IP Library › Granted Patent US 11,684,999
Granted Patent B2
US 11,684,999 · App. 16/632,344 · Granted Jun 27, 2023

Laser irradiation apparatus

Inventors: Atsushi Yamamoto (Yokohama, JP); Hirotaka Sazuka (Yokohama, JP); Daisuke Ito (Yokohama, JP)
Assignee: JSW AKTINA SYSTEM CO., LTD
B23K26/08H01L21/67742H01L21/68742
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Quick Facts
Patent No.
US 11,684,999
App. No.
16/632,344
Granted
Jun 27, 2023
Kind
B2
Abstract

To realize a laser irradiation apparatus by using which accuracy in processing a substrate can be improved. A laser irradiation apparatus according to an embodiment includes a laser irradiation unit configured to apply laser light to a substrate, a base part, and a conveyance stage configured to convey the substrate. The conveyance stage includes a stage configured to be movable over the base part, a base flange fixed over the stage, a substrate stage fixed to an upper end part of the base flange and configured so that the substrate is placed thereover, and a pusher pin for supporting the substrate, the pusher pin being configured to penetrate the substrate stage and to be movable up and down.

Claims (65)

1. A laser irradiation apparatus comprising:

a laser irradiation unit configured to apply laser light to a substrate;

a base part; and

a conveyance stage configured to convey the substrate, wherein the conveyance stage comprises:

a stage configured to be movable above the base part;

a base flange fixed to an upper surface of the stage;

a substrate stage fixed to an upper end part of the base flange so that a center of the substrate stage is disposed on a rotational axis of the base flange extending in a vertical direction, the substrate stage being configured so that the substrate is placed thereover;

a pusher pin for supporting the substrate, the pusher pin being configured to penetrate the substrate stage and to be movable up and down; and

a driving unit configured to move the pusher pin up and down, the driving unit being directly fixed to a bottom surface of the substrate stage, and

wherein the base flange rotatably supports the substrate stage about the rotational axis extending in the vertical direction.

2. The laser irradiation apparatus according to claim 1 , wherein the upper end part of the base flange and the substrate stage are connected to each other by a bolt.

3. The laser irradiation apparatus according to claim 1 , wherein the conveyance stage comprises:

a pusher arm disposed on an outer side of the substrate stage and configured to be movable up and down; and

a plurality of pusher blades for supporting the substrate, the pusher blades being connected to the pusher arm and disposed on a periphery of the substrate stage.

4. The laser irradiation apparatus according to claim 3 , wherein a plurality of grooves each corresponding to a respective one of the plurality of pusher blades are formed in a top surface of the substrate stage.

5. The laser irradiation apparatus according to claim 3 , wherein

a planar shape of the substrate is quadrilateral, and

the pusher blades are disposed so as to intersect a first side of the substrate or a second side thereof opposite to the first side.

6. The laser irradiation apparatus according to claim 5 , wherein the pusher blades are disposed so as to be orthogonal to the first side of the substrate or the second side thereof.

7. The laser irradiation apparatus according to claim 5 , wherein the pusher blades are disposed so as to intersect the first side of the substrate or the second side thereof at an angle of 40° to 50°.

8. The laser irradiation apparatus according to claim 1 , wherein

the pusher pin comprises a base part and a resin part disposed at a tip end side of the pusher pin with respect to the base part, and

the resin part is attachable/detachable to/from the base part.

9. The laser irradiation apparatus according to claim 1 , wherein

an amorphous semiconductor is formed in the substrate carried into the laser irradiation apparatus, and

a polycrystalline semiconductor is formed in the substrate by applying laser light to the amorphous semiconductor by the laser irradiation unit.

10. The laser irradiation apparatus according to claim 1 , wherein the stage is an XY stage configured to move horizontally along a first rail extending in a first direction and a second rail extending in a second direction orthogonal to the first direction.

11. The laser irradiation apparatus according to claim 1 , wherein the driving unit further comprises:

a motor;

a first rack disposed on a side of the base flange and configured to horizontally move by a driving force of the motor; and

a rotary shaft disposed on the side of the base flange and configured to rotate as the first rack moves;

a support part configured to support the pusher pin; and

a second rack disposed in the support part and engaged with a pinion of the rotary shaft.

12. A laser irradiation apparatus comprising:

a laser irradiation unit configured to apply laser light to a substrate;

a base part; and

a conveyance stage configured to convey the substrate, wherein the conveyance stage comprises:

a stage configured to be movable above the base part;

a base flange fixed over the stage;

a substrate stage fixed to an upper end part of the base flange and configured so that the substrate is placed thereover;

a pusher pin for supporting the substrate, the pusher pin being configured to penetrate the substrate stage via a through-hole vertically passing through the substrate stage;

a pusher blade for supporting the substrate, the pusher blade being disposed on a periphery of the substrate stage; and

a driving unit including a motor, the driving unit being directly connected to a bottom surface of the substrate stage, wherein

the base flange rotatably supports the substrate stage about a vertically-extending rotational axis, and

the pusher pin and the pusher blade are movable up and down by driving force of the motor.

13. The laser irradiation apparatus according to claim 12 , wherein the driving unit further comprises:

a first rack disposed on a side of the base flange and configured to horizontally move by a driving force of the motor; and

a rotary shaft disposed on the side of the base flange and configured to rotate as the first rack moves;

a support part configured to support the pusher pin; and

a second rack disposed in the support part and engaged with a pinion of the rotary shaft.

14. A laser irradiation apparatus comprising:

a laser irradiation unit configured to apply laser light to a substrate;

a base part; and

a conveyance stage configured to convey the substrate,

wherein the conveyance stage comprises:

a stage configured to be movable above the base part;

a base flange fixed over the stage;

a substrate stage fixed to an upper end part of the base flange and configured so that the substrate is placed thereover;

a pusher pin for supporting the substrate, the pusher pin being configured to penetrate the substrate stage and to be movable up and down; and

a driving unit configured to move the pusher pin up and down, the driving unit being fixed to a bottom surface of the substrate stage, wherein the driving unit further comprises:

a first rack disposed on a side of the base flange and configured to horizontally move by a driving force of a motor; and

a rotary shaft disposed on the side of the base flange and configured to rotate as the first rack moves;

a support part configured to support the pusher pin; and

a second rack disposed in the support part and engaged with a pinion of the rotary shaft, and

wherein the base flange rotatably supports the substrate stage about a rotation axis extending in a vertical direction.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 28, 2022
From: THE JAPAN STEEL WORKS, LTD.
To: JSW AKTINA SYSTEM CO., LTD.
Reel/Frame 059418/0794 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 18, 2020
From: YAMAMOTO, ATSUSHI; SAZUKA, HIROTAKA; ITO, DAISUKE
To: THE JAPAN STEEL WORKS, LTD.
Reel/Frame 051551/0565 →
Continuity (1)
Related Publication 20200180071A1 · Jun 11, 2020