Polymer for pattern forming material
A pattern forming material is configured to use for forming an organic film on a film to be processed, patterning the organic film, and then forming a composite film by infiltrating a metallic compound into the patterned organic film. The pattern forming material contains a polymer including a monomer unit represented by a general formula (1) described below, wherein, R 5 is a hydrogen atom or a methyl group, each R 6 independently is an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or an s-butyl group, and a monomer unit derived from a compound represented by a general formula (2) described below, wherein, R 11 is a hydrogen atom or a methyl group, each R 12 independently is a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, or a t-butyl group.
1. A polymer including at least one of:
a monomer unit selected from a monomer unit derived from a compound represented by a general formula (1) described below,
wherein, R 5 is a hydrogen atom or a methyl group, each R 6 independently is an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or an s-butyl group, and
a monomer unit derived from a compound represented by a general formula (2) described below,
wherein, R 11 is a hydrogen atom or a methyl group, each R 12 independently is a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, or a t-butyl group.