Lithographic method

1. A method comprising:

receiving first parameters comprising properties of a pellicle;

receiving second parameters comprising properties of an expected movement of the pellicle in a lithographic apparatus; and

applying, by a hardware computer system, the first and second parameters to a model arranged to predict a deflection of the pellicle as a function of the first and second parameters,

wherein the model comprises a plurality of sub-models, each sub-model relating to a different component of the deflection of the pellicle, and each sub-model providing an output, and

wherein a sub-model of the plurality of sub-models is arranged to model the deflection of the pellicle as a damped wave in dependence of a vibration of the pellicle and/or model the deflection of the pellicle as an exponential decay in dependence of an inertia of a gas that is in communication with the pellicle.

2. The method of claim 1 , wherein the model is arranged to combine the outputs of the plurality of sub-models, and wherein the model includes an assumption that the plurality of sub-models are independent of one another.

3. The method of claim 2 , wherein at least one of the plurality of sub-models relates to a component of the deflection of the pellicle in dependence of at least one selected from:

a time at which a rate of change of an acceleration of the pellicle is non-zero;

a rate of change of an acceleration of the pellicle; and/or

an acceleration of the pellicle.

4. The method of claim 2 , wherein a sub-model of the plurality of sub-models is arranged to model the deflection of the pellicle as a damped wave in dependence of a vibration of the pellicle.

5. The method of claim 4 , wherein the sub-model of the plurality of sub-models arranged to model the deflection of the pellicle as a damped wave in dependence of a vibration of the pellicle is a first sub-model,

wherein a second sub-model of the plurality of sub-models is arranged to model the deflection of the pellicle as an exponential decay in dependence of an inertia of a gas that is in communication with the pellicle,

wherein at least one of the plurality of sub-models relates to a component of the deflection of the pellicle in dependence of at least one selected from:

a velocity of the pellicle; and/or

a position of the pellicle, and

wherein a third sub-model is arranged to model the deflection of the pellicle as a deformation in dependence of pressure variations of a gas that is in communication with the pellicle during movement of the pellicle, wherein the third sub-model further models the deflection of the pellicle which is not accommodated by the first and second sub-models.

6. The method of claim 2 , wherein a sub-model of the plurality of sub-models is arranged to model the deflection of the pellicle as an exponential decay in dependence of an inertia of a gas that is in communication with the pellicle.

7. The method of claim 2 , wherein at least one of the plurality of sub-models relates to a component of the deflection of the pellicle in dependence of at least one selected from:

a velocity of the pellicle; and/or

a position of the pellicle.

8. The method of claim 7 , wherein a sub-model of the plurality of sub-models is arranged to model the deflection of the pellicle as a deformation in dependence of pressure variations of a gas that is in communication with the pellicle during movement of the pellicle.

9. A method of performing a scanning exposure of a target portion of a substrate within a lithographic apparatus, the method comprising:

loading a reticle and a pellicle into the lithographic apparatus;

passing a radiation beam through the reticle and through the pellicle during scanning movement of the reticle and the pellicle and during scanning movement of the substrate;

using a projection system of the lithographic apparatus to project the radiation beam onto the target portion of the substrate; and

adjusting one or more selected from: an optical element of the projection system, the scanning movement of the substrate, and/or a scanning movement of the reticle and the pellicle for the scanning exposure, to compensate for a lithographic error due to the deflection of the pellicle, wherein the deflection of the pellicle is predicted by the method of claim 1 .

10. A computer apparatus for predicting deflection of the pellicle resulting from the movement of the pellicle in a lithographic apparatus comprising:

a memory storing processor readable instructions, and

a processor arranged to read and execute instructions stored in the memory, wherein the processor readable instructions comprise instructions arranged to control the computer apparatus to carry out the method of claim 1 .

11. A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus comprising the computer apparatus according to claim 10 .

12. A metrology device comprising the computer apparatus according to claim 10 .

13. A non-transitory computer readable medium having computer-readable instructions therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:

receive first parameters comprising properties of a pellicle;

receive second parameters comprising properties of an expected movement of the pellicle in a lithographic apparatus; and

apply the first and second parameters to a model arranged to predict a deflection of the pellicle as a function of the first and second parameters,

wherein the model comprises a plurality of sub-models, each sub-model relating to a different component of the deflection of the pellicle, and each sub-model providing an output, and

wherein a sub-model of the plurality of sub-models is arranged to model the deflection of the pellicle as a damped wave in dependence of a vibration of the pellicle and/or model the deflection of the pellicle as an exponential decay in dependence of an inertia of a gas that is in communication with the pellicle.

14. The computer readable medium of claim 13 , wherein the model is arranged to combine the outputs of the plurality of sub-models, and wherein the model includes an assumption that the plurality of sub-models are independent of one another.

15. The computer readable medium of claim 13 , wherein at least one of the plurality of sub-models relates to a component of the deflection of the pellicle in dependence of at least one selected from:

a time at which a rate of change of an acceleration of the pellicle is non-zero;

a rate of change of an acceleration of the pellicle; and/or

an acceleration of the pellicle.

16. The computer readable medium of claim 13 , wherein a sub-model of the plurality of sub-models is arranged to model the deflection of the pellicle as a damped wave in dependence of a vibration of the pellicle.

17. The computer readable medium of claim 13 , wherein a sub-model of the plurality of sub-models is arranged to model the deflection of the pellicle as an exponential decay in dependence of an inertia of a gas that is in communication with the pellicle.

18. The computer readable medium of claim 13 , wherein at least one of the plurality of sub-models relates to a component of the deflection of the pellicle in dependence of at least one selected from:

a velocity of the pellicle; and/or

a position of the pellicle.

19. The computer readable medium of claim 18 , wherein a sub-model of the plurality of sub-models is arranged to model the deflection of the pellicle as a deformation in dependence of pressure variations of a gas that is in communication with the pellicle during movement of the pellicle.

20. A method comprising:

determining a lithographic error resulting from deflection of a pellicle resulting from the movement of the pellicle in a lithographic apparatus;

converting the determined lithographic error into a corresponding deflected pellicle shape;

forming a plurality of sub-models that relate to different components of the deflection of the pellicle, each sub-model configured to provide an output; and

calibrating, by a hardware computer system, each sub-model by fitting the plurality of sub-models to the deflected pellicle shape.