IP Library Granted Patent US 11,662,821
Granted Patent B2
US 11,662,821 · App. 16/850,904 · Granted May 30, 2023

In-situ monitoring, calibration, and testing of a haptic actuator

Inventors: Aleksey Khenkin (Austin, TX); Jun Yan (Austin, TX); Marco Janko (Austin, TX); Michael McKnight (Austin, TX)
Assignee: Cirrus Logic, Inc.
G06F3/016G01R33/028H02N1/006H02N2/14H02N2/142H02N11/00H01L41/042H01L41/083H01L41/09
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Quick Facts
Patent No.
US 11,662,821
App. No.
16/850,904
Granted
May 30, 2023
Kind
B2
Abstract

A method may include measuring an electrical parameter of an electromagnetic load having a moving mass during the absence of a driving signal actively driving the electromagnetic load, measuring a mechanical parameter of mechanical motion of a host device comprising the electromagnetic load, correlating a relationship between the mechanical parameter and the electrical parameter, and calibrating the electromagnetic load across a plurality of mechanical motion conditions based on the relationship.

Claims (34)

1. A method comprising:

measuring an electrical parameter of an electromagnetic load having a moving mass during the absence of a driving signal actively driving the electromagnetic load, wherein the electrical parameter comprises a back-electromotive force associated with the electromagnetic load;

measuring a mechanical parameter of mechanical motion of a host device comprising the electromagnetic load, wherein the mechanical parameter comprises a velocity of the host device;

correlating a relationship between the mechanical parameter and the electrical parameter; and

calibrating the electromagnetic load across a plurality of mechanical motion conditions based on the relationship.

2. The method of claim 1 , wherein correlating the relationship comprises calculating based on the back-electromotive and the velocity, for each of a plurality of velocities of the host device, a respective magnetic force factor at such velocity.

3. The method of claim 2 , wherein calibrating the electromagnetic load comprises calibrating the electromagnetic load based on the plurality of velocities of the host device and their respective magnetic force factors at each such velocity.

4. The method of claim 2 , wherein calibrating the electromagnetic load comprises filtering the driving signal, when actively driving the electromagnetic load, with a filter having a response based on the plurality of velocities of the host device and their respective magnetic force factors at each such velocity.

5. The method of claim 1 , further comprising recording the relationship and storing the relationship in computer-readable media.

6. The method of claim 5 , wherein calibrating comprises retrieving the relationship from the computer-readable media and calibrating based on the relationship as retrieved from the computer-readable media.

7. The method of claim 1 , wherein the mechanical motion is caused by normal use of the host device during its use by an end user of the host device.

8. The method of claim 1 , wherein the mechanical motion is caused by a mechanical exciter during post-production calibration of the host device.

9. The method of claim 1 , wherein the electromagnetic load comprises a haptic transducer.

10. A system comprising:

a first input for measuring an electrical parameter of an electromagnetic load having a moving mass during the absence of a driving signal actively driving the electromagnetic load, wherein the electrical parameter comprises a back-electromotive force associated with the electromagnetic load;

a second input for measuring a mechanical parameter of mechanical motion of a host device comprising the electromagnetic load, wherein the mechanical parameter comprises a velocity of the host device; and

a processing subsystem configured to:

correlate a relationship between the mechanical parameter and the electrical parameter; and

calibrate the electromagnetic load across a plurality of mechanical motion conditions based on the relationship.

11. The system of claim 10 , wherein correlating the relationship comprises calculating based on the back-electromotive and the velocity, for each of a plurality of velocities of the host device, a respective magnetic force factor at such velocity.

12. The system of claim 11 , wherein calibrating the electromagnetic load comprises calibrating the electromagnetic load based on the plurality of velocities of the host device and their respective magnetic force factors at each such velocity.

13. The system of claim 11 , wherein calibrating the electromagnetic load comprises filtering the driving signal, when actively driving the electromagnetic load, with a filter having a response based on the plurality of velocities of the host device and their respective magnetic force factors at each such velocity.

14. The system of claim 10 , wherein the processing subsystem is further configured to record the relationship and store the relationship in computer-readable media.

15. The system of claim 14 , wherein calibrating comprises retrieving the relationship from the computer-readable media and calibrating based on the relationship as retrieved from the computer-readable media.

16. The system of claim 10 , wherein the mechanical motion is caused by normal use of the host device during its use by an end user of the host device.

17. The system of claim 10 , wherein the mechanical motion is caused by a mechanical exciter during post-production calibration of the host device.

18. The system of claim 10 , wherein the electromagnetic load comprises a haptic transducer.

19. A host device comprising:

an electromagnetic load; and

a processing subsystem configured to:

measure an electrical parameter of an electromagnetic load having a moving mass during the absence of a driving signal actively driving the electromagnetic load, wherein the electrical parameter comprises a back-electromotive force associated with the electromagnetic load;

measure a mechanical parameter of mechanical motion of a host device comprising the electromagnetic load, wherein the mechanical parameter comprises a velocity of the host device;

correlate a relationship between the mechanical parameter and the electrical parameter; and

calibrate the electromagnetic load across a plurality of mechanical motion conditions based on the relationship.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 23, 2023
From: CIRRUS LOGIC INTERNATIONAL SEMICONDUCTOR LTD.
To: CIRRUS LOGIC, INC.
Reel/Frame 062456/0073 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 12, 2020
From: KHENKIN, ALEKSEY; YAN, JUN; JANKO, MARCO; MCKNIGHT, MICHAEL
To: CIRRUS LOGIC INTERNATIONAL SEMICONDUCTOR LTD.
Reel/Frame 052641/0666 →
Continuity (1)
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