IP Library › Granted Patent US 11,562,883
Granted Patent B2
US 11,562,883 · App. 16/796,425 · Granted Jan 24, 2023

Electron microscope and beam irradiation method

Inventor: Takamitsu Nagai (Yokkaichi Mie, JP)
Assignee: KIOXIA CORPORATION
H01J37/22H01J37/20H01J37/244H01J37/28H01J2237/2448H01J2237/281H01J2237/2806
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,562,883
App. No.
16/796,425
Granted
Jan 24, 2023
Kind
B2
Abstract

An electron microscope includes a stage on which a sample is capable of being placed, a beam generator, a detector, a display, and a controller. The beam generator emits a charged particle beam with which the sample is irradiated. The detector detects a secondary electron or an electron generated from the sample by irradiation with the charged particle beam. The display displays an image of the sample based on a signal from the detector. The controller executes a first irradiation process of specifying a position of a hole bottom by scanning the sample with the charged particle beam when capturing an image of the hole bottom of a hole provided in the sample, and executes a second irradiation process of imaging a shape of the hole bottom by irradiating the hole bottom with the charged particle beam via the hole.

Claims (6)

1. A method for capturing an image of a bottom of a hole formed in a sample, the method comprising:

scanning a first charged particle beam on a surface of the sample on which the hole is formed at a first magnification, the first charged particle beam having a first electric type;

determining a position and a shape of the bottom of the hole of the sample based on a result of scanning of the first charged beam;

irradiating a side wall of the hole with an ultraviolet ray or a second charged particle beam having a second electric type opposite to the first electric type thereby electrically neutralizing the side wall of the hole;

scanning a third charged particle beam on the bottom of the sample at a second magnification, the second magnification being higher than the first magnification; and

displaying the shape of the bottom of the sample based on a result of scanning of the third charged particle beam.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 20, 2020
From: NAGAI, TAKAMITSU
To: KIOXIA CORPORATION
Reel/Frame 051878/0796 →
Priority Claims (1)
JP JP2019-118864 · Jun 26, 2019 · national
Continuity (1)
Related Publication 20200411278A1 · Dec 31, 2020