IP Library Granted Patent US 11,652,023
Granted Patent B2
US 11,652,023 · App. 17/078,931 · Granted May 16, 2023

Semiconductor device including a semiconductor element with a gate electrode on only one surface

Inventors: Naoki Takeda (Tokyo, JP); Tomohiro Onda (Hitachi, JP); Kenya Kawano (Tokyo, JP); Hiroshi Shintani (Tokyo, JP); Yu Harubeppu (Tokyo, JP); Hisashi Tanie (Tokyo, JP)
Assignee: Hitachi Power Semiconductor Device, Ltd.
H01L23/3736H01L23/492H01L23/49513H01L23/49562H01L23/49838
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Quick Facts
Patent No.
US 11,652,023
App. No.
17/078,931
Granted
May 16, 2023
Kind
B2
Abstract

Provided is a highly reliable semiconductor device capable of reducing stress generated in a semiconductor element even when a highly elastic joining material such as a Pb-free material is used in a power semiconductor having a double-sided mounting structure. The semiconductor device includes a semiconductor element including a gate electrode only on one surface, an upper electrode connected to the surface of the semiconductor element on which the gate electrode is provided, and a lower electrode connected to a surface opposite to the surface of the semiconductor element on which the gate electrode is provided. A connection end portion of the upper electrode with the surface of the semiconductor element on which the gate electrode is provided is located inside an end portion of the surface of the semiconductor element on which the gate electrode is provided, and a connection end portion of the lower electrode with the opposite surface of the semiconductor element is located inside an end portion of the opposite surface of the semiconductor element.

Claims (37)

1. A semiconductor device comprising:

a semiconductor element including a gate electrode only on one surface;

an upper electrode directly connected, via a first conductive joining material, to the surface of the semiconductor element on which the gate electrode is provided; and

a lower electrode directly connected, via a second conductive joining material, to a surface opposite to the surface of the semiconductor element on which the gate electrode is provided, wherein

a connection end portion of the upper electrode with the surface of the semiconductor element on which the gate electrode is provided is located inside an end portion of the surface of the semiconductor element on which the gate electrode is provided, and a connection end portion of the lower electrode with the opposite surface of the semiconductor element is located inside an end portion of the opposite surface of the semiconductor element; and

the first conductive joining material is wider at a surface contacting the semiconductor element than a surface contacting the upper electrode, and the second conductive joining material is wider at a surface contacting the semiconductor element than a surface contacting the lower electrode.

2. The semiconductor device according to claim 1 , wherein

in at least one corner portion of the semiconductor element, the connection end portion of the lower electrode with the opposite surface of the semiconductor element is located inside the end portion of the opposite surface of the semiconductor element.

3. The semiconductor device according to claim 2 , wherein

except for the corner portion of the semiconductor element, the connection end portion of the lower electrode with the opposite surface of the semiconductor element is located outside the end portion of the opposite surface of the semiconductor element.

4. The semiconductor device according to claim 1 , wherein

an end portion of a connection portion between the first conductive joining material and the upper electrode, an end portion of a connection portion between the second conductive joining material and the lower electrode, an end portion of a connection portion between the first conductive joining material and the semiconductor element, and an end portion of a connection portion between the second conductive joining material and the semiconductor element are located inside an end portion of the semiconductor element.

5. The semiconductor device according to claim 4 , wherein

the end portion of the connection portion between the first conductive joining material and the upper electrode and the end portion of the connection portion between the second conductive joining material and the lower electrode are substantially aligned in a vertical direction.

6. The semiconductor device according to claim 5 , wherein

the end portion of the connection portion between the first conductive joining material and the upper electrode, the end portion of the connection portion between the second conductive joining material and the lower electrode, the end portion of the connection portion between the first conductive joining material and the semiconductor element, and the end portion of the connection portion between the second conductive joining material and the semiconductor element are substantially aligned in the vertical direction.

7. The semiconductor device according to claim 4 , wherein

the first conductive joining material and the second conductive joining material are any one of a lead-free solder, a sintered material, and a conductive adhesive material.

8. A semiconductor device comprising:

a semiconductor element including an outer peripheral portion insulating layer on a chip outer peripheral portion only on one surface;

an upper electrode directly connected, via a first conductive joining material, to the surface of the semiconductor element on which the outer peripheral portion insulating layer is provided; and

a lower electrode directly connected, via a second conductive joining material, to a surface opposite to the surface of the semiconductor element on which the outer peripheral portion insulating layer is provided, wherein

the semiconductor element is a diode, and

a connection end portion of the upper electrode with the surface of the semiconductor element on which the outer peripheral portion insulating layer is provided is located inside an end portion of the surface of the semiconductor element on which the outer peripheral portion insulating layer is provided, and a connection end portion of the lower electrode with the opposite surface of the semiconductor element is located inside an end portion of the opposite surface of the semiconductor element; and

the first conductive joining material is wider at a surface contacting the semiconductor element than a surface contacting the upper electrode, and the second conductive joining material is wider at a surface contacting the semiconductor element than a surface contacting the lower electrode.

9. The semiconductor device according to claim 8 , wherein

in at least one corner portion of the semiconductor element, the connection end portion of the lower electrode with the opposite surface of the semiconductor element is located inside the end portion of the opposite surface of the semiconductor element.

10. The semiconductor device according to claim 9 , wherein

except for the corner portion of the semiconductor element, the connection end portion of the lower electrode with the opposite surface of the semiconductor element is located outside the end portion of the opposite surface of the semiconductor element.

11. The semiconductor device according to claim 8 , wherein

an end portion of a connection portion between the first conductive joining material and the upper electrode, an end portion of a connection portion between the second conductive joining material and the lower electrode, an end portion of a connection portion between the first conductive joining material and the semiconductor element, and an end portion of a connection portion between the second conductive joining material and the semiconductor element are located inside an end portion of the semiconductor element.

12. The semiconductor device according to claim 11 , wherein

the end portion of the connection portion between the first conductive joining material and the upper electrode and the end portion of the connection portion between the second conductive joining material and the lower electrode are substantially aligned in a vertical direction.

13. The semiconductor device according to claim 12 , wherein

the end portion of the connection portion between the first conductive joining material and the upper electrode, the end portion of the connection portion between the second conductive joining material and the lower electrode, the end portion of the connection portion between the first conductive joining material and the semiconductor element, and the end portion of the connection portion between the second conductive joining material and the semiconductor element are substantially aligned in the vertical direction.

14. The semiconductor device according to claim 11 , wherein

the first conductive joining material and the second conductive joining material are any one of a lead-free solder, a sintered material, and a conductive adhesive material.

Assignments (2)
CHANGE OF NAME Recorded Apr 30, 2025
From: HITACHI POWER SEMICONDUCTOR DEVICE LTD.
To: MINEBEA POWER SEMICONDUCTOR DEVICE INC.
Reel/Frame 071142/0232 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 17, 2020
From: TAKEDA, NAOKI; ONDA, TOMOHIRO; KAWANO, KENYA; SHINTANI, HIROSHI; HARUBEPPU, YU; TANIE, HISASHI
To: HITACHI POWER SEMICONDUCTOR DEVICE, LTD.
Reel/Frame 054391/0011 →
Priority Claims (1)
JP JP2019-203742 · Nov 11, 2019 · national
Continuity (1)
Related Publication 20210143081A1 · May 13, 2021