Position measurement system, interferometer system and lithographic apparatus
A position measurement system including a first interferometer and a second interferometer arranged to determine a distance of the object in a first direction when the object is in a first measurement area by emitting beams onto a target surface of the object. The position measurement system further has a third interferometer and a fourth interferometer arranged to determine a distance of the object in the first direction when the object is in a second measurement area by emitting beams onto the target surface of the object. An arrangement of relative positions in a second direction of beams spots impinging on the target surface from the beams emitted by the first and second interferometers is different from an arrangement of relative positions in the second direction of beams spots impinging on the target surface from the beams emitted by the third and fourth interferometers.
1. A position measurement system for determining a position of an object, the position measurement system comprising:
a first interferometer and a second interferometer arranged to determine a distance of the object in a first direction when the object is in a first measurement area by emitting beams onto a target surface of the object,
a third interferometer and a fourth interferometer arranged to determine a distance of the object in the first direction when the object is in a second measurement area by emitting beams onto the target surface of the object, and
a processing unit configured to determine a shape of the target surface based on the distances of the object as determined by the first interferometer, the second interferometer, the third interferometer and the fourth interferometer,
wherein an arrangement of relative positions in a second direction of beam spots impinging on the target surface from the beams emitted by the first and second interferometers is different from an arrangement of relative positions in the second direction of beams spot impinging on the target surface from the beams emitted by the third and fourth interferometers.
2. The position measurement system according to claim 1 , wherein a distance between a beam emitted by the first interferometer and a beam emitted by the second interferometer in the second direction is different from a distance between a beam emitted by the third interferometer and a beam emitted by the fourth interferometer in the second direction.
3. The position measurement system according to claim 2 , wherein the beam of the first interferometer comprises a first primary beam and a first secondary beam, the beam of the second interferometer comprises a second primary beam and a second secondary beam, the beam of the third interferometer comprises a third primary beam and a third secondary beam, and the beam of the fourth interferometer comprises a fourth primary beam and a fourth secondary beam.
4. The position measurement system according to claim 3 , wherein:
the first primary beam is spaced from the first secondary beam in the second direction by a first beam distance,
the first secondary beam is spaced from the second primary beam in the second direction by a second beam distance,
the second primary beam is spaced from the second secondary beam in the second direction by a third beam distance,
the third primary beam is spaced from the third secondary beam in the second direction by a fourth beam distance,
the third secondary beam is spaced from the fourth primary beam in the second direction by a fifth beam distance, and
the fourth primary beam is spaced from the fourth secondary beam in the second direction by a sixth beam distance,
wherein at least one selected from: the first and fourth beam distance, or the second and fifth beam distance, or the third and sixth beam distance, are different from each other.
5. The position measurement system according to claim 1 , wherein the processing unit is configured to determine a reference position of the target surface of the object in the second direction relative to the beams of the first and second interferometers when the object is in the first measurement area and relative to the beams of the third and fourth interferometers when the object is in the second measurement area, and the processing unit is arranged to determine the shape of the target surface based on the determined reference positions.
6. The position measurement system according to claim 5 , wherein the reference position is determined by recognizing a marker which is arranged on the target surface.
7. The position measurement system according to claim 1 , wherein the processing unit is further configured to at least:
determine a first spatial wavelength profile of the shape of the target surface based on the distances of the object in the first measurement area determined by the first and second interferometers,
determine a second spatial wavelength profile of the shape of the target surface based on the distances of the object in the second measurement area determined by the third and fourth interferometers, and
make a weighted combination of the first spatial wavelength profile and the second spatial wavelength profile, wherein weight coefficients are based on differences between the first spatial wavelength profile and second spatial wavelength profile.
8. The position measurement system according to claim 1 , wherein the processing unit is arranged to take into account design data when determining the shape of the target surface.
9. A lithographic apparatus comprising
the position measurement system according to claim 1 ,
a projection system configured to project a pattern onto a substrate, and
a substrate table configured to hold the substrate,
wherein the substrate table comprises the object.
