Substrate processing apparatus

1. A substrate processing apparatus comprising:

a process chamber;

a support part in the process chamber, the support part including a substrate loading region configured to support a substrate seated therein;

a heating part configured to heat the substrate loading region; and

a reflective member adjacent to the substrate loading region in the process chamber, the reflective member including a first plate and a second plate separated from each other in a vertical direction of the reflective member and a pair of side walls extending perpendicular to the first plate and the second plate with a sealed hollow portion therein that is sealed on all sides and extends parallel to an upper surface of the substrate loading region such that a distance the sealed hollow portion extends within the reflective member is greater in a horizontal direction than a distance the sealed hollow portion extends in the vertical direction, the second plate being closer to the support part than the first plate, and the sealed hollow portion being configured to reflect the heat absorbed by the reflective member back towards the second plate,

wherein the reflective member includes internal surfaces including a first internal surface, a second internal surface and an internal side surface defining the sealed hollow portion, the first internal surface facing the substrate loading region, the second internal surface opposing the first internal surface with the internal side surface connecting the first internal surface and the second internal surface,

wherein the reflective member includes a reflective material having a first reflectance, and

at least one of the first internal surface and the second internal surface includes a material having a second reflectance coated thereon with a distance between the first internal surface and the second internal surface that oppose each other in the vertical direction being between 1 mm and 10 mm, the second reflectance being higher than the first reflectance and the sealed hollow portion being vacuum sealed.

2. The substrate processing apparatus of claim 1 , wherein the reflective member includes external surfaces,

the external surfaces including a first external surface, a second external surface, and an external side surface, the second external surface opposing the first external surface with the external side surface connecting the first external surface and the second external surface.

3. The substrate processing apparatus of claim 2 , wherein

the first external surface, the second external surface and the external side surface each include a material having a fourth reflectance coated thereon, the fourth reflectance being higher than the first reflectance.

4. The substrate processing apparatus of claim 2 , wherein the second external surface has a flat reflective surface.

5. The substrate processing apparatus of claim 2 , wherein at least one of the first internal surface and the second internal surface has a flat surface.

6. The substrate processing apparatus of claim 2 , wherein at least one of the first external surface and the second external surface has a convex surface or a concave surface, the convex surface or the concave surface facing the substrate loading region.

7. The substrate processing apparatus of claim 1 , wherein

a first one of the first internal surface and the second internal surface includes a material having a second reflectance coated therein, the second reflectance being higher than the first reflectance, and

a second one of the first internal surface and the second internal surface includes a material having a third reflectance coated thereon, the third reflectance being lower than the first reflectance.

8. The substrate processing apparatus of claim 1 , wherein the sealed hollow portion corresponds to a central region or a circumferential region of the substrate.

9. The substrate processing apparatus of claim 1 , wherein the reflective member includes a plurality of separated regions each having the sealed hollow portion therein, the plurality of separated regions being stacked in a thickness direction of the reflective member.

10. The substrate processing apparatus of claim 9 , wherein at least one sub-reflective member is in the sealed hollow portion.

11. The substrate processing apparatus of claim 10 , wherein the sub-reflective member includes a plurality of sub-reflective members stacked in the thickness direction of the reflective member.

12. A substrate processing apparatus comprising:

a process chamber;

a support part in the process chamber, the support part including a substrate loading region configured to support a substrate seated therein;

a heating part configured to heat the substrate loading region; and

a reflective member adjacent to the substrate loading region in the process chamber, the reflective member including a first plate and a second plate separated from each other in a vertical direction of the reflective member and a pair of side walls extending perpendicular to the first plate and the second plate with a sealed hollow portion therein that is sealed on all sides and extends parallel to an upper surface of the substrate loading region such that a distance the sealed hollow portion extends within the reflective member is greater in a horizontal direction than a distance the sealed hollow portion extends in the vertical direction, the second plate being closer to the support part than the first plate, the reflective member configured to reflect heat emitted from the substrate loading region to the substrate loading region and the sealed hollow portion being configured to reflect a portion of heat emitted from the substrate loading region that is absorbed by the reflective member back towards the second plate, the reflective member including at least one of quartz, ceramic, and a metal,

wherein the reflective member is disc shaped and has a diameter of 280 mm to 320 mm and a thickness of 10 mm to 20 mm, and the sealed hollow portion therein has a thickness of 3 mm to 5 mm,

wherein the reflective member includes internal surfaces including a first internal surface, a second internal surface and an internal side surface defining the sealed hollow portion, the first internal surface facing the substrate loading region, the second internal surface opposing the first internal surface with the internal side surface connecting the first internal surface and the second internal surface,

wherein the reflective member includes a reflective material having a first reflectance, and

at least one of the first internal surface and the second internal surface includes a material having a second reflectance coated thereon with a distance between the first internal surface and the second internal surface that oppose each other in the vertical direction being between 1 mm and 10 mm, the second reflectance being higher than the first reflectance and the sealed hollow portion being vacuum sealed.

13. The substrate processing apparatus of claim 12 , wherein the heating part is within the support part.

14. The substrate processing apparatus of claim 13 , wherein the sealed hollow portion corresponds to a central region of the substrate.

15. The substrate processing apparatus of claim 12 , wherein the reflective member is above the substrate loading region, and the heating part is below the substrate loading region.

16. The substrate processing apparatus of claim 12 , wherein the reflective member is below the substrate loading region, and the heating part is at least one of above the substrate loading region or below the substrate loading region.

17. The substrate processing apparatus of claim 12 , wherein

the reflective member is at least one of above the substrate loading region or below the substrate loading region, and

the heating part is within the support part.

18. The substrate processing apparatus of claim 12 , wherein the reflective member comprises:

a base having a concave groove portion; and

a cover bonded to the base, the cover covering the concave groove portion to form the sealed hollow portion.

19. A substrate processing apparatus comprising:

a process chamber; and

a support part in the process chamber, the support part including,

a substrate loading region configured to support a substrate seated therein,

a first heating part below the substrate loading region and a second heating part above the substrate loading region, and

a sealed hollow portion within the support part below the first heating part, the sealed hollow portion defined by internal surfaces including first and second internal surfaces separated from each other in a vertical direction of the first heating part and a pair of internal side surfaces connecting the first internal surface and the second internal surface and extending perpendicular thereto, the sealed hollow portion being sealed on all sides thereof and extending parallel to an upper surface of the substrate loading region such that a distance the sealed hollow portion extends within a reflective member is greater in a horizontal direction than a distance the sealed hollow portion extends in the vertical direction, the sealed hollow portion configured to reflect heat emitted by the first heating part away from the substrate loading region back towards the substrate loading region,

wherein the reflective member includes internal surfaces including a first internal surface, a second internal surface and an internal side surface defining the sealed hollow portion, the first internal surface facing the substrate loading region, the second internal surface opposing the first internal surface with the internal side surface connecting the first internal surface and the second internal surface,

wherein the reflective member includes a reflective material having a first reflectance, and

wherein at least one of the first internal surface and the second internal surface includes a material having a second reflectance coated thereon with a distance between the first internal surface and the second internal surface that oppose each other in the vertical direction being between 1 mm and 10 mm, the second reflectance being higher than the first reflectance and the sealed hollow portion being vacuum sealed.