Memory systems with vertical integration
A memory device includes a first layer, wherein the first layer includes a first memory array, a first row decoder circuit, and a first column sensing circuit. The memory device includes a second layer disposed with respect to the first layer in a vertical direction. The second layer includes a first peripheral circuit operatively coupled to the first memory array, the first row decoder circuit, and the first column sensing circuit. The memory device includes a plurality of interconnect structures extending along the vertical direction. At least a first one of the plurality of interconnect structures operatively couples the second layer to the first layer.
1. A memory device, comprising:
a first layer, wherein the first layer includes a first memory array, a first row decoder circuit, and a first column sensing circuit;
a second layer disposed with respect to the first layer in a vertical direction;
a third layer that includes a second memory array, a second row decoder circuit, and a second column sensing circuit; and
a plurality of interconnect structures fully extending across the first to third layers along the vertical direction, wherein at least a first one of the plurality of interconnect structures operatively couples the second layer only to the first layer and at least a second one of the plurality of interconnect structures operatively couples the second layer only to the third layer;
wherein the second layer at least includes: (i) a first peripheral circuit operatively coupled to the first memory array, the first row decoder circuit, and the first column sensing circuit and (ii) a second peripheral circuit operatively coupled to the second memory array, the second row decoder circuit, and the second column sensing circuit.
2. The memory device of claim 1 , wherein the first layer further includes a third memory array, a third row decoder circuit and a third column sensing circuit.
3. The memory device of claim 2 , wherein the first row decoder abuts a first lateral side of the first memory array and a first lateral side of the third memory array, with the first column sensing circuit and the third column sensing circuit abutted to a second lateral side of the first memory array and a second lateral side of the third memory array, respectively, and wherein the first lateral side of the first memory array and the first lateral side of the third memory array face each other.
4. The memory device of claim 2 , wherein the first row decoder abuts a first lateral side of the first memory array and the third row decoder abuts a first lateral side of the third memory array, with the first column sensing circuit interposed between a second lateral side of the first memory array and a second lateral side of the third memory array, and wherein the first lateral side of the first memory array and the first lateral side of the third memory array are aligned with each other.
5. The memory device of claim 1 , wherein the first layer further includes a third memory array abutted to the first memory array, wherein either one of the first row decoder or the first column sensing circuit abuts a first lateral side of the first memory array and a first lateral side of the third memory array, and wherein the first lateral side of the first memory array and the first lateral side of the third memory array are aligned with each other.
6. The memory device of claim 1 , wherein the first layer further includes a space area, and wherein the plurality of interconnect structures pass through the space area.
7. The memory device of claim 1 , wherein the first memory array and the second memory array are each a dynamic random access memory (DRAM) array.
8. The memory device of claim 1 , wherein the first memory array and the second memory array are each a resistive random access memory (RRAM) array.
9. The memory device of claim 1 , wherein the first memory array and the second memory array are each a magnetoresistive random access memory (MRAM) array.
10. A memory device, comprising:
a first layer including a first memory array;
a second layer including a second memory array;
a third layer disposed with respect to the first and second layers in a vertical direction, wherein the third layer includes a plurality of peripheral circuits; and
a plurality of interconnect structures fully extending across the first to third layers along the vertical direction, wherein at least a first one of the plurality of interconnect structures operatively couples the third layer to the first layer but not to the second layer, and at least a second one of the plurality of interconnect structures operatively couples the third layer to the second layer but not to the first layer.
11. The memory device of claim 10 , wherein at least a third one of the plurality of interconnect structures operatively couples the third layer to both the first layer and the second layer.
12. The memory device of claim 10 , wherein the first layer further includes a first row decoder circuit, and a first column sensing circuit, and wherein the at least first interconnect structure operatively couples a first one of the plurality of peripheral circuits to the first memory array, the first row decoder circuit, and the first column sensing circuit.
13. The memory device of claim 12 , wherein the first memory array is one of a plurality of memory arrays formed on the first layer, and wherein the plurality of memory arrays share the same first row decoder circuit and the same first column sensing circuit.
14. The memory device of claim 10 , wherein the second layer further includes a second row decoder circuit, and a second column sensing circuit, and wherein the at least second interconnect structure operatively couples a second one of the plurality of peripheral circuits to the second memory array, the second row decoder circuit, and the second column sensing circuit.
15. The memory device of claim 14 , wherein the second memory array is one of a plurality of memory arrays formed on the second layer, and wherein each of the plurality of memory arrays is operatively coupled to a respective row decoder circuit and a respective column sensing circuit formed on the second layer.
16. The memory device of claim 10 , wherein the plurality of interconnect structures each include a through-silicon-via structure.
17. A method for fabricating a memory device, comprising:
providing a first layer including a first memory array, a first row decoder circuit, and a first column sensing circuit;
providing a second layer including a second memory array, a second row decoder circuit, and a second column sensing circuit;
providing a third layer vertically disposed with respect to the first layer and the second layer, the third layer including a plurality of peripheral circuits; and
forming a plurality of interconnect structures fully extending across the first to third layers, wherein at least a first one of the interconnect structures is selected to operatively couple a first one of the plurality of peripheral circuits only to the first memory array, the first row decoder circuit, and the first column sensing circuit, and at least a second one of the interconnect structures is selected to operatively couple a second one of the plurality of peripheral circuits only to the second memory array, the second row decoder circuit, and the second column sensing circuit.
18. The memory device of claim 1 , wherein the second layer is disposed immediately below the first layer without any other layer interposed therebetween, and the third layer is disposed above the first layer.
19. The memory device of claim 1 , wherein the second layer is disposed immediately above the first layer without any other layer interposed therebetween, and the third layer is disposed below the first layer.
20. The method of claim 17 , wherein the third layer is disposed immediately below the first or second layer without any other layer interposed therebetween.