IP Library Granted Patent US 11,569,061
Granted Patent B2
US 11,569,061 · App. 17/305,877 · Granted Jan 31, 2023

Multibeam scanning apparatus and multibeam scanning method

Inventor: Osamu Nagano (Nagoya, JP)
Assignee: Kioxia Corporation
H01J37/28H01J37/265H01J2237/2806H01J2237/30405
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Quick Facts
Patent No.
US 11,569,061
App. No.
17/305,877
Granted
Jan 31, 2023
Kind
B2
Abstract

A multibeam scanning apparatus of an embodiment is a multibeam scanning apparatus configured to emit a plurality of electron beams to a plurality of scan regions set in a matrix on an object and obtain an observation image by detecting secondary beams, the apparatus including a control circuit. Each of the scan regions includes a plurality of separated scan regions obtained by separating the each of the scan regions in a direction orthogonal to a scanning direction of the electron beams. The control circuit controls the irradiation positions of the electron beams, in two of the scan regions adjacent to each other in the scanning direction of the electron beams, such that the separated scan regions to be scanned at a same time are displaced from each other by a predetermined distance in the direction orthogonal to the scanning direction of the electron beams.

Claims (30)

1. A multibeam scanning apparatus configured to emit a plurality of electron beams to a plurality of scan regions set in a matrix on an object and obtain an observation image by detecting secondary beams generated from the scan regions, the apparatus comprising:

a control unit configured to separately control irradiation positions of the plurality of electron beams,

wherein each of the scan regions includes a plurality of separated scan regions obtained by separating the each of the scan regions in a second direction orthogonal to a first direction serving as a scanning direction of the electron beams,

the control unit controls the irradiation positions of the electron beams, in two of the scan regions adjacent to each other in the first direction, such that the separated scan regions to be scanned at a same time are displaced from each other by a predetermined distance in the second direction, and

each of the scan regions includes four or more separated scan regions, and the separated scan regions to be scanned at the same time are not in contact with each other in the two scan regions adjacent to each other in the first direction and the two scan regions adjacent to each other in the second direction.

2. The multibeam scanning apparatus according to claim 1 , wherein the plurality of separated scan regions constituting each of the scan regions are scanned by different electron beams of the electron beams.

3. The multibeam scanning apparatus according to claim 2 , wherein the plurality of electron beams are disposed in a matrix in the first direction and the second direction.

4. The multibeam scanning apparatus according to claim 1 , wherein a number of separated scan regions provided in each of the scan regions is equal to a number of electron beams arranged in the second direction.

5. The multibeam scanning apparatus according to claim 4 , wherein the electron beams are emitted to the respective separated scan regions at predetermined positions in the scan regions.

6. The multibeam scanning apparatus according to claim 5 , further comprising a stage unit on which the object is loaded,

wherein the control unit controls the stage unit such that the irradiation positions of the plurality of electron beams to the object move in one direction of the second direction.

7. A multibeam scanning apparatus comprising:

an irradiation unit configured to simultaneously emit a plurality of electron beams, the irradiation unit emitting the electron beams to respective scan regions set in a matrix on an object; and

a control unit configured to separately control irradiation positions of the plurality of electron beams,

wherein each of the scan regions includes a plurality of separated scan regions obtained by separating the each of the scan regions in a second direction orthogonal to a first direction serving as a scanning direction of the electron beams,

the control unit controls the irradiation positions of the electron beams, in two of the scan regions adjacent to each other in the first direction, such that the separated scan regions to be scanned at a same time are displaced from each other by a predetermined distance in the second direction, and

each of the scan regions includes four or more separated scan regions, and the separated scan regions to be scanned at the same time are not in contact with each other in the two scan regions adjacent to each other in the first direction and the two scan regions adjacent to each other in the second direction.

8. The multibeam scanning apparatus according to claim 7 , wherein the plurality of separated scan regions constituting each of the scan regions are scanned by different electron beams of the electron beams.

9. The multibeam scanning apparatus according to claim 7 , wherein a number of separated scan regions provided in each of the scan regions is equal to a number of electron beams arranged in the second direction.

10. The multibeam scanning apparatus according to claim 9 , wherein the electron beams are emitted to the respective separated scan regions at predetermined positions in the scan regions.

11. The multibeam scanning apparatus according to claim 10 , further comprising a stage unit on which the object is loaded,

wherein the control unit controls the stage unit such that the irradiation positions of the plurality of electron beams to the object move in one direction of the second direction.

12. A multibeam scanning method comprising:

emitting a plurality of electron beams to a plurality of scan regions set in a matrix on an object; and

obtaining an observation image by detecting secondary beams generated from the scan regions,

wherein each of the scan regions includes a plurality of separated scan regions obtained by separating the each of the scan regions in a second direction orthogonal to a first direction serving as a scanning direction of the electron beams,

the method further comprises controlling irradiation positions of the electron beams, in two of the scan regions adjacent to each other in the first direction, such that the separated scan regions to be scanned at a same time are displaced from each other by a predetermined distance in the second direction, and

each of the scan regions includes four or more separated scan regions, and the irradiation positions of the electron beams are controlled such that the separated scan regions to be scanned at the same time are not in contact with each other in the two scan regions adjacent to each other in the first direction and the two scan regions adjacent to each other in the second direction.

13. The multibeam scanning method according to claim 12 , wherein a number of separated scan regions provided in each of the scan regions is equal to a number of electron beams arranged in the second direction, and the plurality of separated scan regions constituting each of the scan regions are scanned by using the respective electron beams arranged in the second direction.

14. The multibeam scanning method according to claim 12 , further comprising moving the irradiation positions of the plurality of electron beams to the object in one direction of the second direction.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 16, 2021
From: NAGANO, OSAMU
To: KIOXIA CORPORATION
Reel/Frame 056878/0738 →
Priority Claims (1)
JP JP2021-045245 · Mar 18, 2021 · national
Continuity (1)
Related Publication 20220301814A1 · Sep 22, 2022