10. The position measurement system according to claim 1 , wherein a beam of the third interferometer is arranged between a beam of the first interferometer and a beam of the second interferometer in the second direction.
11. The position measurement system according to claim 1 , wherein a beam of the second interferometer is arranged between a beam of the third interferometer and a beam of the fourth interferometer in the second direction.
12. A method for calibrating a position measurement system for positioning an object, the method comprising:
moving an object in a second direction in a first measurement area and determining a plurality of distances of the object in a first direction using a first interferometer and a plurality of distances of the object in the first direction using a second interferometer,
moving the object in the second direction in a second measurement area and determining a plurality of distances of the object in the first direction using a third interferometer and a plurality of distances of the object in the first direction using a fourth interferometer, wherein an arrangement of beams emitted by the first and second interferometers onto a target surface of the object is different from an arrangement of beams emitted by the third and fourth interferometers onto the target surface of the object, and
determining a shape of the target surface of the object based on the pluralities of distances of the object in the first and second measurement areas as determined by the first, second, third and fourth interferometers.
13. The method according to claim 12 , wherein a distance in the second direction between a beam emitted by the first interferometer and a beam emitted by the second interferometer is different from a distance in the second direction between a beam emitted by the third interferometer and a beam emitted by the fourth interferometer.
14. The method according to claim 12 , further comprising determining a reference position of the target surface of the object in the second direction relative to the beams of the first and second interferometers when the object is in the first measurement area and relative to the beams of the third and fourth interferometers when the object is in the second measurement area, and determining the shape of the target surface based on the determined reference positions.
15. The method according to claim 12 , further comprising:
determining a first spatial wavelength profile of the shape of the target surface based on the distances of the object in the first measurement area determined by the first and second interferometers,
determining a second spatial wavelength profile of the shape of the target surface based on the distances of the object in the second measurement area determined by the third and fourth interferometers, and
making a weighted combination of the first spatial wavelength profile and the second spatial wavelength profile, wherein weight coefficients are based on differences between the first spatial wavelength profile and second spatial wavelength profile.
16. A computer program product comprising a non-transitory computer-readable medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
obtain a plurality of distances of an object in a first direction using a first interferometer and a plurality of distances of the object in the first direction using a second interferometer, for movements of the object in a second direction in a first measurement area,
obtain a plurality of distances of the object in the first direction using a third interferometer and a plurality of distances of the object in the first direction using a fourth interferometer, for movements of the object in the second direction in a second measurement area, wherein an arrangement of beams emitted by the first and second interferometers onto a target surface of the object is different from an arrangement of beams emitted by the third and fourth interferometers onto the target surface of the object, and
determine a shape of the target surface of the object based on the pluralities of distances of the object in the first and second measurement areas as determined by the first, second, third and fourth interferometers.
17. The computer program product of claim 16 , wherein a distance in the second direction between a beam emitted by the first interferometer and a beam emitted by the second interferometer is different from a distance in the second direction between a beam emitted by the third interferometer and a beam emitted by the fourth interferometer.
18. The computer program product of claim 16 , wherein the instructions are further configured to determine a reference position of the target surface of the object in the second direction relative to the beams of the first and second interferometers when the object is in the first measurement area and relative to the beams of the third and fourth interferometers when the object is in the second measurement area, and the instructions configured to cause the computer system to determine the shape of the target surface are further configured to determine the shape of the target surface based on the determined reference positions.
19. The computer program product of claim 16 , wherein the instructions are further configured to cause the computer system to:
determine a first spatial wavelength profile of the shape of the target surface based on the distances of the object in the first measurement area determined by the first and second interferometers,
determine a second spatial wavelength profile of the shape of the target surface based on the distances of the object in the second measurement area determined by the third and fourth interferometers, and
make a weighted combination of the first spatial wavelength profile and the second spatial wavelength profile, wherein weight coefficients are based on differences between the first spatial wavelength profile and second spatial wavelength profile.
20. The computer program product of claim 16 , wherein the instructions are further configured to take into account design data when determining the shape of the target surface.