Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

1. A semiconductor manufacturing apparatus comprising:

a housing configured to house a substrate;

a plasma supplier configured to supply plasma on an upper face of the substrate;

a support configured to support the substrate and a ring surrounding an end portion of the substrate, the ring including a first member having a lower face on which a mark to be photographed is provided, and a second member disposed under the lower face of the first member;

equipment configured to photograph the mark or receive an image of the mark through a wiring that includes a first end portion able to be disposed in a vicinity of the mark and inserted into the second member so as to face the mark through a transparent portion of the second member, and a second end portion different from the first end portion; and

a controller configured to identify a position of the mark based on the image of the mark, and adjust a position of the substrate on the support based on the position of the mark.

2. The apparatus of claim 1 , wherein each of the first member and the second member has a ring shape.

3. The apparatus of claim 1 , wherein the equipment is a camera configured to photograph the mark through the wiring from an outside of the ring.

4. The apparatus of claim 1 , wherein the equipment is a receiver configured to receive the image of the mark at an outside of the ring through the wiring.

5. The apparatus of claim 1 , further comprising an imaging element configured to take the image of the mark from a position between the mark and the first end portion,

wherein the equipment receives the image taken by the imaging element through the wiring.

6. The apparatus of claim 1 , further comprising a pin configured to raise and lower the ring,

wherein the first end portion of the wiring is fixed to the pin.