Gate all around vacuum channel transistor
A vacuum channel transistor having a vertical gate-all-around (GAA) architecture provides high performance for high-frequency applications, and features a small footprint compared with existing planar devices. The GAA vacuum channel transistor features stacked, tapered source and drain regions that are formed by notching a doped silicon pillar using a lateral oxidation process. A temporary support structure is provided for the pillar during formation of the vacuum channel. Performance of the GAA vacuum channel transistor can be tuned by replacing air in the channel with other gases such as helium, neon, or argon. A threshold voltage of the GAA vacuum channel transistor can be adjusted by altering dopant concentrations of the silicon pillar from which the source and drain regions are formed.
1. A method, comprising:
forming a first semiconductor pillar structure over a substrate, the first semiconductor oriented in a first direction and having a first tapered end pointing away from the substrate;
forming a second semiconductor pillar structure oriented in the first direction and spaced apart from the first semiconductor pillar structure, the second semiconductor structure having a second tapered end pointing toward the substrate, the second tapered end being separated from the first taped end by a gap region; and
forming a gate structure adjacent to the gap region in a second direction transverse to the first direction.
2. The method of claim 1 wherein the first and second tapered ends are formed facing one another.
3. The method of claim 1 wherein the forming the gate structure includes forming the gate structure that surrounds the gap region.
4. The method of claim 3 wherein the forming the gate structure includes forming the gate structure that surrounds at least a portion of each of the first semiconductor pillar structure and the second semiconductor pillar structure.
5. The method of claim 1 , wherein the first semiconductor pillar structure is formed to have a first dimension in the second direction, the second semiconductor pillar structure is formed to have a second dimension in the second direction, and the first dimension is greater than the second dimension.
6. The method of claim 1 , further comprising forming a first dielectric layer that surrounds the first semiconductor pillar structure, a gate region and the second semiconductor pillar structure in the second direction.
7. The method of claim 6 , further comprising forming a second dielectric layer that surrounds the second semiconductor pillar structure in the second direction and is spaced away from the first semiconductor pillar structure, the second dielectric layer positioned between the first dielectric layer and the second semiconductor pillar structure.
8. The method of claim 7 , further comprising forming a first conductive structure contacting a first portion of the second semiconductor pillar structure,
wherein the forming the second dielectric layer includes forming the second dielectric layer that surrounds a second portion of the second semiconductor pillar structure, the second portion being closer to the gap region than the first portion.
9. The method of claim 1 , comprising doping the first semiconductor pillar structure and the second semiconductor pillar structure with a same conductivity type.
10. The method of claim 1 wherein the substrate includes a doped region, and the first semiconductor pillar structure is formed to extend from the doped region, and
comprising doping the first semiconductor pillar structure with a same conductivity type as the doped region of the substrate.
11. The method of claim 10 , further comprising forming a second conductive structure in contact with the doped region of the substrate.
12. A method, comprising:
forming a vertical stack over a substrate, the vertical stack including:
a first portion having a first tapered end; and
a second portion over the first portion and having a second tapered end that faces the first tapered end; and
forming a gate structure laterally adjacent to the first tapered end and the second tapered end.
13. The method of claim 12 wherein the forming the vertical stack includes forming a gap between the first tapered end and the second tapered end.
14. The method of claim 12 , comprising forming an oxide spacer spaced apart from the second portion, wherein the second tapered end is spaced apart from the oxide spacer.
15. The method of claim 12 wherein the forming the gate structure includes forming the gate structure around the vertical stack.
16. The method of claim 12 wherein the forming the gate structure includes forming the gate structure that surrounds the first tapered end and the second tapered end.
17. The method of claim 14 , further comprising forming a conductive contact structure between the oxide spacer and the second portion.
18. A method, comprising:
forming a first source or drain structure over a substrate, the first source or drain structure having a first point;
forming a second source or drain structure over the first source or drain source structure, the second source or drain structure having a second point spaced apart from the first point by a first gap;
forming an insulator layer laterally surrounding the second source or drain structure and vertically overlapping the first source or drain source structure; and
forming a gate surrounding the first gap.
19. The method of claim 18 , comprising filling the first gap with a gas.
20. The method of claim 19 wherein the gas includes one or more of argon, helium, neon, oxygen and nitrogen.