Wetting layers for optical device enhancement
Embodiments described herein relate to methods and materials for optical device fabrication. In one embodiment, a method of fabricating an optical device is provided. The method includes depositing a dielectric film on a substrate, depositing a wetting layer on the dielectric film, and depositing a metal containing film on the wetting layer. In another embodiment, an optical device is provided. The device includes a substrate, a dielectric film deposited on and contacting the substrate, a wetting layer deposited on and contacting the dielectric film, and a metal containing film deposited on and contacting the wetting layer.
1. A method of fabricating an optical device, comprising:
heating a substrate;
depositing a dielectric film on and in contact with the substrate, the dielectric film formed of an oxide-containing material and having a thickness between about 2 nm and about 8 nm;
depositing a first wetting layer on and in contact with the dielectric film, the first wetting layer comprising a metal selected from the group consisting of titanium, chromium, cobalt, and nickel;
depositing a metal-containing film on and in contact with the first wetting layer, the metal-containing film formed of a reflective metallic material comprising one or more of aluminum, silver, and gold; and
depositing a second wetting layer on and in contact with the metal-containing film, the second wetting layer comprising a dielectric material selected from the group consisting of silicon, silicon oxide, tantalum oxide, aluminum oxide, gallium phosphide, and gallium nitride.
2. The method of claim 1 , wherein the oxide-containing material is titanium dioxide.
3. The method of claim 1 , wherein the dielectric film is a multi-layered stack.
4. The method of claim 1 , further comprising:
etching a surface of the substrate prior to depositing the dielectric film on the substrate.
5. The method of claim 1 , wherein one or more of the dielectric film, the first wetting layer, the second wetting layer, or the metal-containing film are deposited by a physical vapor deposition process.
6. The method of claim 1 , wherein the first wetting layer is incorporated into the metal layer by an annealing process.
7. The method of claim 1 , wherein heating the substrate occurs prior to depositing the dielectric film, and wherein heating the substrate comprises:
transferring the substrate into a process chamber from a load lock chamber; and
heating the substrate to desorb water vapor.
8. The method of claim 1 , wherein a second dielectric layer is formed over the second wetting layer.
9. A method of fabricating an optical device, comprising:
heating a substrate;
depositing a dielectric layer on and in contact with the substrate, the dielectric layer formed of an oxide-containing material selected from the group consisting of titanium dioxide, hafnium oxide, zirconium oxide, lanthanum oxide, and aluminum oxide, the dielectric layer having a thickness between about 2 nm and about 8 nm;
depositing a first wetting layer on and in contact with the dielectric layer, the first wetting layer comprising a metal selected from the group consisting of titanium, chromium, cobalt, and nickel;
depositing a metal-containing film on and in contact with the first wetting layer, the metal-containing film formed of a reflective metallic material comprising one or more of aluminum, silver, and gold; and
depositing a second wetting layer on and in contact with the metal layer, the second wetting layer comprising a dielectric material selected from the group consisting of silicon, silicon oxide, tantalum oxide, aluminum oxide, gallium phosphide, and gallium nitride.
10. The method of claim 9 , wherein the oxide-containing material is titanium dioxide.
11. The method of claim 9 , wherein a second dielectric layer is formed over the second wetting layer.
12. The method of claim 9 , wherein one or more of the dielectric layer, the first wetting layer, the second wetting layer, or the metal layer are deposited by a physical vapor deposition process.
13. A method of fabricating an optical device, comprising:
depositing a first dielectric layer over and in contact with a surface of a substrate via physical vapor deposition, the first dielectric layer comprising titanium oxide and having a thickness between about 2 nm and about 8 nm;
depositing a first metal layer over and in contact with the titanium oxide layer, the first metal layer consisting of titanium, chromium, cobalt, or nickel;
forming a second metal layer over the first metal layer, the metal layer comprising one or more of aluminum, silver, and gold; and
depositing a second dielectric layer over the second metal layer, the second dielectric layer consisting of silicon or silicon oxide.
14. The method of claim 13 , further comprising:
depositing a titanium oxide layer over the second dielectric layer.