Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure
A composition for forming an underlayer film necessary for facilitating alignment of self-assembled film into desired vertical pattern. Composition for forming an underlayer film of self-assembled film including a polymer having unit structure containing aliphatic polycyclic structure of aliphatic polycyclic compound in main chain. The polymer is a polymer having unit structure containing aliphatic polycyclic structure of aliphatic polycyclic compound with aromatic ring structure of aromatic ring-containing compound or polymer chain derived from vinyl group of vinyl group-containing compound in main chain. The polymer has unit structure of Formula (1): X—Y Formula (1) wherein X is single bond, divalent group having vinyl structure as polymer chain, or divalent group having aromatic ring-containing structure as polymer chain, and Y is divalent group having aliphatic polycyclic structure as polymer chain. The aliphatic polycyclic compound is bi- to hexa-cyclic diene compound. The aliphatic polycyclic compound is dicyclopentadiene or norbornadiene.
1. A composition for forming an underlayer film of a self-assembled film, where the self-assembled film is a block polymer containing an organic polymer chain (A) having an organic monomer (a) as a unit structure and a polymer chain (B) that forms a bond with the organic polymer chain (A) and contains a monomer (b) different from the organic monomer (a) as a unit structure; the composition for forming an underlayer film comprising a polymer having a unit structure containing an aliphatic polycyclic structure in a main chain; wherein
the self-assembled film is formed in a vertical lamella structure; and
the polymer contained in the underlayer film has a unit structure of Formula (1):
X—Y Formula (1)
where
X is a divalent group having an aromatic ring-containing structure from a heterocyclic compound or a homocyclic compound, wherein
the heterocyclic compound is a phenothiazine moiety that is optionally substituted, and
the homocyclic compound comprises:
a benzene moiety that is substituted with an amino group; and
Y is a divalent group having an aliphatic polycyclic structure; wherein
the polymer contained in the underlayer film having unit structure of Formula (1) is obtained by a condensation reaction of an aromatic ring-containing compound with an aliphatic polycyclic compound, the aromatic ring-containing compound resulting in the X of unit structure of Formula (1) and the aliphatic polycyclic compound resulting in the Y of the unit structure of Formula (1).
2. The composition for forming an underlayer film according to claim 1 , wherein
the aliphatic polycyclic structure is from a bi- to hexa-cyclic diene compound.
3. The composition for forming an underlayer film according to claim 1 , wherein
the aliphatic polycyclic structure is from a dicyclopentadiene or a norbornadiene.
4. The composition for forming an underlayer film according to claim 1 , further comprising a cross-linker.
5. The composition for forming an underlayer film according to claim 1 , further comprising an acid or an acid generator.
6. A method for forming a pattern structure comprising steps of:
applying the composition for forming an underlayer film of a self-assembled film according to claim 1 on a substrate, followed by baking, to form an underlayer film; and applying a composition for forming a self-assembled film on the underlayer film, followed by baking, to form a self-assembled film.
7. The method for forming a pattern structure according to claim 6 , comprising a step of forming an underlying film prior to the step of applying the composition for forming an underlayer film of a self-assembled film, followed by baking, to form an underlayer film.
8. The method for forming a pattern structure according to claim 7 , wherein the underlying film is an anti-reflective coating or a hard mask.
9. A device having a pattern structure formed by the method for forming a pattern structure according claim 6 .
10. The composition for forming an underlayer film according to claim 1 , wherein X is the divalent group having an aromatic ring-containing structure from the heterocyclic compound.
11. The composition for forming an underlayer film according to claim 1 , wherein X is the divalent group having an aromatic ring-containing structure from the homocyclic compound, and the benzene moiety is further substituted with at least one hydroxy group.
12. The composition for forming an underlayer film according to claim 1 , wherein X is the divalent group having an aromatic ring-containing structure from the homocyclic compound.
13. A composition for forming an underlayer film of a self-assembled film, where the self-assembled film is a block polymer containing an organic polymer chain (A) having an organic monomer (a) as a unit structure and a polymer chain (B) that forms a bond with the organic polymer chain (A) and contains a monomer (b) different from the organic monomer (a) as a unit structure; the composition for forming an underlayer film comprising a polymer having a unit structure containing an aliphatic polycyclic structure in a main chain; wherein
the self-assembled film is formed in a vertical lamella structure; and
the polymer contained in the underlayer film has a unit structure of Formula (1):
X—Y Formula (1)
where
n is an integer that has a value that is in a range such that the polymer contained in the underlayer film having the unit structure of Formula (1) has a weight average molecular weight Mw in the range of from 500 to 1,000,000,
X is a divalent group having an aromatic ring-containing structure from a homocyclic compound, the homocyclic compound being a naphthalene moiety that is substituted with at least one hydroxy group; and
Y is a divalent group having an aliphatic polycyclic structure, wherein the aliphatic polycyclic structure of the Y of the unit structure of Formula (1) is not from a dicyclopentadiene.
14. A composition for forming an underlayer film of a self-assembled film, where the self-assembled film is a block polymer containing an organic polymer chain (A) having an organic monomer (a) as a unit structure and a polymer chain (B) that forms a bond with the organic polymer chain (A) and contains a monomer (b) different from the organic monomer (a) as a unit structure; the composition for forming an underlayer film comprising a polymer having a unit structure containing an aliphatic polycyclic structure in a main chain; wherein
the self-assembled film is formed in a vertical lamella structure; and
the polymer contained in the underlayer film has a unit structure of Formula (1):
X—Y Formula (1)
where
X is a divalent group having an aromatic ring-containing structure from a heterocyclic compound or a homocyclic compound, wherein
the heterocyclic compound is a phenothiazine moiety that is optionally substituted, and
the homocyclic compound comprises:
a benzene moiety that is substituted with an amino group, or
a naphthalene moiety that is substituted with at least one hydroxyl group; and
Y is a divalent group having an aliphatic polycyclic structure; wherein
the polymer contained in the underlayer film having unit structure of Formula (1) is obtained by a condensation reaction of an aromatic ring-containing compound with an aliphatic polycyclic compound, the aromatic ring-containing compound resulting in the X of unit structure of Formula (1) and the aliphatic polycyclic compound resulting in the Y of the unit structure of Formula (1), and
the aliphatic polycyclic structure of the Y of the unit structure of Formula (1) is not from a dicyclopentadiene.