IP Library › Granted Patent US 11,585,977
Granted Patent B2
US 11,585,977 · App. 16/914,156 · Granted Feb 21, 2023

Broadband back mirror for a photonic chip

Inventor: Damien Lambert (Los Altos, CA)
Assignee: Skorpios Technologies, Inc.
G02B6/12002G02B6/122G02B6/12004G02B6/12007G02B6/136H01S5/021H01S5/0202H01S5/026H01S5/028H01S5/02326H01S5/22H01S5/3013H01S5/343H01S5/4025H01S5/4087H04B10/505H04J14/02G02B2006/12061G02B2006/12104G02B2006/12121G02B2006/12142G02B2006/12147
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Quick Facts
Patent No.
US 11,585,977
App. No.
16/914,156
Granted
Feb 21, 2023
Kind
B2
Abstract

A semiconductor laser has a mirror formed in a gain chip. The mirror can be placed in the gain chip to provide a broadband reflector to support multiple lasers using the gain chip. The mirror can also be placed in the gain chip to have the semiconductor laser be more efficient or more powerful by changing an optical path length of the gain of the semiconductor laser.

Claims (72)

1. A semiconductor device comprising:

a platform, wherein the platform comprises a first waveguide;

a chip, wherein:

the chip is defined by a perimeter;

the chip comprises a second waveguide; and

the second waveguide is optically coupled with the first waveguide;

a wall in the chip, wherein:

the wall defines a portion of a recess in the chip; and

the wall is within the perimeter of the chip;

a coating disposed on the wall, wherein:

the coating comprises a metal and a dielectric;

the dielectric is between the metal and the wall;

the metal forms a mirror in the chip; and

one end of the second waveguide terminates at the wall.

2. The semiconductor device of claim 1 , wherein the metal is aluminum.

3. The semiconductor device of claim 1 , wherein:

the platform comprises silicon; and

the chip comprises a III-V material.

4. The semiconductor device of claim 1 , wherein:

the second waveguide is a ridge waveguide; and

the second waveguide is curved.

5. The semiconductor device of claim 1 , further comprising a semiconductor material configured to guide light between the first waveguide of the platform and the second waveguide of the chip.

6. The semiconductor device of claim 1 , wherein:

the chip is a gain medium for a laser;

the chip has a bandgap; and

the dielectric is transparent to light corresponding to an energy of the bandgap of the chip.

7. The semiconductor device of claim 1 , wherein the dielectric has a thickness between 25 nm and 100 nm.

8. The semiconductor device of claim 1 , further comprising a reflector in the platform, wherein the mirror and the reflector form a resonator cavity for a laser.

9. The semiconductor device of claim 1 , wherein the chip is a gain medium for two or more lasers.

10. A method for fabricating a semiconductor device, the method comprising:

bonding a chip to a platform, wherein:

the platform is made of a semiconductor material;

the platform comprises a first waveguide;

the chip is defined by a perimeter;

the chip comprises a second waveguide; and

the second waveguide is optically aligned with the first waveguide;

etching the chip to form a wall in the chip, wherein:

the wall defines a portion of a recess in the chip; and

the wall is within the perimeter of the chip;

applying a coating to the wall, wherein:

the coating comprises a metal and a dielectric;

the dielectric is between the metal and the wall;

the metal forms a mirror; and

one end of the second waveguide terminates at the wall.

11. The method of claim 10 , wherein etching the chip to form the wall occurs after bonding the chip to the platform.

12. The method of claim 10 , wherein applying the coating comprises applying the metal to the dielectric, after applying the dielectric to the wall.

13. The method of claim 10 , wherein the second waveguide is curved.

14. The method of claim 10 , wherein the metal is aluminum.

15. The method of claim 10 , further comprising forming the perimeter of the chip by dicing a wafer.

16. A device comprising:

a platform comprising a first waveguide;

a chip, wherein the chip comprises a second waveguide, and the chip is defined by a perimeter;

a wall in the chip, wherein:

the wall defines a portion of a recess in the chip; and

the wall is within the perimeter of the chip;

a coating disposed on the wall, wherein:

the coating comprises a metal and a dielectric;

the dielectric is between the metal and the wall;

the metal forms a mirror in the chip;

the second waveguide is optically coupled with the first waveguide; and

an end of the second waveguide terminates at the wall.

17. The device as recited in claim 16 , further comprising:

a platform, wherein:

the platform is made of a first semiconductor material;

the chip is bonded to the platform; and

the chip is made of a second semiconductor material.

18. The device as recited in claim 16 , wherein:

the chip comprises two or more waveguides; and

the two or more waveguides of the chip each have an end that terminates at the mirror.

19. The device as recited in claim 16 , wherein the metal is aluminum.

20. The device as recited in claim 16 , wherein:

the second waveguide is curved.

Assignments (1)
NUNC PRO TUNC ASSIGNMENT Recorded Jun 26, 2020
From: LAMBERT, DAMIEN
To: SKORPIOS TECHNOLOGIES, INC.
Reel/Frame 053061/0520 →
Continuity (5)
Continuation 15426375 · Feb 7, 2017
Provisional Application 62292633 · Feb 8, 2016
Provisional Application 62292636 · Feb 8, 2016
Provisional Application 62292675 · Feb 8, 2016
Related Publication 20210116636A1 · Apr 22, 2021
Cited By (8)
US 12,210,186 US 12,250,024 US 12,313,886 US 12,405,433 US 12,455,422 US 12,461,322 US 12,490,401 US 12,520,448