Quantum dot devices with conductive liners
Disclosed herein are quantum dot devices with conductive liners, as well as related computing devices and methods. For example, in some embodiments, a quantum dot device may include a base, a first fin extending from the base, a second fin extending from the base, a conductive material between the first fin and the second fin, and a dielectric material between the conductive material and the first fin.
1. A quantum dot device, comprising:
a base;
a first fin extending from the base, wherein the first fin includes a quantum well layer;
a second fin extending from the base;
a first conductive material between the first fin and the second fin;
a first dielectric material between the first conductive material and the first fin;
a second conductive material between the first conductive material and the second fin; and
a second dielectric material between the second conductive material and the second fin.
2. The quantum dot device of claim 1 , wherein the first dielectric material has a thickness that is less than 20 nanometers.
3. The quantum dot device of claim 1 , wherein the first conductive material and the second conductive material are portions of a materially continuous conductive material structure.
4. The quantum dot device of claim 3 , wherein the materially continuous conductive material structure has a U-shaped cross-section.
5. The quantum dot device of claim 1 , wherein the first dielectric material and the second dielectric material are portions of a materially continuous dielectric material structure.
6. The quantum dot device of claim 5 , wherein the materially continuous dielectric material structure has a U-shaped cross-section.
7. The quantum dot device of claim 1 , further comprising:
a third dielectric material between a top surface of the first conductive material and a plane of a top surface of the first fin, wherein the third dielectric material has a different material composition than the first dielectric material.
8. The quantum dot device of claim 1 , further comprising:
a third dielectric material separating the first conductive material and a third conductive material over a top surface of the first fin.
9. The quantum dot device of claim 1 , wherein:
the quantum dot device is a quantum computing device,
the quantum computing device includes a quantum processing device and a non-quantum processing device coupled to the quantum processing device,
the quantum processing device includes the base, the first fin, the second fin, the first conductive material, the first dielectric material, the second conductive material, the second dielectric material, and a plurality of gates above the first fin, and
the non-quantum processing device is to control voltages applied to the plurality of gates to control quantum dot formation in the first fin.
10. The quantum dot device of claim 9 , wherein the quantum computing device further includes a memory device to store data generated by quantum dots formed in the quantum well layer during operation of the quantum processing device.
11. The quantum dot device of claim 1 , further comprising:
a third dielectric material between the first conductive material and the second conductive material.
12. The quantum dot device of claim 11 , wherein the third dielectric material has a different material composition than the first dielectric material.
13. A quantum dot device, comprising:
a base;
a fin extending from the base, wherein the fin includes a quantum well layer;
a first dielectric material on a side face of the fin, wherein the first dielectric material has a thickness from the side face of the fin that is less than 20 nanometers;
a conductive material on the first dielectric material, wherein the conductive material has a thickness from the first dielectric material on the side face of the fin that is between 1 nanometer and 15 nanometers; and
a second dielectric material on the conductive material, wherein the second dielectric material is spaced apart from the side face of the fin by the thickness of the conductive material and the thickness of the first dielectric material.
14. The quantum dot device of claim 13 , wherein a top surface of the conductive material is closer to the base than a plane of a top surface of the fin.
15. The quantum dot device of claim 14 , wherein the top surface of the conductive material is closer to the base than the plane of the top surface of the fin by a distance between 5 nanometers and 50 nanometers.
16. The quantum dot device of claim 13 , further comprising:
a third dielectric material between a top surface of the conductive material and a plane of a top surface of the fin, wherein the third dielectric material has a different material composition than the first dielectric material.
17. The quantum dot device of claim 16 , wherein the third dielectric material has a loss tangent that is less than a loss tangent of the first dielectric material.
18. The quantum dot device of claim 13 , further comprising:
a plurality of gates at a top surface of the fin, wherein adjacent gates of the plurality of gates are spaced apart by a distance between 1 nanometer and 10 nanometers.
19. A quantum dot device, comprising:
a base;
a fin extending from the base, wherein the fin includes a quantum well layer;
a dielectric material on a side face of the fin, wherein the dielectric material has a thickness from the side face of the fin that is less than 20 nanometers; and
a conductive material on the dielectric material, wherein a top surface of the conductive material is closer to the base than a plane of a top surface of the fin.
20. The quantum dot device of claim 19 , wherein the dielectric material is a first dielectric material, the conductive material is a first conductive material, the fin is between the first conductive material and a second conductive material, and the quantum dot device further comprises:
a second dielectric material between the second conductive material and the fin.
21. The quantum dot device of claim 19 , wherein the dielectric material is a first dielectric material, and the quantum dot device further comprises:
a second dielectric material between a top surface of the conductive material and the plane of the top surface of the fin.
22. The quantum dot device of claim 21 , wherein the second dielectric material has a different material composition than the first dielectric material.
23. The quantam dot device of claim 19 , wherein the fin includes isotopically purified silicon or isotopically purified germanium.