IP Library › Granted Patent US 11,644,304
Granted Patent B2
US 11,644,304 · App. 17/106,638 · Granted May 9, 2023

Height measurement method and height measurement device

Inventor: Masafumi Yamanaka (Kanagawa, JP)
Assignee: MITUTOYO CORPORATION
G01B11/02G02B27/0075H04N23/55H04N23/673
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Quick Facts
Patent No.
US 11,644,304
App. No.
17/106,638
Granted
May 9, 2023
Kind
B2
Abstract

A height measurement device includes: a lens system; a lens controller to output a drive signal to the lens system; a continuous illuminator to continuously illuminate a workpiece; an image detector to detect an image of the workpiece; an image calculation unit to calculate an EDOF image on a basis of a detected image; a focal depth adjustment unit to cause an extended focal depth of the EDOF image to be increased or decreased by increasing or decreasing an amplitude of the drive signal; a focus determination unit to determine a focus state of a portion of interest of the workpiece included in the EDOF image; and a height measurement unit to measure an upper limit or a lower limit of the extended focal depth, the upper limit or the lower limit being based on a timing at which the focus state of the portion of interest has changed.

Claims (20)

1. A height measurement method by using an image detection device,

the image detection device comprising:

a lens system of a liquid resonant type whose focus position is varied in response to a drive signal to be inputted;

a lens controller configured to output the drive signal to the lens system;

a continuous illuminator configured to continuously illuminate a workpiece; and

an image detector configured to detect an image of the workpiece through the lens system,

the height measurement method comprising:

calculating an EDOF image on a basis of a detected image that is detected by the image detector;

causing an extended focal depth of the EDOF image to be increased or decreased by increasing or decreasing an amplitude of the drive signal;

determining a focus state of a portion of interest of the workpiece included in the EDOF image; and

measuring, as a height of the portion of interest, an upper limit or a lower limit of the extended focal depth, the upper limit or the lower limit being based on a timing at which the focus state of the portion of interest has changed in association with the increase or the decrease of the extended focal depth.

2. A height measurement device comprising:

a lens system of a liquid resonant type whose focus position is varied in response to a drive signal to be inputted;

a lens controller configured to output the drive signal to the lens system;

a continuous illuminator configured to continuously illuminate a workpiece;

an image detector configured to detect an image of the workpiece through the lens system;

an image calculation unit configured to calculate an EDOF image on a basis of a detected image that is detected by the image detector;

a focal depth adjustment unit configured to cause an extended focal depth of the EDOF image to be increased or decreased by increasing or decreasing an amplitude of the drive signal;

a focus determination unit configured to determine a focus state of a portion of interest of the workpiece included in the EDOF image; and

a height measurement unit configured to measure, as a height of the portion of interest, an upper limit or a lower limit of the extended focal depth, the upper limit or the lower limit being based on a timing at which the focus state of the portion of interest has changed in association with the increase or the decrease of the extended focal depth.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 30, 2020
From: YAMANAKA, MASAFUMI
To: MITUTOYO CORPORATION
Reel/Frame 054490/0653 →
Priority Claims (1)
JP JP2019-218545 · Dec 3, 2019 · national
Continuity (1)
Related Publication 20210164768A1 · Jun 3, 2021