IP Library Granted Patent US 11,670,640
Granted Patent B2
US 11,670,640 · App. 17/090,223 · Granted Jun 6, 2023

Display device

Inventors: Chandra Lius (Miao-Li County, TW); Nai-Fang Hsu (Miao-Li County, TW)
Assignee: INNOLUX CORPORATION
H01L27/1225G02F1/1368G02F1/13338G02F1/133345G02F1/134309G06F3/0412H01L27/124H01L27/1222H01L27/1248H01L27/1251H01L27/1255H01L27/323H01L27/3276H01L29/24H01L29/42356H01L29/7869H01L29/78648H01L29/78675H01L29/78696G02F1/13685G02F1/133388H01L27/3262H01L29/4908H01L29/78672
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Quick Facts
Patent No.
US 11,670,640
App. No.
17/090,223
Granted
Jun 6, 2023
Kind
B2
Abstract

A display device is disclosed, which includes: a first substrate; an oxide semiconductor layer disposed on the first substrate; a silicon semiconductor layer disposed on the first substrate; and a capacitor including a first conductive component and a second conductive component, wherein the first conductive component is electrically connected to the oxide semiconductor layer and the second conductive component is electrically connected to the silicon semiconductor layer.

Claims (20)

1. A display device, comprising:

a first substrate;

a first oxide semiconductor layer and a second oxide semiconductor layer disposed on the first substrate;

a silicon semiconductor layer disposed on the first substrate; and

a capacitor including a first conductive component and a second conductive component,

wherein the first conductive component is disposed on the first substrate and is electrically connected to the silicon semiconductor layer, and the second conductive component is disposed on the first conductive component and is physically connected to the first oxide semiconductor layer and the second oxide semiconductor layer, and

wherein the second conductive component is at least partially overlapped with the first oxide semiconductor layer.

2. The display device of claim 1 , wherein the first oxide semiconductor layer is disposed on the first silicon semiconductor layer.

3. The display device of claim 1 , further comprising a first gate electrode disposed on the first substrate, wherein the first oxide semiconductor layer is disposed on the first gate electrode.

4. The display device of claim 3 , further comprising a gate insulating layer disposed between the first gate electrode and the first oxide semiconductor layer, wherein a maximum atomic percentage of oxygen in the gate insulating layer is greater than a maximum atomic percentage of oxygen in the first oxide semiconductor layer.

5. The display device of claim 4 , wherein the gate insulating layer comprises silicon oxide.

6. The display device of claim 1 , further comprising a gate electrode disposed on the first substrate, wherein the gate electrode is disposed on the silicon semiconductor layer.

7. The display device of claim 1 , further comprising a passivation layer disposed on the first oxide semiconductor layer, wherein the passivation layer comprises silicon oxide.

8. The display device of claim 1 , wherein the first oxide semiconductor layer is an indium gallium zinc oxide (IGZO) layer.

9. The display device of claim 1 , wherein the silicon semiconductor layer is a low-temperature polycrystalline silicon semiconductor layer.

10. The display device of claim 1 , further comprising a display medium layer electrically connected to the first oxide semiconductor layer, wherein the display medium layer is an organic light-emitting diode unit.

11. The display device of claim 1 , wherein the first substrate comprises a flexible substrate.

12. The display device of claim 1 , further comprising a display region and a peripheral region adjacent to the display region, wherein a driver circuit is disposed in the peripheral region and comprises the silicon semiconductor layer.

13. The display device of claim 1 , wherein the first conductive component is not overlapped with the second oxide semiconductor layer.

14. The display device of claim 1 , further comprising a display region and a peripheral region adjacent to the display region, wherein the first oxide semiconductor layer and the second oxide semiconductor are disposed in the display region, and the silicon semiconductor layer is disposed in the peripheral region.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 5, 2020
From: LIUS, CHANDRA; HSU, NAI-FANG
To: INNOLUX CORPORATION
Reel/Frame 054287/0038 →
Continuity (4)
Continuation 16402478 · May 3, 2019
Continuation 15486336 · Apr 13, 2017
Provisional Application 62429162 · Dec 2, 2016
Related Publication 20210082968A1 · Mar 18, 2021