Method of manufacturing display device and display device
A method of manufacturing a display device includes: forming a first electrode on a substrate; forming an insulating layer on the substrate and on the first electrode; providing light emitting elements in the insulating layer, each of the light emitting elements having a long axis and a short axis crossing the long axis and being configured to emit light; aligning the light emitting elements such that one end of each of the light emitting elements faces the substrate and the long axis of each of the light emitting elements is arranged in a direction from the substrate toward the insulating layer; patterning the insulating layer to form an insulating pattern exposing another end of each of the light emitting elements; and forming a second electrode electrically connected to the exposed other end of each of the light emitting elements.
1. A method of manufacturing a display device, the method comprising:
forming a first electrode on a substrate;
forming an insulating layer on the substrate and on the first electrode;
providing light emitting elements in the insulating layer, each of the light emitting elements having a long axis and a short axis crossing the long axis and being configured to emit light;
aligning the light emitting elements by disposing an alignment electrode over the insulating layer and applying power to each of the first electrode and the alignment electrode to align the light emitting elements such that one end of each of the light emitting elements faces the substrate and the long axis of each of the light emitting elements is arranged in a direction from the substrate toward the insulating layer;
patterning the insulating layer to form an insulating pattern exposing another end of each of the light emitting elements; and
forming a second electrode electrically connected to the exposed other end of each of the light emitting elements.
2. The method of claim 1 , wherein the forming of the first electrode comprises:
forming a reflective layer on the substrate; and
forming a transparent conductive layer on the reflective layer.
3. The method of claim 1 , wherein the forming of the insulating layer comprises applying a photoresist composition on the substrate and on the first electrode.
4. The method of claim 3 , wherein the forming of the insulating layer and the providing of the light emitting elements are concurrently performed by using the photoresist composition comprising the light emitting elements.
5. The method of claim 3 , wherein the patterning of the insulating layer to form the insulating pattern comprises selectively exposing and developing the insulating layer by using a mask.
6. The method of claim 5 , wherein the patterning of the insulating layer to form the insulating pattern comprises using a halftone mask or a slit mask to form the insulating pattern.
7. The method of claim 1 , wherein the patterning of the insulating layer to form the insulating pattern comprises forming the insulating pattern in each pixel region of the substrate.
8. The method of claim 1 , further comprising drying the insulating layer under reduced pressure to fix the aligned light emitting elements after the aligning of the light emitting elements.
9. The method of claim 8 , further comprising heat-treating the insulating layer between the drying of the insulating layer and the patterning of the insulating layer.
10. The method of claim 9 , further comprising removing the light emitting elements in a region outside of pixel regions of the substrate before the heat-treating of the insulating layer.
11. The method of claim 1 , further comprising curing the insulating pattern before the forming the second electrode.