IP Library › Granted Patent US 11,548,099
Granted Patent B2
US 11,548,099 · App. 17/289,235 · Granted Jan 10, 2023

Laser processing method and laser processing apparatus

Inventors: Koji Funaoka (Tokyo, JP); Masayuki Saiki (Tokyo, JP); Takashi Inoue (Tokyo, JP)
Assignee: MITSUBISHI ELECTRIC CORPORATION
B23K26/382B23K26/0622B23K26/073B23K26/1462B23K26/402B23K2103/172
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Quick Facts
Patent No.
US 11,548,099
App. No.
17/289,235
Granted
Jan 10, 2023
Kind
B2
Abstract

A laser processing method for laser processing of a workpiece made of a base material and a fiber reinforced composite material containing fibers having a thermal conductivity and a processing threshold higher than physical properties of glass fibers. The laser processing method includes a step of processing the workpiece by forming a plurality of through-holes extending through the workpiece by irradiating the workpiece with pulsed laser light from a processing head while relatively moving the workpiece and the processing head in a predetermined cutting direction. The pulsed laser light has a pulse width smaller than 1 ms and an energy density capable of forming each of the through-holes by a single pulse.

Claims (17)

1. A laser processing method for laser processing of a workpiece made of a base material and a fiber reinforced composite material, the fiber reinforced composite material containing fibers having a thermal conductivity and a processing threshold higher than physical properties of glass fibers, the laser processing method comprising:

processing the workpiece by forming a plurality of through-holes extending through the workpiece by irradiating the workpiece with pulsed laser light from a processing head while relatively moving the workpiece and the processing head in a predetermined cutting direction, wherein

the pulsed laser light has a pulse width smaller than 1 ms, a focus diameter d being equal to or less than 200 μm, a pulse energy being equal to or larger than 0.5 J, and an energy density capable of forming each of the through-holes by a single pulse, and each of the through-holes is formed by a single irradiation with the pulsed laser light, wherein

during the laser processing, a jet of gas is emitted from outside of an optical axis of the pulsed laser light toward the optical axis, and

an overlap ratio ro being a ratio of a length by which two of the through-holes adjacent to each other in the cutting direction overlap each other in the cutting direction to the focus diameter d meets a predetermined range, wherein

the workpiece is processed by changing a pulse frequency of the pulsed laser light depending on a processing speed of the workpiece in such a manner that a range of the pulse frequency is depending on a range of the processing speed, the range of the pulse frequency being equal to or larger than 21 Hz and equal to or less than 700 Hz while the range of the processing speed being equal to or larger than 0.2 m/min and equal to or less than 6 m/min, wherein

the jet of gas is emitted from the side of a processed product toward a processing point of the workpiece.

2. The laser processing method according to claim 1 , wherein

when the focus diameter d represents a focus diameter of the pulsed laser light in the cutting direction, a processing length is represented by a processing length L, and the number of pulses of the pulsed laser light emitted to a processing region having the processing length L is represented by the number N of pulses, the predetermined range is expressed by the following formula (1):

0< ro =( d−L/N )/ d< 0.5  (1).

3. The laser processing method according to claim 2 , wherein

the pulsed laser light is focused into a circular shape and emitted to the workpiece, and

the focus diameter d is equal to a width of a laser cut groove cut by the pulsed laser light.

4. The laser processing method according to claim 2 , wherein the overlap ratio ro is 0.2.

5. The laser processing method according to claim 1 , wherein a laser oscillator to emit the pulsed laser light is a CO 2 laser.

6. The laser processing method according to claim 1 , wherein

during the laser processing, the jet of gas is emitted with an application pressure of 0.1 MPa or higher.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 28, 2021
From: FUNAOKA, KOJI; SAIKI, MASAYUKI; INOUE, TAKASHI
To: MITSUBISHI ELECTRIC CORPORATION
Reel/Frame 056064/0011 →
Continuity (1)
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