltage being applied to the first memory cell and the second non-selection voltage being applied to the second memory cell.
3. The nonvolatile memory device of claim 1 , wherein a difference between the first non-selection voltage and the second non-selection voltage is less than a difference between the first non-selection voltage and the selection voltage.
4. The nonvolatile memory device of claim 1 , wherein a difference between the first non-selection voltage and the second non-selection voltage is greater than or equal to about 2V.
5. The nonvolatile memory device of claim 1 , wherein the first non-selection voltage and the second non-selection voltage have different absolute values.
6. The nonvolatile memory device of claim 1 , wherein the first non-selection voltage is greater than or equal to 0V and less than or equal to about 7V.
7. The nonvolatile memory device of claim 1 , wherein the second non-selection voltage is greater than or equal to about −15V and less than or equal to about −8V.
8. The nonvolatile memory device of claim 1 , wherein the selection voltage is less than the first non-selection voltage and greater than the second non-selection voltage.
9. The nonvolatile memory device of claim 1 , wherein an absolute value of the selection voltage is less than absolute values of the first non-selection voltage and the second non-selection voltage.
10. The nonvolatile memory device of claim 1 , wherein
the first memory cell, the second memory cell, and the third memory cell are connected in series while being sequentially farther away from the bit line.
11. The nonvolatile memory device of claim 1 , wherein
the operation voltage is a write voltage for writing data to the second memory cell or an erase voltage for erasing the data written to the second memory cell, and
the write voltage and the erase voltage have different signs, and
an absolute value of the write voltage is the same as an absolute value of the erase voltage.
12. The nonvolatile memory device of claim 1 , wherein the memory cell array comprises:
a semiconducting layer extending in a first direction;
a plurality of gates and a plurality of insulating layers extending in a second direction perpendicular to the first direction and alternately disposed with each other;
a gate insulating layer extending in the first direction between the plurality of gates, the plurality of insulating layers, and the semiconducting layer; and
a resistance change layer extending in the first direction on the semiconducting layer.
13. The nonvolatile memory device of claim 12 , wherein the semiconducting layer and the resistance change layer are connected in parallel to each other.
14. The nonvolatile memory device of claim 12 , wherein the resistance change layer is in contact with the semiconducting layer.
15. The nonvolatile memory device of claim 12 , wherein the semiconducting layer is not doped with a dopant.
16. The nonvolatile memory device of claim 12 , wherein the resistance change layer has a hysteresis characteristic.
17. The nonvolatile memory device of claim 12 , wherein the resistance change layer comprises at least one of a transition metal oxide and a transition metal nitride.
18. An operating method of a nonvolatile memory device comprising a memory cell array including a first memory cell, a second memory cell, and a third memory cell sequentially arranged in a vertical stack structure, the operating method comprising:
selecting the second memory cell as a selection memory cell by applying a first non-selection voltage to the first memory cell, applying a second non-selection voltage different from the first non-selection voltage to the third memory cell, and applying a selection voltage to the second memory cell; and
applying an operation voltage to the memory cell array,
the operation being a write operation, an erase operation, and or a read operation,
wherein the first non-selection voltage and the second non-selection voltage have different signs.
19. The operating method of claim 18 , wherein the first non-selection voltage and the second non-selection voltage have magnitudes such that a semiconducting layer included in the first memory cell and a semiconducting layer included in the third memory cell have different Fermi levels.