IP Library Granted Patent US 11,577,356
Granted Patent B2
US 11,577,356 · App. 16/554,427 · Granted Feb 14, 2023

Machine vision as input to a CMP process control algorithm

Inventors: Benjamin Cherian (San Jose, CA); Jun Qian (Sunnyvale, CA); Nicholas Wiswell (Sunnyvale, CA); Dominic J. Benvegnu (La Honda, CA); Boguslaw A. Swedek (Cupertino, CA); Thomas H. Osterheld (Mountain View, CA)
Assignee: Applied Materials, Inc.
B24B37/013G06N3/084
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Quick Facts
Patent No.
US 11,577,356
App. No.
16/554,427
Granted
Feb 14, 2023
Kind
B2
Abstract

During chemical mechanical polishing of a substrate, a signal value that depends on a thickness of a layer in a measurement spot on a substrate undergoing polishing is determined by a first in-situ monitoring system. An image of at least the measurement spot of the substrate is generated by a second in-situ imaging system. Machine vision processing, e.g., a convolutional neural network, is used to determine a characterizing value for the measurement spot based on the image. Then a measurement value is calculated based on both the characterizing value and the signal value.

Claims (35)

1. A polishing system, comprising:

a support to hold a polishing pad;

a carrier head to hold a substrate in contact with the polishing pad;

a motor to generate relative motion between the support and the carrier head;

a first in-situ monitoring system to generate a signal that depends on a thickness of a layer in a measurement spot on the substrate;

a second in-situ imaging system to generate an image comprising a plurality of pixels, the image covering at least the measurement spot of the substrate and being taken at substantially the same time as the first in-situ monitoring system generates the signal for the measurement spot on the substrate; and

a controller configured to

receive the image from the second in-situ imaging system,

determine, based on the image and using machine vision processing of the image, a characterizing value representing a classification of a portion of the substrate corresponding to the measurement spot, the classification corresponding to a type of structure on the substrate, wherein the type of structure is selected from a group of structure types including at least one of an array, a scribe line, a periphery, and a contact pad,

receive the signal from the first in-situ monitoring system,

generate a thickness measurement value based on both the characterizing value and the signal, wherein the controller has the characterizing value as an input to a conversion algorithm such that the classification influences the conversion of the signal to the thickness measurement value, and

at least one of halt polishing of the substrate or adjust a polishing parameter based on the thickness measurement value.

2. The system of claim 1 , wherein the machine vision processing comprises an artificial neural network.

3. The system of claim 2 , wherein the machine vision processing comprises a convolutional neural network.

4. The system of claim 2 , wherein the controller is configured to train the artificial neural network by backpropagation using training data including images and known characterizing values for the images.

5. The system of claim 2 , wherein the first in-situ monitoring system comprises a spectrographic monitoring system to generate a measured spectrum for the measurement spot.

6. The system of claim 2 , wherein the first in-situ monitoring system comprises an eddy current monitoring system to generate a signal value for the measurement spot.

7. The system of claim 6 , wherein the artificial neural network is configured to determine a geometry value for a feature that affects current flow in the measurement spot.

8. The system of claim 7 , wherein the geometry value includes at least one of a distance, size or orientation.

9. The system of claim 1 , wherein the controller is configured to determine a plurality of characterizing values for a plurality of different characteristics of the substrate at the measurement spot based on the image using the machine vision processing.

10. The polishing system of claim 1 , wherein the controller is configured to store a plurality of libraries of reference spectra, each respective library of reference spectra, having an associated respective classification, and to select a library from the plurality of libraries based on the classification represented by the characterizing value.

11. A computer program product for controlling processing of a substrate, the compute program product tangibly embodied in a non-transitory computer readable media and comprising instructions for causing a processor to:

receive, from a first in-situ monitoring system, a signal that depends on a thickness of a layer in a measurement spot on a substrate undergoing polishing;

receive image data comprising a plurality of pixels, the image data covering at least the measurement spot of the substrate from a second in-situ imaging system;

determine a characterizing value representing a classification of a portion of the substrate corresponding to the measurement spot based on the image data and using machine vision processing of the image data, the classification corresponding to a type of structure on the substrate, wherein the type of structure is selected from a group of structure types including at least one of an array, a scribe line, a periphery, and a contact pad;

generate a thickness measurement value based on both the characterizing value and the signal by inputting the characterizing value to a conversion algorithm such that the classification influences the conversion of the signal to the thickness measurement value, and

at least one of halt polishing of the substrate or adjust a polishing parameter based on the thickness measurement value.

12. The computer program product of claim 11 , comprising instructions to determine a portion of the image data corresponding to the measurement spot.

13. The computer program product of claim 11 , comprising instructions to synchronize image data from the second in-situ imaging system with signal values from the first in-situ monitoring system.

14. The computer program product of claim 11 , wherein the machine vision processing comprises feeding the image data to an artificial neural network.

15. The computer program product of claim 14 , wherein the artificial neural network comprises a convolutional neural network.

16. The computer program product of claim 11 , wherein the signal comprises a measured spectrum, and the instructions to generate the measurement value comprise instructions to select one of a plurality of libraries of reference spectra based on the classification.

17. The computer program product of claim 11 , wherein the instructions to perform machine vision processing comprise instructions to determine a geometry value of a feature in a portion of the substrate corresponding to the measurement spot.

18. The computer program product of claim 17 , wherein the signal comprises a signal value from an eddy current monitoring system, and the geometry value comprises an orientation of the feature.

19. The computer program product of claim 11 , wherein the instructions to generate the thickness measurement value comprise instructions to store a plurality of libraries of reference spectra, each respective library of reference spectra having an associated respective classification, and to select a library from the plurality of libraries based on the classification represented by the characterizing value.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 23, 2019
From: CHERIAN, BENJAMIN; QIAN, JUN; WISWELL, NICHOLAS; BENVEGNU, DOMINIC J.; SWEDEK, BOGUSLAW A.; OSTERHELD, THOMAS H.
To: APPLIED MATERIALS, INC.
Reel/Frame 051357/0185 →
Continuity (2)
Provisional Application 62735772 · Sep 24, 2018
Related Publication 20200094370A1 · Mar 26, 2020
Cited By (1)
US 12,257,665